DE69010978D1 - Ausrichtvorrichtung. - Google Patents

Ausrichtvorrichtung.

Info

Publication number
DE69010978D1
DE69010978D1 DE69010978T DE69010978T DE69010978D1 DE 69010978 D1 DE69010978 D1 DE 69010978D1 DE 69010978 T DE69010978 T DE 69010978T DE 69010978 T DE69010978 T DE 69010978T DE 69010978 D1 DE69010978 D1 DE 69010978D1
Authority
DE
Germany
Prior art keywords
alignment device
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69010978T
Other languages
English (en)
Other versions
DE69010978T2 (de
Inventor
Shinichiro Aoki
Takeo Sato
Katsumasa Yamaguchi
Masaki Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69010978D1 publication Critical patent/DE69010978D1/de
Publication of DE69010978T2 publication Critical patent/DE69010978T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69010978T 1989-05-12 1990-05-11 Ausrichtvorrichtung. Expired - Fee Related DE69010978T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1118986A JPH02297005A (ja) 1989-05-12 1989-05-12 位置合わせ装置

Publications (2)

Publication Number Publication Date
DE69010978D1 true DE69010978D1 (de) 1994-09-01
DE69010978T2 DE69010978T2 (de) 1994-12-15

Family

ID=14750178

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69010978T Expired - Fee Related DE69010978T2 (de) 1989-05-12 1990-05-11 Ausrichtvorrichtung.

Country Status (4)

Country Link
US (1) US5025168A (de)
EP (1) EP0397530B1 (de)
JP (1) JPH02297005A (de)
DE (1) DE69010978T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2913755B2 (ja) * 1990-04-25 1999-06-28 株式会社ニコン 位置合わせ方法及び装置
JP3244769B2 (ja) * 1991-07-11 2002-01-07 キヤノン株式会社 測定方法及び測定装置
DE69211086T2 (de) * 1991-10-03 1996-11-14 Canon K.K., Tokio/Tokyo Messverfahren und Messgerät
CN106092038B (zh) * 2016-06-06 2018-08-17 宁波大学 一种探测激光二维方位及波长的方法
US11982521B2 (en) * 2017-02-23 2024-05-14 Nikon Corporation Measurement of a change in a geometrical characteristic and/or position of a workpiece

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5419263B2 (de) * 1973-10-17 1979-07-13
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
JPH0616478B2 (ja) * 1983-12-19 1994-03-02 株式会社ニコン 投影露光装置の位置合せ装置
US4708484A (en) * 1984-10-24 1987-11-24 Hitachi, Ltd. Projection alignment method and apparatus
JPH0695007B2 (ja) * 1986-09-19 1994-11-24 松下電器産業株式会社 位置合せ方法および露光装置
US4870289A (en) * 1987-09-25 1989-09-26 Matsushita Electric Industrial Co., Ltd. Apparatus for controlling relation in position between a photomask and a wafer
JPS6489323A (en) * 1987-09-29 1989-04-03 Matsushita Electric Ind Co Ltd Alignment device

Also Published As

Publication number Publication date
DE69010978T2 (de) 1994-12-15
EP0397530A2 (de) 1990-11-14
JPH02297005A (ja) 1990-12-07
EP0397530B1 (de) 1994-07-27
EP0397530A3 (de) 1992-03-25
US5025168A (en) 1991-06-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee