DE69122740T2 - Reinigungsverfahren - Google Patents

Reinigungsverfahren

Info

Publication number
DE69122740T2
DE69122740T2 DE69122740T DE69122740T DE69122740T2 DE 69122740 T2 DE69122740 T2 DE 69122740T2 DE 69122740 T DE69122740 T DE 69122740T DE 69122740 T DE69122740 T DE 69122740T DE 69122740 T2 DE69122740 T2 DE 69122740T2
Authority
DE
Germany
Prior art keywords
cleaning procedure
cleaning
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69122740T
Other languages
English (en)
Other versions
DE69122740D1 (de
Inventor
Minoru Inada
Yasutaka Imajo
Masahide Uchino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Momentive Performance Materials Japan LLC
Original Assignee
Toshiba Corp
Japan Field Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2220304A external-priority patent/JPH0759282B2/ja
Priority claimed from JP2229221A external-priority patent/JPH0632797B2/ja
Priority claimed from JP24197490A external-priority patent/JP2901090B2/ja
Priority claimed from JP03020471A external-priority patent/JP3105271B2/ja
Application filed by Toshiba Corp, Japan Field Co Ltd filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69122740D1 publication Critical patent/DE69122740D1/de
Publication of DE69122740T2 publication Critical patent/DE69122740T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/041—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5018—Halogenated solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02803—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus
    • C11D2111/22—
    • C11D2111/44—
    • C11D2111/48—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/24—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
DE69122740T 1990-08-22 1991-08-22 Reinigungsverfahren Expired - Fee Related DE69122740T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2220304A JPH0759282B2 (ja) 1990-08-22 1990-08-22 可燃性溶剤の蒸留方法および装置
JP2229221A JPH0632797B2 (ja) 1990-08-30 1990-08-30 アルコールを用いた洗浄方法および装置
JP24197490A JP2901090B2 (ja) 1990-09-12 1990-09-12 洗浄方法および洗浄装置
JP24197590 1990-09-12
JP03020471A JP3105271B2 (ja) 1991-01-21 1991-01-21 被洗浄物の濯ぎ洗浄方法及びその装置
PCT/JP1991/001113 WO1992003205A1 (fr) 1990-08-22 1991-08-22 Procede et dispositif de nettoyage

Publications (2)

Publication Number Publication Date
DE69122740D1 DE69122740D1 (de) 1996-11-21
DE69122740T2 true DE69122740T2 (de) 1997-04-10

Family

ID=27520232

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69122740T Expired - Fee Related DE69122740T2 (de) 1990-08-22 1991-08-22 Reinigungsverfahren

Country Status (10)

Country Link
EP (1) EP0496899B1 (de)
KR (1) KR0121453B1 (de)
AU (3) AU654297B2 (de)
CA (1) CA2066753A1 (de)
DE (1) DE69122740T2 (de)
DK (1) DK0496899T3 (de)
ES (1) ES2095949T3 (de)
RU (1) RU2095162C1 (de)
SG (1) SG49923A1 (de)
WO (1) WO1992003205A1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011077004A1 (de) 2011-06-06 2012-12-06 Wacker Chemie Ag Siliconlöser
DE102011088885A1 (de) 2011-12-16 2013-06-20 Wacker Chemie Ag Siliconlöser
DE102016002329A1 (de) * 2016-02-29 2017-08-31 Karl Roll Gmbh & Co. Kg Oberflächenbehandlungsanlage, insbesondere Reihentauchanlage, für die industrielle Reinigungstechnik

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07121322B1 (de) * 1991-08-30 1995-12-25
FR2701872B1 (fr) * 1993-02-23 1995-04-07 Air Liquide Procédé de traitement d'objets à l'aide d'un liquide volatil inflammable.
FR2708876B1 (fr) * 1993-08-13 1995-11-03 Branson Ultrasons Machine de nettoyage-rinçage-séchage de pièces industrielles.
US5628833A (en) * 1994-10-13 1997-05-13 Dow Corning Corporation Two-step cleaning or dewatering with siloxane azeotropes
US6506459B2 (en) 1995-01-20 2003-01-14 3M Innovative Properties Company Coating compositions containing alkoxy substituted perfluoro compounds
US5718293A (en) * 1995-01-20 1998-02-17 Minnesota Mining And Manufacturing Company Fire extinguishing process and composition
US6548471B2 (en) 1995-01-20 2003-04-15 3M Innovative Properties Company Alkoxy-substituted perfluorocompounds
US5925611A (en) 1995-01-20 1999-07-20 Minnesota Mining And Manufacturing Company Cleaning process and composition
KR100474764B1 (ko) 1995-12-15 2005-08-05 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 세정방법및세정조성물
ATE480868T1 (de) * 2004-03-22 2010-09-15 Rena Sondermaschinen Gmbh Verfahren zur behandlung von substratoberflächen
US20100108094A1 (en) 2005-07-29 2010-05-06 Junichi Ishikawa Solvent Composition for Removing Radioactive Substance and Removing Material, and Method for Removing Radioactive Substance
DE102009014380A1 (de) 2009-03-26 2010-10-07 Bubbles And Beyond Gmbh Verfahren und Zusammensetzung zum Reinigen von Gegenständen
CN103817104A (zh) * 2013-05-27 2014-05-28 成都众山科技有限公司 一种操作简单的车用气阀清洗装置
CN103817105A (zh) * 2013-05-27 2014-05-28 成都众山科技有限公司 方便操作的车用气阀清洗装置
US10278847B2 (en) * 2015-08-11 2019-05-07 Mokita Medical Gmbh I.Gr. Systems and methods for removing air from medical devices
US10610394B2 (en) 2015-08-11 2020-04-07 Mokita Medical Gmbh Systems and methods for using perfluorocarbons to remove gases from medical devices
CN107088549A (zh) * 2017-06-07 2017-08-25 安徽生信铝业股份有限公司 一种铝合金表面水洗装置及水洗方法
CN107876514B (zh) * 2017-11-15 2020-11-13 浙江杭海镀锌钢管有限公司 一种长钢管外表面的清洗装置
CN108246717A (zh) * 2018-03-23 2018-07-06 盐城川流汽车配件有限公司 一种汽车模具清洗设备
CN109201595B (zh) * 2018-08-02 2021-04-20 湖南百尼茶庵茶业有限公司 一种具有快速风干功能的茶制品加工用茶叶清洗装置
RU2691350C1 (ru) * 2018-09-19 2019-06-11 Общество с ограниченной ответственностью "ПКФ Альянс" Способ очистки поверхностей деталей машин и газовыхлопных трактов от нагара
CN109877103B (zh) * 2019-03-22 2021-01-15 玉环震浪超声股份有限公司 一种超声波清洗机
CN110153109A (zh) * 2019-04-11 2019-08-23 横店集团东磁股份有限公司 蒸汽清洗机及清洗方法
KR20220035174A (ko) * 2019-07-11 2022-03-21 엘지전자 주식회사 세정기 및 그를 갖는 세정 시스템
CN110591123B (zh) * 2019-08-08 2022-07-01 江苏龙蟠科技股份有限公司 一种用于去除固化硅橡胶的溶解剂及其制备方法
CN111632924A (zh) * 2020-06-01 2020-09-08 田魏华 一种五金加工用浸泡式零部件清洗装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939162B2 (ja) * 1981-06-20 1984-09-21 ダイキン工業株式会社 洗滌乾燥装置
US4584122A (en) * 1984-11-28 1986-04-22 Allied Corporation Azeotrope-like compositions of trichlorotrifluoroethane, ethanol, nitromethane and 2-methylpentane or a mixture of hexanes
US4711256A (en) * 1985-04-19 1987-12-08 Robert Kaiser Method and apparatus for removal of small particles from a surface
US4726000A (en) * 1985-04-20 1988-02-16 Diehl Gmbh & Co. Timepiece
ES2103705T3 (es) * 1988-07-08 1997-10-01 Rhone Poulenc Chimie Limpieza y secado de conjuntos electronicos.
JPH0291688U (de) * 1988-12-29 1990-07-20
JPH02184302A (ja) * 1989-01-09 1990-07-18 Taisei Shokai:Kk 物品の水切り方法
US5051135A (en) * 1989-01-30 1991-09-24 Kabushiki Kaisha Tiyoda Seisakusho Cleaning method using a solvent while preventing discharge of solvent vapors to the environment
JPH0342002A (ja) * 1989-07-07 1991-02-22 Taisei Shokai:Kk 物品の洗浄・水切り方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011077004A1 (de) 2011-06-06 2012-12-06 Wacker Chemie Ag Siliconlöser
WO2012168203A1 (de) 2011-06-06 2012-12-13 Wacker Chemie Ag Siliconlöser
US8859477B2 (en) 2011-06-06 2014-10-14 Wacker Chemie Ag Silicone solvent
DE102011088885A1 (de) 2011-12-16 2013-06-20 Wacker Chemie Ag Siliconlöser
US9309488B2 (en) 2011-12-16 2016-04-12 Wacker Chemie Ag Silicone solvent
DE102016002329A1 (de) * 2016-02-29 2017-08-31 Karl Roll Gmbh & Co. Kg Oberflächenbehandlungsanlage, insbesondere Reihentauchanlage, für die industrielle Reinigungstechnik
DE102016002329B4 (de) 2016-02-29 2021-10-21 Karl Roll Gmbh & Co. Kg Oberflächenbehandlungsanlage, insbesondere Reihentauchanlage, für die industrielle Reinigungstechnik

Also Published As

Publication number Publication date
ES2095949T3 (es) 1997-03-01
WO1992003205A1 (fr) 1992-03-05
EP0496899A4 (en) 1993-02-24
AU654297B2 (en) 1994-11-03
AU7284094A (en) 1994-11-17
SG49923A1 (en) 1998-06-15
KR920702244A (ko) 1992-09-03
AU8393691A (en) 1992-03-17
CA2066753A1 (en) 1992-02-23
DE69122740D1 (de) 1996-11-21
KR0121453B1 (en) 1997-11-15
EP0496899A1 (de) 1992-08-05
RU2095162C1 (ru) 1997-11-10
AU660880B2 (en) 1995-07-06
AU7284294A (en) 1994-11-17
EP0496899B1 (de) 1996-10-16
DK0496899T3 (da) 1997-03-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: TOSHIBA SILICONE CO., LTD., TOKIO/TOKYO, JP JAPAN

8339 Ceased/non-payment of the annual fee