DE69107038D1 - Vorrichtung und Tiegel zur Abscheidung aus der Gasphase. - Google Patents

Vorrichtung und Tiegel zur Abscheidung aus der Gasphase.

Info

Publication number
DE69107038D1
DE69107038D1 DE69107038T DE69107038T DE69107038D1 DE 69107038 D1 DE69107038 D1 DE 69107038D1 DE 69107038 T DE69107038 T DE 69107038T DE 69107038 T DE69107038 T DE 69107038T DE 69107038 D1 DE69107038 D1 DE 69107038D1
Authority
DE
Germany
Prior art keywords
compartments
crucible
diffusers
compartment
separation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69107038T
Other languages
English (en)
Other versions
DE69107038T2 (de
Inventor
Dominique Valentian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Aircraft Engines SAS
Original Assignee
EUROPEENNE DE PROPULSION SURESNES FR Ste
Societe Europeenne de Propulsion SEP SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EUROPEENNE DE PROPULSION SURESNES FR Ste, Societe Europeenne de Propulsion SEP SA filed Critical EUROPEENNE DE PROPULSION SURESNES FR Ste
Application granted granted Critical
Publication of DE69107038D1 publication Critical patent/DE69107038D1/de
Publication of DE69107038T2 publication Critical patent/DE69107038T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B30/00—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions
    • C30B30/08—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions in conditions of zero-gravity or low gravity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
DE69107038T 1990-12-07 1991-11-29 Vorrichtung und Tiegel zur Abscheidung aus der Gasphase. Expired - Fee Related DE69107038T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9015368A FR2670219B1 (fr) 1990-12-07 1990-12-07 Appareil et creuset pour depot en phase vapeur.

Publications (2)

Publication Number Publication Date
DE69107038D1 true DE69107038D1 (de) 1995-03-09
DE69107038T2 DE69107038T2 (de) 1995-06-22

Family

ID=9403020

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69107038T Expired - Fee Related DE69107038T2 (de) 1990-12-07 1991-11-29 Vorrichtung und Tiegel zur Abscheidung aus der Gasphase.

Country Status (9)

Country Link
US (1) US5140939A (de)
EP (1) EP0490727B1 (de)
JP (1) JPH04293768A (de)
AT (1) ATE117736T1 (de)
CA (1) CA2056816A1 (de)
DE (1) DE69107038T2 (de)
ES (1) ES2070463T3 (de)
FR (1) FR2670219B1 (de)
IE (1) IE914131A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421780A (ja) * 1990-05-14 1992-01-24 Sharp Corp 気相成長装置
US5253266A (en) * 1992-07-20 1993-10-12 Intevac, Inc. MBE effusion source with asymmetrical heaters
KR100401544B1 (ko) 2001-02-06 2003-10-17 삼성전자주식회사 반도체 공정에 사용되는 가스를 제공하는 방법 및 장치그리고 이를 갖는 가공 장치
KR100754404B1 (ko) * 2006-05-25 2007-08-31 삼성전자주식회사 확산튜브와, 확산공정용 도펀트 소스 및 상기 확산튜브와도펀트 소스를 이용한 확산방법
CN108004512A (zh) * 2018-01-17 2018-05-08 京东方科技集团股份有限公司 一种蒸发源以及蒸镀装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1112044B (de) * 1959-12-05 1961-08-03 Akad Wissenschaften Ddr Verfahren und Vorrichtung zur Gewinnung von Kristallen aus der Dampfphase
US3343518A (en) * 1964-09-30 1967-09-26 Hayes Inc C I High temperature furnace
US3828722A (en) * 1970-05-01 1974-08-13 Cogar Corp Apparatus for producing ion-free insulating layers
US3632429A (en) * 1970-06-30 1972-01-04 Matsushita Electric Ind Co Ltd Method for making metal oxide film resistors
DE2033444C3 (de) * 1970-07-06 1979-02-15 Siemens Ag Vorrichtung zum Eindiffundieren von Dotierstoffen in Scheiben aus Halbleitermaterial
AU485215B2 (en) * 1973-11-28 1976-05-20 Unisearch Limited Method for vapour growing crystals
US4211182A (en) * 1978-05-05 1980-07-08 Rca Corporation Diffusion apparatus
US4204893A (en) * 1979-02-16 1980-05-27 Bell Telephone Laboratories, Incorporated Process for depositing chrome doped epitaxial layers of gallium arsenide utilizing a preliminary formed chemical vapor-deposited chromium oxide dopant source
JPS62153192A (ja) * 1985-12-26 1987-07-08 Sharp Corp 化合物半導体の結晶成長方法

Also Published As

Publication number Publication date
EP0490727B1 (de) 1995-01-25
JPH04293768A (ja) 1992-10-19
ATE117736T1 (de) 1995-02-15
FR2670219B1 (fr) 1993-03-19
ES2070463T3 (es) 1995-06-01
CA2056816A1 (en) 1992-06-08
DE69107038T2 (de) 1995-06-22
EP0490727A1 (de) 1992-06-17
US5140939A (en) 1992-08-25
IE914131A1 (en) 1992-06-17
FR2670219A1 (fr) 1992-06-12

Similar Documents

Publication Publication Date Title
TR26217A (tr) GAZ üRETME MADDELERINDEN GAZ üRETILMESI ICIN VE VEYA BIR GAZIN ISLAH EDILMESI ICIN ISLEM VE AYGIT VE BU ISLEMIN GERCEKLESTIRILMESI ICIN YüKSEK SICAKLIK ISI ESANJÖRü.
FR2631165B1 (fr) Support conditionneur de temperature pour petits objets tels que des composants semi-conducteurs et procede de regulation thermique utilisant ce support
ES535550A0 (es) Aparato para deposicion quimica de vapor
DE59814433D1 (de) Thermopile-Sensor und Strahlungsthermometer mit einem Thermopile-Sensor
ATE103062T1 (de) Verfahren und vorrichtung zur schnellregulierung einer wandtemperatur.
SE7606679L (sv) Sett och anordning for kylning
BR9506833A (pt) Resfriador refratário interno
DE69107038D1 (de) Vorrichtung und Tiegel zur Abscheidung aus der Gasphase.
NL184429C (nl) Inrichting voor het koelen van hoogovengas.
ATE121556T1 (de) Tiefkühlbarer elektrischer hohlleiter.
IT7924578A0 (it) Dispositivo di raffreddamento per gas caldi in condotte, in particolare di forni.
FR2671628B1 (fr) Appareil pour mesurer la temperature de chauffage dans un champ electrique intense de micro-ondes.
DE69409950T2 (de) Wärmeverteilvorrichtung für gasgrill
IL31844A (en) Process for the cooling of cleavage-gas or synthesised gas and similar gases as well as heat exchanger for carrying out this process
NO152883C (no) Hoeytemperaturbrenner og fremgangsmaate ved drift av saadan.
DE69115854D1 (de) Rost zur thermischen Behandlung mit hoher Temperatur
FR2508064B1 (fr) Procede de degraissage d'une bande laminee a froid
FI882207A (fi) Haollarelement av grafit foer uppvaermningsstavar i industriugnar.
ATE75182T1 (de) Kuehlungs- oder heizungsvorrichtung fuer z.b. gasleitungen.
FR2860862B1 (fr) Procede de traitement thermique d'une serie d'objets et appareil associe
JPS5394872A (en) Fixing supporter for molecule beam evaporation source cell
KR920012920U (ko) 금속열처리 시편의 재사용이 가능한 내부온도 측정장치
IT1183148B (it) Dispositivo di isolamento termico, particolarmente applicabile a complessi di regolazione e comando degli apparecchi di cottura
ATE184695T1 (de) Vorrichtung zum festlegen von rohrleitungen
PL201219A1 (pl) Urzadzenie do regulacji temperatury przy podgrzewaniu lub chlodzeniu cieczy i gazow

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SOCIETE NATIONALE D'ETUDE ET DE CONSTRUCTION DE MO

8339 Ceased/non-payment of the annual fee