DE69019334D1 - GaAs-Passivierung mittels Wasserstoffplasma. - Google Patents
GaAs-Passivierung mittels Wasserstoffplasma.Info
- Publication number
- DE69019334D1 DE69019334D1 DE69019334T DE69019334T DE69019334D1 DE 69019334 D1 DE69019334 D1 DE 69019334D1 DE 69019334 T DE69019334 T DE 69019334T DE 69019334 T DE69019334 T DE 69019334T DE 69019334 D1 DE69019334 D1 DE 69019334D1
- Authority
- DE
- Germany
- Prior art keywords
- hydrogen plasma
- gaas
- passivation
- gaas passivation
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910001218 Gallium arsenide Inorganic materials 0.000 title 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title 1
- 229910052739 hydrogen Inorganic materials 0.000 title 1
- 239000001257 hydrogen Substances 0.000 title 1
- 238000002161 passivation Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/3003—Hydrogenation or deuterisation, e.g. using atomic hydrogen from a plasma
- H01L21/3006—Hydrogenation or deuterisation, e.g. using atomic hydrogen from a plasma of AIIIBV compounds
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Plasma & Fusion (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Junction Field-Effect Transistors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47701290A | 1990-02-07 | 1990-02-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69019334D1 true DE69019334D1 (de) | 1995-06-14 |
DE69019334T2 DE69019334T2 (de) | 1996-01-25 |
Family
ID=23894147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1990619334 Expired - Fee Related DE69019334T2 (de) | 1990-02-07 | 1990-08-24 | GaAs-Passivierung mittels Wasserstoffplasma. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0441024B1 (de) |
JP (1) | JP2902460B2 (de) |
DE (1) | DE69019334T2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2830666B2 (ja) * | 1991-11-29 | 1998-12-02 | 日本電気株式会社 | 半導体に発光層を作製する方法 |
EP0575098B1 (de) * | 1992-06-16 | 2000-04-19 | AT&T Corp. | GaAs-Passivierung mittels stromabwärts erzeugtem Ammoniak-Plasma |
US6385596B1 (en) * | 1998-02-06 | 2002-05-07 | Liquid Audio, Inc. | Secure online music distribution system |
US8524562B2 (en) * | 2008-09-16 | 2013-09-03 | Imec | Method for reducing Fermi-Level-Pinning in a non-silicon channel MOS device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01290230A (ja) * | 1988-05-18 | 1989-11-22 | Fujitsu Ltd | アニール方法 |
-
1990
- 1990-08-24 EP EP19900309298 patent/EP0441024B1/de not_active Expired - Lifetime
- 1990-08-24 DE DE1990619334 patent/DE69019334T2/de not_active Expired - Fee Related
- 1990-08-31 JP JP2228544A patent/JP2902460B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0441024B1 (de) | 1995-05-10 |
JPH0410623A (ja) | 1992-01-14 |
DE69019334T2 (de) | 1996-01-25 |
EP0441024A3 (en) | 1992-04-08 |
JP2902460B2 (ja) | 1999-06-07 |
EP0441024A2 (de) | 1991-08-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |