DE69015717T2 - Lagesignalgeber. - Google Patents

Lagesignalgeber.

Info

Publication number
DE69015717T2
DE69015717T2 DE69015717T DE69015717T DE69015717T2 DE 69015717 T2 DE69015717 T2 DE 69015717T2 DE 69015717 T DE69015717 T DE 69015717T DE 69015717 T DE69015717 T DE 69015717T DE 69015717 T2 DE69015717 T2 DE 69015717T2
Authority
DE
Germany
Prior art keywords
signaling device
position signaling
signaling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69015717T
Other languages
English (en)
Other versions
DE69015717D1 (de
Inventor
Masaki Yamamoto
Takeo Sato
Yoshiyuki Sugiyama
Shinichiro Aoki
Hiroyuki Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1181046A external-priority patent/JPH0732116B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69015717D1 publication Critical patent/DE69015717D1/de
Application granted granted Critical
Publication of DE69015717T2 publication Critical patent/DE69015717T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69015717T 1989-07-13 1990-07-13 Lagesignalgeber. Expired - Fee Related DE69015717T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1181046A JPH0732116B2 (ja) 1989-07-13 1989-07-13 露光装置
JP34200989 1989-12-27

Publications (2)

Publication Number Publication Date
DE69015717D1 DE69015717D1 (de) 1995-02-16
DE69015717T2 true DE69015717T2 (de) 1995-05-11

Family

ID=26500370

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69015717T Expired - Fee Related DE69015717T2 (de) 1989-07-13 1990-07-13 Lagesignalgeber.

Country Status (3)

Country Link
US (1) US5053628A (de)
EP (1) EP0408381B1 (de)
DE (1) DE69015717T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0513297A (ja) * 1991-07-09 1993-01-22 Nikon Corp 位置合わせ装置
JP3384038B2 (ja) * 1992-06-15 2003-03-10 株式会社ニコン 面位置検出光学装置
US5415952A (en) * 1992-10-05 1995-05-16 Fujitsu Limited Fine pattern lithography with positive use of interference
KR0171947B1 (ko) * 1995-12-08 1999-03-20 김주용 반도체소자 제조를 위한 노광 방법 및 그를 이용한 노광장치
US6800859B1 (en) * 1998-12-28 2004-10-05 Hitachi, Ltd. Method and equipment for detecting pattern defect
TW522287B (en) * 2000-01-14 2003-03-01 Asml Netherlands Bv Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby
JP2002353099A (ja) 2001-05-22 2002-12-06 Canon Inc 位置検出方法及び装置及び露光装置及びデバイス製造方法
US6949462B1 (en) * 2002-04-04 2005-09-27 Nanometrics Incorporated Measuring an alignment target with multiple polarization states
JP5264116B2 (ja) * 2007-07-26 2013-08-14 キヤノン株式会社 結像特性変動予測方法、露光装置、並びにデバイス製造方法
US8422027B2 (en) 2010-06-08 2013-04-16 Nikon Corporation Imaging optical system for producing control information regarding lateral movement of an image plane or an object plane
WO2017021131A1 (en) * 2015-07-31 2017-02-09 Asml Holding N.V. Optical system of an alignment system
WO2017041047A1 (en) * 2015-09-04 2017-03-09 Kla-Tencor Corporation Method of improving lateral resolution for height sensor using differential detection technology for semiconductor inspection and metrology
JP7038562B2 (ja) * 2018-02-13 2022-03-18 キヤノン株式会社 検出装置、リソグラフィ装置、および物品の製造方法
US20220191440A1 (en) * 2019-03-15 2022-06-16 Dolby Laboratories Licensing Corporation Dual-modulation laser projection systems and methods
US20220268574A1 (en) * 2019-07-24 2022-08-25 Asml Holding N.V. On chip wafer alignment sensor

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3318980C2 (de) * 1982-07-09 1986-09-18 Perkin-Elmer Censor Anstalt, Vaduz Vorrichtung zum Justieren beim Projektionskopieren von Masken
DE3336963A1 (de) * 1983-08-12 1985-02-21 Werner Dr. Vaduz Tabarelli Vorrichtung zum projektionskopieren einer maske auf ein werkstueck
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings
DE3485022D1 (de) * 1983-12-26 1991-10-10 Hitachi Ltd Belichtungsvorrichtung und verfahren fuer die ausrichtung einer maske mit einem arbeitsstueck.
US4780617A (en) * 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
JPH0679258B2 (ja) * 1985-10-19 1994-10-05 三洋電機株式会社 電源装置
US4795261A (en) * 1985-12-24 1989-01-03 Hitachi, Ltd. Reduction projection type aligner
US4697087A (en) * 1986-07-31 1987-09-29 The Perkin-Elmer Corporation Reverse dark field alignment system for scanning lithographic aligner
JPH0695007B2 (ja) * 1986-09-19 1994-11-24 松下電器産業株式会社 位置合せ方法および露光装置
JPS6441805A (en) * 1987-08-07 1989-02-14 Sumitomo Heavy Industries Position detecting apparatus of two bodies, which are separated by minute distance

Also Published As

Publication number Publication date
EP0408381A2 (de) 1991-01-16
EP0408381B1 (de) 1995-01-04
DE69015717D1 (de) 1995-02-16
EP0408381A3 (en) 1992-07-01
US5053628A (en) 1991-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee