DE69019558T2 - Verfahren und Gerät zur Kontrolle des Verlaufs einer Flüssigkeit zur Minimisierung der Partikelkontamination. - Google Patents

Verfahren und Gerät zur Kontrolle des Verlaufs einer Flüssigkeit zur Minimisierung der Partikelkontamination.

Info

Publication number
DE69019558T2
DE69019558T2 DE69019558T DE69019558T DE69019558T2 DE 69019558 T2 DE69019558 T2 DE 69019558T2 DE 69019558 T DE69019558 T DE 69019558T DE 69019558 T DE69019558 T DE 69019558T DE 69019558 T2 DE69019558 T2 DE 69019558T2
Authority
DE
Germany
Prior art keywords
controlling
liquid
flow
particle contamination
minimize particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69019558T
Other languages
English (en)
Other versions
DE69019558D1 (de
Inventor
Michael Edward Mack
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Axcelis Technologies Inc
Original Assignee
Eaton Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Corp filed Critical Eaton Corp
Publication of DE69019558D1 publication Critical patent/DE69019558D1/de
Application granted granted Critical
Publication of DE69019558T2 publication Critical patent/DE69019558T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
    • G05D16/2046—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures
    • G05D16/2053—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures the plurality of throttling means comprising only a first throttling means acting on a higher pressure and a second throttling means acting on a lower pressure, e.g. the atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0396—Involving pressure control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7761—Electrically actuated valve

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Automation & Control Theory (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69019558T 1989-03-03 1990-02-27 Verfahren und Gerät zur Kontrolle des Verlaufs einer Flüssigkeit zur Minimisierung der Partikelkontamination. Expired - Fee Related DE69019558T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/319,257 US4987933A (en) 1989-03-03 1989-03-03 Fluid flow control method and apparatus for minimizing particle contamination

Publications (2)

Publication Number Publication Date
DE69019558D1 DE69019558D1 (de) 1995-06-29
DE69019558T2 true DE69019558T2 (de) 1996-02-01

Family

ID=23241500

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69019558T Expired - Fee Related DE69019558T2 (de) 1989-03-03 1990-02-27 Verfahren und Gerät zur Kontrolle des Verlaufs einer Flüssigkeit zur Minimisierung der Partikelkontamination.

Country Status (6)

Country Link
US (1) US4987933A (de)
EP (1) EP0385709B1 (de)
JP (1) JP3000223B2 (de)
KR (1) KR950011846B1 (de)
CA (1) CA2010604C (de)
DE (1) DE69019558T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5231291A (en) * 1989-08-01 1993-07-27 Canon Kabushiki Kaisha Wafer table and exposure apparatus with the same
US5217053A (en) * 1990-02-05 1993-06-08 Texas Instruments Incorporated Vented vacuum semiconductor wafer cassette
US5308989A (en) * 1992-12-22 1994-05-03 Eaton Corporation Fluid flow control method and apparatus for an ion implanter
DE4419333A1 (de) * 1994-06-02 1995-12-07 Bolz Alfred Gmbh Co Kg Abfüllanlage für gefährliche, schütt- oder fließfähige Medien
US5542458A (en) * 1994-08-22 1996-08-06 Gilbarco Inc. Vapor recovery system for a fuel delivery system
AU5305296A (en) 1995-03-07 1996-09-23 Biomolecular Assays, Inc. Pressure cycling reactor
US5554854A (en) * 1995-07-17 1996-09-10 Eaton Corporation In situ removal of contaminants from the interior surfaces of an ion beam implanter
US5633506A (en) * 1995-07-17 1997-05-27 Eaton Corporation Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses
KR100189981B1 (ko) * 1995-11-21 1999-06-01 윤종용 진공 시스템을 구비한 반도체 소자 제조장치
US5672882A (en) * 1995-12-29 1997-09-30 Advanced Micro Devices, Inc. Ion implantation device with a closed-loop process chamber pressure control system
GB2325561B (en) * 1997-05-20 2001-10-17 Applied Materials Inc Apparatus for and methods of implanting desired chemical species in semiconductor substrates
US6278542B1 (en) 1998-11-23 2001-08-21 Light And Sound Design Ltd. Programmable light beam shape altering device using separate programmable micromirrors for each primary color
FR2807951B1 (fr) * 2000-04-20 2003-05-16 Cit Alcatel Procede et systeme de pompage des chambres de transfert d'equipement de semi-conducteur
DE10144923A1 (de) 2001-09-12 2003-03-27 Guehring Joerg Spanabhebendes Werkzeug mit Wendeschneidplatte
JP5591470B2 (ja) 2005-08-30 2014-09-17 アドバンスト テクノロジー マテリアルズ，インコーポレイテッド 代替フッ化ホウ素前駆体を使用するホウ素イオン注入および注入のための大きな水素化ホウ素の形成
KR101747473B1 (ko) 2009-10-27 2017-06-27 엔테그리스, 아이엔씨. 이온 주입 시스템 및 방법
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
CN106237934B (zh) 2010-08-30 2019-08-27 恩特格里斯公司 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法
TWI583442B (zh) 2011-10-10 2017-05-21 恩特葛瑞斯股份有限公司 Ｂ２ｆ４之製造程序
JP2014146486A (ja) * 2013-01-29 2014-08-14 Jeol Ltd 荷電粒子線装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963043A (en) * 1975-01-02 1976-06-15 Motorola, Inc. Pressure sensing method and apparatus for gases
DE2811345C2 (de) * 1978-03-16 1986-12-11 Knorr-Bremse AG, 8000 München Druckregler für pneumatische Drücke, insbesondere in Fahrzeugen
US4373549A (en) * 1979-02-12 1983-02-15 Hewlett-Packard Company Mass flow/pressure control system
US4433951A (en) * 1981-02-13 1984-02-28 Lam Research Corporation Modular loadlock
JPS5998217A (ja) * 1982-11-26 1984-06-06 Fujikin:Kk 流量制御装置
JPS60189854A (ja) * 1984-03-10 1985-09-27 Shimadzu Corp 試料交換装置
JPS6191375A (ja) * 1984-10-11 1986-05-09 Hitachi Electronics Eng Co Ltd プラズマエツチング装置の排気ベント機構
US4717829A (en) * 1985-03-14 1988-01-05 Varian Associates, Inc. Platen and beam setup flag assembly for ion implanter
US4672210A (en) * 1985-09-03 1987-06-09 Eaton Corporation Ion implanter target chamber
US4705951A (en) * 1986-04-17 1987-11-10 Varian Associates, Inc. Wafer processing system
US4739787A (en) * 1986-11-10 1988-04-26 Stoltenberg Kevin J Method and apparatus for improving the yield of integrated circuit devices
US4836233A (en) * 1988-06-06 1989-06-06 Eclipse Ion Technology, Inc. Method and apparatus for venting vacuum processing equipment

Also Published As

Publication number Publication date
US4987933A (en) 1991-01-29
EP0385709A2 (de) 1990-09-05
KR950011846B1 (ko) 1995-10-11
CA2010604A1 (en) 1990-09-03
JPH02291652A (ja) 1990-12-03
DE69019558D1 (de) 1995-06-29
EP0385709A3 (de) 1991-06-05
EP0385709B1 (de) 1995-05-24
JP3000223B2 (ja) 2000-01-17
KR900014772A (ko) 1990-10-24
CA2010604C (en) 1996-07-02

Similar Documents

Publication Publication Date Title
DE69019558T2 (de) Verfahren und Gerät zur Kontrolle des Verlaufs einer Flüssigkeit zur Minimisierung der Partikelkontamination.
DE69218194D1 (de) Verfahren und vorrichtung zum regeln der erstarrung von flüssigkeiten
DE69328027D1 (de) Verfahren zur verhinderung der kontamination einer chromatographie-säule und vorrichtung zur flüssigchromatographie
DE3873725D1 (de) Verfahren und einrichtung zur kontinuierlichen waermebehandlung eines gemisches aus feststoffen enthaltender fluessigkeit.
DE3682381D1 (de) Verfahren und vorrichtung zur kontrolle einer oberflaeche.
DE3688527D1 (de) Verfahren und vorrichtung zur behandlung einer fluessigkeit.
DE69326839D1 (de) Vorrichtung und verfahren zur cursorbewegungssteuerung
DE69021021T2 (de) Vorrichtung und Verfahren zur Überwachung des Betriebs einer Halbleiteranordnung.
DE69528266T2 (de) Verfahren und vorrichtung zum kontrollierten aufbringen von partikeln auf wafers
DE69109342T2 (de) Verfahren und Vorrichtung zum Bestimmen des Ausflockens von Bestandteilen einer Flüssigkeit.
DE3863089D1 (de) Verfahren und vorrichtung zur entnahme von proben aus einer stroemung eines fluidums.
ATA152785A (de) Verfahren und vorrichtung zum vermindern des gasgehaltes einer flüssigkeit
DE59307156D1 (de) Verfahren und Vorrichtung zur Bewegungssteuerung einer Giesspfanne in einer Giessanlage
DE68909943T2 (de) Verfahren und vorrichtung zur regelung des spritzens von beschichtungsmaterialien.
DE69008818D1 (de) Vorrichtung und verfahren zur kontinuierlichen entfernung von sauerstoff aus flüssigkeitsströmen.
AT357807B (de) Verfahren und vorrichtung zur feststellung des fliesszustandes einer fliessfaehigen substanz
DE69322122T2 (de) Verfahren und Vorrichtung zur Überwachung der Abgabe einer Flüssigkeit
DE59500528D1 (de) Verfahren und Vorrichtung zur Entnahme einer Flüssigkeit aus einer verschlossenen Glasampulle
DE69119060D1 (de) Verfahren und vorrichtung zum regeln der breite einer flootglasscheibe
DE69101237T2 (de) Verfahren und vorrichtung zur dynamischen kontrolle der dimensionen von mechanischen unterteilen.
DE69311010D1 (de) Verfahren und Vorrichtung zum Bestimmen der Position von Grenzflächen zwischen Flüssigkeiten
ATA107479A (de) Verfahren und kontinuierlichen ultrafilteration einer fluessigkeit und vorrichtung zur ausfuehrung des verfahrens
DE69011900D1 (de) Verfahren und Vorrichtungen zur Verdampfung und Kühlung einer Flüssigkeit.
ATA176386A (de) Verfahren zum kontinuierlichen filtrieren einer fluessigkeit und einrichtung zur durchfuehrung des verfahrens
ATA179187A (de) Vorrichtung zur magnetischen behandlung einer stroemenden fluessigkeit

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AXCELIS TECHNOLOGIES, INC., BEVERLY, MASS., US

8339 Ceased/non-payment of the annual fee