DE69115446D1 - Musterverschiebungsmessmethode - Google Patents

Musterverschiebungsmessmethode

Info

Publication number
DE69115446D1
DE69115446D1 DE69115446T DE69115446T DE69115446D1 DE 69115446 D1 DE69115446 D1 DE 69115446D1 DE 69115446 T DE69115446 T DE 69115446T DE 69115446 T DE69115446 T DE 69115446T DE 69115446 D1 DE69115446 D1 DE 69115446D1
Authority
DE
Germany
Prior art keywords
measurement method
displacement measurement
pattern displacement
pattern
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69115446T
Other languages
English (en)
Other versions
DE69115446T2 (de
Inventor
Katsuhiko Miki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of DE69115446D1 publication Critical patent/DE69115446D1/de
Application granted granted Critical
Publication of DE69115446T2 publication Critical patent/DE69115446T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
DE69115446T 1990-10-31 1991-09-23 Musterverschiebungsmessmethode Expired - Fee Related DE69115446T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2296977A JPH07111340B2 (ja) 1990-10-31 1990-10-31 パターンシフト測定方法

Publications (2)

Publication Number Publication Date
DE69115446D1 true DE69115446D1 (de) 1996-01-25
DE69115446T2 DE69115446T2 (de) 1996-05-02

Family

ID=17840655

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69115446T Expired - Fee Related DE69115446T2 (de) 1990-10-31 1991-09-23 Musterverschiebungsmessmethode

Country Status (4)

Country Link
US (1) US5241361A (de)
EP (1) EP0484665B1 (de)
JP (1) JPH07111340B2 (de)
DE (1) DE69115446T2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7112953B2 (en) * 2004-08-18 2006-09-26 Texas Instruments Incorporated Method for detecting epitaxial (EPI) induced buried layer shifts in semiconductor devices

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4385837A (en) * 1978-05-22 1983-05-31 Irvine Optical Corporation Apparatus and system for linewidth measurements
US4260259A (en) * 1978-12-29 1981-04-07 International Business Machines Corporation Metal etch rate analyzer
JPS5696203A (en) * 1979-12-27 1981-08-04 Fujitsu Ltd Detection device for optical position
US4362389A (en) * 1980-02-19 1982-12-07 Hitachi, Ltd. Method and apparatus for projection type mask alignment
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
JPS61217704A (ja) * 1985-03-22 1986-09-27 Dainippon Screen Mfg Co Ltd 線幅測定装置
US4906097A (en) * 1987-11-13 1990-03-06 Lasersense, Inc. Imaging and inspection apparatus and method
US4953982A (en) * 1988-07-20 1990-09-04 Applied Materials, Inc. Method and apparatus for endpoint detection in a semiconductor wafer etching system

Also Published As

Publication number Publication date
JPH07111340B2 (ja) 1995-11-29
JPH04168312A (ja) 1992-06-16
EP0484665A3 (en) 1993-07-07
US5241361A (en) 1993-08-31
DE69115446T2 (de) 1996-05-02
EP0484665B1 (de) 1995-12-13
EP0484665A2 (de) 1992-05-13

Similar Documents

Publication Publication Date Title
DE69033803D1 (de) Positionsauswerteschaltung
DK0653645T3 (da) Afstandsmålesystem
DE69120320D1 (de) Erdbewegungsmaschine
DK0450730T3 (da) Kloak-skæreapparat
DE69130755D1 (de) Prüfeinrichtung
DE69131682D1 (de) Musterherstellungssystem
DK80890D0 (da) Thien-triazol-diazepin-derivater
DE69128667T2 (de) Positionsbestimmungsmethode
ITTO911046A1 (it) Metodo di sgrassaggio-pulitura
DE69029644D1 (de) Kodierer
DE69024139D1 (de) Fixiermethode
DE69127854D1 (de) Musterverarbeitungsverfahren
ID870B (id) Metode pembuatan ritsleting
IT9020623A0 (it) procedimento
NO913937D0 (no) Halvt neddykkbar produksjonsplattform
DE69128837D1 (de) Füllstandsmessung
IT8940053A0 (it) Profilatrice
MC2108A1 (fr) Derives de quinoleine
FI99161B (fi) Pituudenmittauslaite
DE69115446D1 (de) Musterverschiebungsmessmethode
IT1238759B (it) Apparecchio montapanna
BR9005820A (pt) Sensor
ATA6889A (de) Laengenmessverfahren
FI973553A0 (fi) Mittausmenetelmä
DE69131397T2 (de) Mustererkennung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee