DE69016465D1 - Organsilikonverbindung und Herstellungsverfahren dafür. - Google Patents

Organsilikonverbindung und Herstellungsverfahren dafür.

Info

Publication number
DE69016465D1
DE69016465D1 DE69016465T DE69016465T DE69016465D1 DE 69016465 D1 DE69016465 D1 DE 69016465D1 DE 69016465 T DE69016465 T DE 69016465T DE 69016465 T DE69016465 T DE 69016465T DE 69016465 D1 DE69016465 D1 DE 69016465D1
Authority
DE
Germany
Prior art keywords
organ
manufacturing process
silicone compound
process therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69016465T
Other languages
English (en)
Other versions
DE69016465T2 (de
Inventor
Teruyuki Hayashi
Toshiaki Kobayashi
Masato Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Application granted granted Critical
Publication of DE69016465D1 publication Critical patent/DE69016465D1/de
Publication of DE69016465T2 publication Critical patent/DE69016465T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0801—General processes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/0805—Compounds with Si-C or Si-Si linkages comprising only Si, C or H atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
    • C07F7/0827—Syntheses with formation of a Si-C bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
    • C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
DE69016465T 1989-01-13 1990-01-12 Organsilikonverbindung und Herstellungsverfahren dafür. Expired - Fee Related DE69016465T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP735889 1989-01-13
JP5265489 1989-03-03

Publications (2)

Publication Number Publication Date
DE69016465D1 true DE69016465D1 (de) 1995-03-16
DE69016465T2 DE69016465T2 (de) 1995-06-22

Family

ID=26341634

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69016465T Expired - Fee Related DE69016465T2 (de) 1989-01-13 1990-01-12 Organsilikonverbindung und Herstellungsverfahren dafür.

Country Status (4)

Country Link
US (1) US5151538A (de)
EP (1) EP0378430B1 (de)
JP (1) JPH0717658B2 (de)
DE (1) DE69016465T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07242676A (ja) * 1989-01-13 1995-09-19 Agency Of Ind Science & Technol 新規な有機ケイ素化合物
US5243060A (en) * 1992-04-10 1993-09-07 Iowa State University Research Foundation, Inc. Silylene-diethynyl-arylene polymers having liquid crystalline properties
US5413813A (en) * 1993-11-23 1995-05-09 Enichem S.P.A. CVD of silicon-based ceramic materials on internal surface of a reactor
JP3856088B2 (ja) * 2000-08-25 2006-12-13 信越化学工業株式会社 ビスシリルノルボルナン化合物の製造方法
US8736014B2 (en) * 2008-11-14 2014-05-27 Taiwan Semiconductor Manufacturing Company, Ltd. High mechanical strength additives for porous ultra low-k material
JP6045875B2 (ja) * 2012-10-11 2016-12-14 旭化成株式会社 表面修飾された複合金属酸化物微粒子の製造方法
WO2018064163A1 (en) * 2016-09-27 2018-04-05 University Of Delaware Method for preparing silahydrocarbons

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5520734A (en) * 1978-08-01 1980-02-14 Shiseido Co Ltd Cosmetic
JPS5610317A (en) * 1979-07-05 1981-02-02 Kawasaki Heavy Ind Ltd Waste gas disposing euqipment for industrial furnace wherein raw material or accessory raw material is preheated by dry-type dust collector
JPS63258909A (ja) * 1985-01-09 1988-10-26 Nec Corp ケイ素原子とアリル基を含むスチレン系重合体
JPS61207391A (ja) * 1985-03-09 1986-09-13 Shin Etsu Chem Co Ltd トリシリルエタン誘導体化合物の製法
JPS63188687A (ja) * 1987-01-30 1988-08-04 Sagami Chem Res Center 有機ケイ素化合物の製造方法
JPH0643431B2 (ja) * 1987-02-05 1994-06-08 信越化学工業株式会社 有機けい素化合物
US4918197A (en) * 1987-04-03 1990-04-17 General Electric Company Silylation method
US4861901A (en) * 1987-05-05 1989-08-29 Hughes Aircraft Company Substituted aromatic silane compounds and method for preparation of same

Also Published As

Publication number Publication date
DE69016465T2 (de) 1995-06-22
JPH037294A (ja) 1991-01-14
EP0378430B1 (de) 1995-02-01
US5151538A (en) 1992-09-29
EP0378430A1 (de) 1990-07-18
JPH0717658B2 (ja) 1995-03-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee