DE69200247D1 - Entladungsgepumpter Gaslaser mit Baffle-Trennung für kontrollierten Gasfluss an Vorionisierern. - Google Patents

Entladungsgepumpter Gaslaser mit Baffle-Trennung für kontrollierten Gasfluss an Vorionisierern.

Info

Publication number
DE69200247D1
DE69200247D1 DE69200247T DE69200247T DE69200247D1 DE 69200247 D1 DE69200247 D1 DE 69200247D1 DE 69200247 T DE69200247 T DE 69200247T DE 69200247 T DE69200247 T DE 69200247T DE 69200247 D1 DE69200247 D1 DE 69200247D1
Authority
DE
Germany
Prior art keywords
ionizers
discharge
gas flow
pumped
baffle separation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69200247T
Other languages
English (en)
Other versions
DE69200247T2 (de
Inventor
Takuhiro Ono
Naoya Horiuchi
Keiichiro Yamanaka
Kenichi Takahata
Nobuaki Furuya
Takeo Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3092019A external-priority patent/JPH04322481A/ja
Priority claimed from JP3092018A external-priority patent/JPH04322478A/ja
Priority claimed from JP3265888A external-priority patent/JPH057041A/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69200247D1 publication Critical patent/DE69200247D1/de
Publication of DE69200247T2 publication Critical patent/DE69200247T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE69200247T 1991-04-23 1992-04-22 Entladungsgepumpter Gaslaser mit Baffle-Trennung für kontrollierten Gasfluss an Vorionisierern. Expired - Fee Related DE69200247T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP3092019A JPH04322481A (ja) 1991-04-23 1991-04-23 放電励起ガスレーザ装置
JP3092018A JPH04322478A (ja) 1991-04-23 1991-04-23 放電励起ガスレーザ装置
JP9403091 1991-04-24
JP3265888A JPH057041A (ja) 1991-04-24 1991-10-15 放電励起ガスレーザ装置

Publications (2)

Publication Number Publication Date
DE69200247D1 true DE69200247D1 (de) 1994-08-25
DE69200247T2 DE69200247T2 (de) 1994-11-24

Family

ID=27467973

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69200247T Expired - Fee Related DE69200247T2 (de) 1991-04-23 1992-04-22 Entladungsgepumpter Gaslaser mit Baffle-Trennung für kontrollierten Gasfluss an Vorionisierern.

Country Status (5)

Country Link
US (1) US5239553A (de)
EP (1) EP0510605B1 (de)
KR (1) KR950013054B1 (de)
CA (1) CA2066875C (de)
DE (1) DE69200247T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5426661A (en) * 1993-11-09 1995-06-20 Hughes Aircraft Company Pulsed laser discharge stabilization
DE4417468A1 (de) * 1994-05-19 1995-11-23 Trumpf Lasertechnik Gmbh Gaslaser
US6636545B2 (en) * 1996-09-26 2003-10-21 Alexander V. Krasnov Supersonic and subsonic laser with radio frequency excitation
US5682400A (en) * 1995-09-27 1997-10-28 Krasnov; Alexander V. Supersonic and subsonic laser with high frequency discharge excitation
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
US6466599B1 (en) * 1999-04-07 2002-10-15 Lambda Physik Ag Discharge unit for a high repetition rate excimer or molecular fluorine laser
US6330260B1 (en) * 1999-03-19 2001-12-11 Cymer, Inc. F2 laser with visible red and IR control
US6973112B2 (en) * 2003-07-31 2005-12-06 Visx, Incorporated Passive gas flow management and filtration device for use in an excimer or transverse discharge laser
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
US11095088B1 (en) 2018-02-21 2021-08-17 Zoyka Llc Multi-pass coaxial molecular gas laser

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4635269A (en) * 1985-02-08 1987-01-06 Laser Corporation Of America Flowing gas laser having screening for smoothing low turbulence flow
US4646310A (en) * 1986-01-08 1987-02-24 Amada Engineering Service Co., Inc. Flow control device for a laser generator
JPS63100786A (ja) * 1986-10-17 1988-05-02 Komatsu Ltd ガスレ−ザ装置
DE3916008C1 (de) * 1989-05-17 1990-11-08 Heraeus Holding Gmbh, 6450 Hanau, De

Also Published As

Publication number Publication date
EP0510605A1 (de) 1992-10-28
DE69200247T2 (de) 1994-11-24
EP0510605B1 (de) 1994-07-20
CA2066875A1 (en) 1992-10-24
KR920020793A (ko) 1992-11-21
US5239553A (en) 1993-08-24
CA2066875C (en) 1996-05-21
KR950013054B1 (ko) 1995-10-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee