DE69224897D1 - Polykristalline silicum enthaltende grundplatte für einen flüssigkeitsstrahlaufzeichnungskopf, sein herstellungsverfahren, flüssigkeitsstrahlaufzeichnungskopf damit versehen und flüssigkeitsstrahlaufzeichnungsgerät - Google Patents

Polykristalline silicum enthaltende grundplatte für einen flüssigkeitsstrahlaufzeichnungskopf, sein herstellungsverfahren, flüssigkeitsstrahlaufzeichnungskopf damit versehen und flüssigkeitsstrahlaufzeichnungsgerät

Info

Publication number
DE69224897D1
DE69224897D1 DE69224897T DE69224897T DE69224897D1 DE 69224897 D1 DE69224897 D1 DE 69224897D1 DE 69224897 T DE69224897 T DE 69224897T DE 69224897 T DE69224897 T DE 69224897T DE 69224897 D1 DE69224897 D1 DE 69224897D1
Authority
DE
Germany
Prior art keywords
liquid jet
receiving head
jet receiving
silicum
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69224897T
Other languages
English (en)
Other versions
DE69224897T2 (de
Inventor
Haruhiko Terai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69224897D1 publication Critical patent/DE69224897D1/de
Application granted granted Critical
Publication of DE69224897T2 publication Critical patent/DE69224897T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1646Manufacturing processes thin film formation thin film formation by sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1604Production of bubble jet print heads of the edge shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1637Manufacturing processes molding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1642Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/03Specific materials used

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
DE69224897T 1991-11-06 1992-11-06 Polykristalline silicum enthaltende grundplatte für einen flüssigkeitsstrahlaufzeichnungskopf, sein herstellungsverfahren, flüssigkeitsstrahlaufzeichnungskopf damit versehen und flüssigkeitsstrahlaufzeichnungsgerät Expired - Fee Related DE69224897T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3290086A JP2933429B2 (ja) 1991-11-06 1991-11-06 液体噴射記録ヘッド用基板、液体噴射記録ヘッドおよび液体噴射記録装置
PCT/JP1992/001434 WO1993008989A1 (en) 1991-11-06 1992-11-06 Polycrystalline silicon-based base plate for liquid jet recording head, its manufacture, liquid jet recording head using the plate, and liquid jet recording apparatus

Publications (2)

Publication Number Publication Date
DE69224897D1 true DE69224897D1 (de) 1998-04-30
DE69224897T2 DE69224897T2 (de) 1998-07-30

Family

ID=17751620

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69224897T Expired - Fee Related DE69224897T2 (de) 1991-11-06 1992-11-06 Polykristalline silicum enthaltende grundplatte für einen flüssigkeitsstrahlaufzeichnungskopf, sein herstellungsverfahren, flüssigkeitsstrahlaufzeichnungskopf damit versehen und flüssigkeitsstrahlaufzeichnungsgerät

Country Status (6)

Country Link
US (1) US5661503A (de)
EP (1) EP0570587B1 (de)
JP (1) JP2933429B2 (de)
DE (1) DE69224897T2 (de)
ES (1) ES2114950T3 (de)
WO (1) WO1993008989A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6505914B2 (en) * 1997-10-02 2003-01-14 Merckle Gmbh Microactuator based on diamond
US6140231A (en) * 1999-02-12 2000-10-31 Taiwan Semiconductor Manufacturing Company Robust diffusion barrier for Cu metallization
US6730984B1 (en) * 2000-11-14 2004-05-04 International Business Machines Corporation Increasing an electrical resistance of a resistor by oxidation or nitridization
US7922814B2 (en) * 2005-11-29 2011-04-12 Chisso Corporation Production process for high purity polycrystal silicon and production apparatus for the same
WO2007076424A1 (en) * 2005-12-27 2007-07-05 Bp Corporation North America Inc. Process for forming electrical contacts on a semiconductor wafer using a phase changing ink
JP4838703B2 (ja) * 2006-12-26 2011-12-14 富士電機株式会社 磁気記録媒体用ディスク基板の製造方法、磁気記録媒体用ディスク基板、磁気記録媒体の製造方法、磁気記録媒体、及び磁気記録装置
JP4411331B2 (ja) * 2007-03-19 2010-02-10 信越化学工業株式会社 磁気記録媒体用シリコン基板およびその製造方法
US8960657B2 (en) 2011-10-05 2015-02-24 Sunedison, Inc. Systems and methods for connecting an ingot to a wire saw
DE102018131130B4 (de) 2018-12-06 2022-06-02 Koenig & Bauer Ag Verfahren zur Modifikation eines Behälters eines Druckkopfes

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4336548A (en) * 1979-07-04 1982-06-22 Canon Kabushiki Kaisha Droplets forming device
US4432035A (en) * 1982-06-11 1984-02-14 International Business Machines Corp. Method of making high dielectric constant insulators and capacitors using same
JPS5922435A (ja) * 1982-07-28 1984-02-04 Nec Corp ラツチ回路
JPS59100520A (ja) * 1982-11-30 1984-06-09 Fujitsu Ltd 半導体装置の製造方法
US4513298A (en) * 1983-05-25 1985-04-23 Hewlett-Packard Company Thermal ink jet printhead
US4535343A (en) * 1983-10-31 1985-08-13 Hewlett-Packard Company Thermal ink jet printhead with self-passivating elements
JP2568864B2 (ja) * 1987-11-04 1997-01-08 セイコーエプソン株式会社 Mis型半導体装置の製造方法
JPS6412086A (en) * 1987-07-03 1989-01-17 Sanyo Electric Co Silencer for compressor
JPH0322763A (ja) * 1989-06-20 1991-01-31 Mitsubishi Electric Corp クランプ回路
US5103246A (en) * 1989-12-11 1992-04-07 Hewlett-Packard Company X-Y multiplex drive circuit and associated ink feed connection for maximizing packing density on thermal ink jet (TIJ) printheads
JP2726135B2 (ja) * 1990-02-02 1998-03-11 キヤノン株式会社 インクジェット記録装置
EP0583474B1 (de) * 1991-11-12 1997-05-14 Canon Kabushiki Kaisha Polykristalline silicium enthaltende grundplatte für einen flussigkeitsstrahlaufzeichnungskopf, sein herstellungsverfahren, flussigkeitsstrahlaufzeichnungskopf damit versehen, und flussigkeitsstrahlaufzeichnungsgerät

Also Published As

Publication number Publication date
ES2114950T3 (es) 1998-06-16
EP0570587A4 (en) 1994-07-06
JP2933429B2 (ja) 1999-08-16
JPH05124191A (ja) 1993-05-21
WO1993008989A1 (en) 1993-05-13
DE69224897T2 (de) 1998-07-30
EP0570587B1 (de) 1998-03-25
US5661503A (en) 1997-08-26
EP0570587A1 (de) 1993-11-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee