DE69215546D1 - Tetrahydropyranyloxystyrol Homopolymer und Verfahren zu seiner Herstellung - Google Patents
Tetrahydropyranyloxystyrol Homopolymer und Verfahren zu seiner HerstellungInfo
- Publication number
- DE69215546D1 DE69215546D1 DE69215546T DE69215546T DE69215546D1 DE 69215546 D1 DE69215546 D1 DE 69215546D1 DE 69215546 T DE69215546 T DE 69215546T DE 69215546 T DE69215546 T DE 69215546T DE 69215546 D1 DE69215546 D1 DE 69215546D1
- Authority
- DE
- Germany
- Prior art keywords
- tetrahydropyranyloxystyrene
- homopolymer
- preparation
- tetrahydropyranyloxystyrene homopolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F112/02—Monomers containing only one unsaturated aliphatic radical
- C08F112/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1389891A JPH04306204A (ja) | 1991-01-11 | 1991-01-11 | ポリ(テトラヒドロピラニルオキシスチレン)及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69215546D1 true DE69215546D1 (de) | 1997-01-16 |
DE69215546T2 DE69215546T2 (de) | 1997-06-19 |
Family
ID=11845990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1992615546 Expired - Fee Related DE69215546T2 (de) | 1991-01-11 | 1992-01-10 | Tetrahydropyranyloxystyrol Homopolymer und Verfahren zu seiner Herstellung |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0494792B1 (de) |
JP (1) | JPH04306204A (de) |
DE (1) | DE69215546T2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0723201A1 (de) * | 1995-01-20 | 1996-07-24 | Ocg Microelectronic Materials, Inc. | Phenolharze mit säurelabilen Schutzgruppen |
KR100220951B1 (ko) * | 1996-12-20 | 1999-09-15 | 김영환 | 비닐 4-테트라히드로피라닐옥시벤잘-비닐 4-히드록시벤잘-비닐 테트라히드로피라닐에테르-비닐 아세테이트 공중합체, 비닐 4-테트라히드로피라닐옥시벤잘-비닐 테트라히드로피라닐에테르-비닐 아세테이트 공중합체 및 그들의 제조방법 |
US9587136B2 (en) | 2013-10-08 | 2017-03-07 | Wisconsin Alumni Research Foundation | Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3817012A1 (de) * | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
DE4005212A1 (de) * | 1990-02-20 | 1991-08-22 | Basf Ag | Strahlungsempfindliches gemisch |
-
1991
- 1991-01-11 JP JP1389891A patent/JPH04306204A/ja active Pending
-
1992
- 1992-01-10 DE DE1992615546 patent/DE69215546T2/de not_active Expired - Fee Related
- 1992-01-10 EP EP19920300222 patent/EP0494792B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0494792B1 (de) | 1996-12-04 |
JPH04306204A (ja) | 1992-10-29 |
EP0494792A1 (de) | 1992-07-15 |
DE69215546T2 (de) | 1997-06-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69214306D1 (de) | Organopentasiloxan und Verfahren zu seiner Herstellung | |
DE69129746D1 (de) | Modifiziertes Polysilazan und Verfahren zu seiner Herstellung | |
DE69231787D1 (de) | Medizinischer Artikel und Verfahren zu seiner Herstellung | |
ATA102392A (de) | Topisches terbinafinpräparat und verfahren zu seiner herstellung | |
DE69221217D1 (de) | Verbundfilm und Verfahren zu seiner Herstellung | |
DE69231756D1 (de) | Optisches Gerät und Verfahren zu seiner Herstellung | |
DE69120892D1 (de) | Gleitschutzhandschuh und Verfahren zu seiner Herstellung | |
DE69225439D1 (de) | Verdichter und Verfahren zu seiner Herstellung | |
DE69114158D1 (de) | Immunoglobulin G und Verfahren zu seiner Herstellung. | |
DE69216692D1 (de) | Kondensator und Verfahren zu seiner Herstellung | |
DE69124679D1 (de) | Beschleunigungsmesser und Verfahren zu seiner Herstellung | |
DE69403622D1 (de) | Photoelektrischer Unterbrecher und Verfahren zu seiner Herstellung | |
DE69301771D1 (de) | T-Butyl-R-(-)-4-cyano-3-hydroxybutyrat und Verfahren zu seiner Herstellung | |
DE69207059D1 (de) | Optischer Isolator und Verfahren zu seiner Herstellung | |
DE69116717D1 (de) | Kondensator und Verfahren zu seiner Herstellung | |
DE59209470D1 (de) | Halbleiterbauelement und Verfahren zu seiner Herstellung | |
DE69125593D1 (de) | Dynamisches RAM und Verfahren zu seiner Herstellung | |
DE69433156D1 (de) | Varistor und Verfahren zu seiner Herstellung | |
DE69223281D1 (de) | Poly(para-t-butyloxycarbonyl-oxystyrol) und Verfahren zu seiner Herstellung | |
DE69203217D1 (de) | Waschmittelzusammensetzungen und Verfahren zu deren Herstellung. | |
DE69223587D1 (de) | Carboxyalkylpolysaccharide und Verfahren zu ihrer Herstellung | |
DE69114420D1 (de) | Organozyklosiloxane und Verfahren zu ihrer Herstellung. | |
DE69215551D1 (de) | Kohlenstoffaser und Verfahren zu seiner Herstellung | |
DE69106627D1 (de) | Oligohexafluorpropylenverbindungen und Verfahren zu ihrer Herstellung. | |
DE69523655D1 (de) | Beschleunigungsmessaufnehmer und Verfahren zu seiner Herstellung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |