DE69019309D1 - Apparat zur Beurteilung von Halbleiterplättchen. - Google Patents

Apparat zur Beurteilung von Halbleiterplättchen.

Info

Publication number
DE69019309D1
DE69019309D1 DE69019309T DE69019309T DE69019309D1 DE 69019309 D1 DE69019309 D1 DE 69019309D1 DE 69019309 T DE69019309 T DE 69019309T DE 69019309 T DE69019309 T DE 69019309T DE 69019309 D1 DE69019309 D1 DE 69019309D1
Authority
DE
Germany
Prior art keywords
semiconductor wafers
evaluating semiconductor
evaluating
wafers
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69019309T
Other languages
English (en)
Other versions
DE69019309T2 (de
Inventor
Shoichi Washizuka
Takao Ohta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69019309D1 publication Critical patent/DE69019309D1/de
Publication of DE69019309T2 publication Critical patent/DE69019309T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
DE69019309T 1989-11-17 1990-11-19 Apparat zur Beurteilung von Halbleiterplättchen. Expired - Fee Related DE69019309T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP29925489 1989-11-17
JP11549190A JP2921916B2 (ja) 1989-11-17 1990-05-01 半導体ウェーハ評価装置

Publications (2)

Publication Number Publication Date
DE69019309D1 true DE69019309D1 (de) 1995-06-14
DE69019309T2 DE69019309T2 (de) 1995-11-02

Family

ID=26453985

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69019309T Expired - Fee Related DE69019309T2 (de) 1989-11-17 1990-11-19 Apparat zur Beurteilung von Halbleiterplättchen.

Country Status (4)

Country Link
US (1) US5179333A (de)
EP (1) EP0429043B1 (de)
JP (1) JP2921916B2 (de)
DE (1) DE69019309T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667622A (en) * 1995-08-25 1997-09-16 Siemens Aktiengesellschaft In-situ wafer temperature control apparatus for single wafer tools
US6275060B1 (en) 1997-09-02 2001-08-14 Midwest Research Institute Apparatus and method for measuring minority carrier lifetimes in semiconductor materials
US5929652A (en) * 1997-09-02 1999-07-27 Midwest Research Institute Apparatus for measuring minority carrier lifetimes in semiconductor materials
US6465263B1 (en) * 2000-01-04 2002-10-15 Advanced Micro Devices, Inc. Method and apparatus for implementing corrected species by monitoring specific state parameters
US6650135B1 (en) * 2000-06-29 2003-11-18 Motorola, Inc. Measurement chuck having piezoelectric elements and method
DE10061106B4 (de) * 2000-12-07 2004-11-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur Überprüfung elektrischer Materialeigenschaften
US7109724B2 (en) * 2002-05-01 2006-09-19 Lehighton Electronics, Inc. Method and apparatus for nondestructive measurement and mapping of sheet materials
US6809542B2 (en) * 2002-10-03 2004-10-26 Mti Instruments Inc. Wafer resistance measurement apparatus and method using capacitively coupled AC excitation signal
WO2006020631A1 (en) * 2004-08-11 2006-02-23 Lehighton Electronics, Inc. Device and handling system for measurement of mobility and sheet charge density in conductive sheet materials
US8207748B2 (en) * 2004-08-11 2012-06-26 Lehighton Electronics, Inc. Device and handling system for measurement of mobility and sheet charge density
US20060261840A1 (en) * 2005-05-18 2006-11-23 Texas Instruments, Inc. System and method for determining channel mobility
US8428706B2 (en) * 2005-11-14 2013-04-23 Austin Blew Sheet conductance/resistance measurement system
DE102007040650B4 (de) * 2007-08-27 2010-01-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur induktiven Messung eines Schichtwiderstandes einer in einen multikristallinen Halbleiterwafer eingebrachten Dotierungsschicht

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3805160A (en) * 1972-04-25 1974-04-16 Ibm Method for non-contact semiconductor resistivity measurement
US4015203A (en) * 1975-12-31 1977-03-29 International Business Machines Corporation Contactless LSI junction leakage testing method
JPS54136182A (en) * 1978-04-13 1979-10-23 Fumio Horiguchi Method of measuring nonncontact semiconductor wafer characteristics
US4190799A (en) * 1978-08-21 1980-02-26 Bell Telephone Laboratories, Incorporated Noncontacting measurement of hall effect in a wafer
US4644172A (en) * 1984-02-22 1987-02-17 Kla Instruments Corporation Electronic control of an automatic wafer inspection system
US4785232A (en) * 1987-06-05 1988-11-15 The United States Of America As Represented By The Secretary Of The Army Contactless hall coefficient measurement apparatus and method for piezoelectric material
US4857839A (en) * 1988-03-02 1989-08-15 Wright State University Method and apparatus for measuring average resistivity and hall-effect of semiconductor wafers

Also Published As

Publication number Publication date
DE69019309T2 (de) 1995-11-02
EP0429043B1 (de) 1995-05-10
EP0429043A3 (en) 1992-03-25
JP2921916B2 (ja) 1999-07-19
US5179333A (en) 1993-01-12
EP0429043A2 (de) 1991-05-29
JPH03218649A (ja) 1991-09-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee