DE69209647D1 - Verfahren und vorrichtung zur erzeugung einer flachen e.c.r.-schicht in einem microwellenplasmaapparat - Google Patents

Verfahren und vorrichtung zur erzeugung einer flachen e.c.r.-schicht in einem microwellenplasmaapparat

Info

Publication number
DE69209647D1
DE69209647D1 DE69209647T DE69209647T DE69209647D1 DE 69209647 D1 DE69209647 D1 DE 69209647D1 DE 69209647 T DE69209647 T DE 69209647T DE 69209647 T DE69209647 T DE 69209647T DE 69209647 D1 DE69209647 D1 DE 69209647D1
Authority
DE
Germany
Prior art keywords
flat
producing
layer
microwave plasma
plasma machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69209647T
Other languages
English (en)
Other versions
DE69209647T2 (de
Inventor
Ching-Hwa Chen
Gerald Yin
Takashi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24930045&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69209647(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of DE69209647D1 publication Critical patent/DE69209647D1/de
Application granted granted Critical
Publication of DE69209647T2 publication Critical patent/DE69209647T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
DE69209647T 1991-07-12 1992-07-10 Verfahren und vorrichtung zur erzeugung einer flachen e.c.r.-schicht in einem microwellenplasmaapparat Revoked DE69209647T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/729,211 US5198725A (en) 1991-07-12 1991-07-12 Method of producing flat ecr layer in microwave plasma device and apparatus therefor
PCT/US1992/005674 WO1993001698A1 (en) 1991-07-12 1992-07-10 Method of producing flat ecr layer in microwave plasma device and apparatus therefor

Publications (2)

Publication Number Publication Date
DE69209647D1 true DE69209647D1 (de) 1996-05-09
DE69209647T2 DE69209647T2 (de) 1996-08-29

Family

ID=24930045

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69209647T Revoked DE69209647T2 (de) 1991-07-12 1992-07-10 Verfahren und vorrichtung zur erzeugung einer flachen e.c.r.-schicht in einem microwellenplasmaapparat

Country Status (4)

Country Link
US (1) US5198725A (de)
EP (1) EP0594706B1 (de)
DE (1) DE69209647T2 (de)
WO (1) WO1993001698A1 (de)

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US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
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JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
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JP6009171B2 (ja) * 2012-02-14 2016-10-19 東京エレクトロン株式会社 基板処理装置
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Also Published As

Publication number Publication date
EP0594706B1 (de) 1996-04-03
EP0594706A4 (en) 1994-08-17
DE69209647T2 (de) 1996-08-29
EP0594706A1 (de) 1994-05-04
US5198725A (en) 1993-03-30
WO1993001698A1 (en) 1993-01-21

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation