DE69129509D1 - Filmbelichtungsapparat und Belichtungsverfahren unter Verwendung dieses Apparates - Google Patents

Filmbelichtungsapparat und Belichtungsverfahren unter Verwendung dieses Apparates

Info

Publication number
DE69129509D1
DE69129509D1 DE69129509T DE69129509T DE69129509D1 DE 69129509 D1 DE69129509 D1 DE 69129509D1 DE 69129509 T DE69129509 T DE 69129509T DE 69129509 T DE69129509 T DE 69129509T DE 69129509 D1 DE69129509 D1 DE 69129509D1
Authority
DE
Germany
Prior art keywords
exposure
film
exposure method
film exposure
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129509T
Other languages
English (en)
Other versions
DE69129509T2 (de
Inventor
Manabu Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE69129509D1 publication Critical patent/DE69129509D1/de
Application granted granted Critical
Publication of DE69129509T2 publication Critical patent/DE69129509T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0393—Flexible materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69129509T 1990-03-30 1991-03-25 Filmbelichtungsapparat und Belichtungsverfahren unter Verwendung dieses Apparates Expired - Fee Related DE69129509T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8133690 1990-03-30

Publications (2)

Publication Number Publication Date
DE69129509D1 true DE69129509D1 (de) 1998-07-09
DE69129509T2 DE69129509T2 (de) 1998-10-01

Family

ID=13743533

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129509T Expired - Fee Related DE69129509T2 (de) 1990-03-30 1991-03-25 Filmbelichtungsapparat und Belichtungsverfahren unter Verwendung dieses Apparates

Country Status (3)

Country Link
US (1) US5198857A (de)
EP (1) EP0449180B1 (de)
DE (1) DE69129509T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363171A (en) * 1993-07-29 1994-11-08 The United States Of America As Represented By The Director, National Security Agency Photolithography exposure tool and method for in situ photoresist measurments and exposure control
US5652645A (en) * 1995-07-24 1997-07-29 Anvik Corporation High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates
JP3376935B2 (ja) * 1999-01-25 2003-02-17 ウシオ電機株式会社 帯状ワークの露光装置
US6278483B1 (en) 1999-03-25 2001-08-21 Eastman Kodak Company Image registration on repeated scans using fiducial marks
DE10064292C1 (de) * 2000-12-22 2002-10-31 Karl Suess Kg Praez Sgeraete F Vorrichtung zum Transportieren eines Filmes
JP2006102991A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
KR101136444B1 (ko) * 2006-06-07 2012-04-19 브이 테크놀로지 씨오. 엘티디 노광 방법 및 노광 장치
JP4386929B2 (ja) * 2007-04-09 2009-12-16 日東電工株式会社 Ｔａｂ用テープキャリアの製造方法
TWI443472B (zh) * 2007-07-13 2014-07-01 尼康股份有限公司 Pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method and element
JP5144992B2 (ja) * 2007-08-27 2013-02-13 株式会社オーク製作所 露光装置
EP2095946A1 (de) * 2008-02-27 2009-09-02 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO System zur Strukturierung von flexiblen Folien
WO2010075158A1 (en) 2008-12-23 2010-07-01 3M Innovative Properties Company Roll-to-roll digital photolithography
US8610986B2 (en) * 2009-04-06 2013-12-17 The Board Of Trustees Of The University Of Illinois Mirror arrays for maskless photolithography and image display
KR101948467B1 (ko) * 2010-02-12 2019-02-14 가부시키가이샤 니콘 기판 처리 장치 및 기판 처리 방법
JP5538048B2 (ja) 2010-04-22 2014-07-02 日東電工株式会社 アライメントマークの検出方法および配線回路基板の製造方法
JP5538049B2 (ja) 2010-04-22 2014-07-02 日東電工株式会社 フォトマスクと基材との位置合わせ方法および配線回路基板の製造方法
JP6510768B2 (ja) * 2014-05-23 2019-05-08 株式会社オーク製作所 露光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3689991A (en) * 1968-03-01 1972-09-12 Gen Electric A method of manufacturing a semiconductor device utilizing a flexible carrier
US4109158A (en) * 1976-05-27 1978-08-22 Western Electric Company, Inc. Apparatus for positioning a pair of elements into aligned intimate contact
JPS55149929A (en) * 1979-05-10 1980-11-21 Dainippon Screen Mfg Co Ltd Positioning method of projected image in projection enlarger
JPH01503100A (ja) * 1986-06-24 1989-10-19 ロージアン　マイクロファブリケイション　リミティド 写真印刷における符合方法及びその方法を実施するための装置
SE453882B (sv) * 1986-07-24 1988-03-14 Johansson Eva Emne till kledesplagg samt anvendning av emnet for framstellning av ett kledesplagg
US4855792A (en) * 1988-05-13 1989-08-08 Mrs Technology, Inc. Optical alignment system for use in photolithography and having reduced reflectance errors
JP2682840B2 (ja) * 1988-05-27 1997-11-26 マミヤ・オーピー株式会社 露光装置におけるフイルムの位置決め方法及びその装置
JP2790469B2 (ja) * 1988-11-24 1998-08-27 ウシオ電機株式会社 フィルム露光装置

Also Published As

Publication number Publication date
EP0449180A3 (en) 1992-05-13
EP0449180B1 (de) 1998-06-03
EP0449180A2 (de) 1991-10-02
DE69129509T2 (de) 1998-10-01
US5198857A (en) 1993-03-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee