DE69011567T2 - Verfahren zur Herstellung von elektronischen und optischen Komponenten. - Google Patents

Verfahren zur Herstellung von elektronischen und optischen Komponenten.

Info

Publication number
DE69011567T2
DE69011567T2 DE69011567T DE69011567T DE69011567T2 DE 69011567 T2 DE69011567 T2 DE 69011567T2 DE 69011567 T DE69011567 T DE 69011567T DE 69011567 T DE69011567 T DE 69011567T DE 69011567 T2 DE69011567 T2 DE 69011567T2
Authority
DE
Germany
Prior art keywords
electronic
production
optical components
optical
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69011567T
Other languages
English (en)
Other versions
DE69011567D1 (de
Inventor
Gardy Cadet
James Winfield Mitchell
Jorge Luis Valdes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Application granted granted Critical
Publication of DE69011567D1 publication Critical patent/DE69011567D1/de
Publication of DE69011567T2 publication Critical patent/DE69011567T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
DE69011567T 1989-04-18 1990-04-09 Verfahren zur Herstellung von elektronischen und optischen Komponenten. Expired - Fee Related DE69011567T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33934489A 1989-04-18 1989-04-18

Publications (2)

Publication Number Publication Date
DE69011567D1 DE69011567D1 (de) 1994-09-22
DE69011567T2 true DE69011567T2 (de) 1994-12-08

Family

ID=23328589

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69011567T Expired - Fee Related DE69011567T2 (de) 1989-04-18 1990-04-09 Verfahren zur Herstellung von elektronischen und optischen Komponenten.

Country Status (5)

Country Link
US (1) US5427659A (de)
EP (1) EP0393897B1 (de)
JP (1) JPH071757B2 (de)
CA (1) CA2010482C (de)
DE (1) DE69011567T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017006698A1 (de) * 2017-06-25 2018-12-27 Bvp Gmbh Unter- und überdruckdichter Molekularsiebbehälter

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2792877A1 (fr) * 1999-04-29 2000-11-03 Michelin Soc Tech Pneumatique pourvu d'une protuberance pour devier les projections laterales
US8021536B2 (en) * 2006-04-13 2011-09-20 Air Products And Chemical, Inc. Method and apparatus for achieving maximum yield in the electrolytic preparation of group IV and V hydrides
US20090159454A1 (en) 2007-12-20 2009-06-25 Air Products And Chemicals, Inc. Divided electrochemical cell and low cost high purity hydride gas production process
FR2977579B1 (fr) * 2011-07-08 2015-10-16 Air Liquide Electronics Sys Procede de preparation de monosilane electrochimiquement assiste
CN111378979B (zh) * 2018-12-29 2022-03-15 紫石能源有限公司 砷纳米颗粒及其制备方法、电解制砷烷的系统和方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1375819A (en) * 1919-06-11 1921-04-26 Jr Henry Blumenberg Process and apparatus for the electrolytic generation of arsin, phosphin and stibin
DE1209302B (de) * 1964-01-18 1966-01-20 Siemens Ag Verfahren und Vorrichtung zur kontinuierlichen Reinigung von Arsen, insbesondere fuer Halbleiterzwecke
US3404076A (en) * 1965-04-15 1968-10-01 Shell Oil Co Electrolytic preparation of hydrides
US4178224A (en) * 1978-01-19 1979-12-11 Texas Instruments Incorporated Apparatus for generation and control of dopant and reactive gases
SU1033576A1 (ru) * 1982-03-24 1983-08-07 Предприятие П/Я Р-6878 Способ получени сурьм нистого водорода

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017006698A1 (de) * 2017-06-25 2018-12-27 Bvp Gmbh Unter- und überdruckdichter Molekularsiebbehälter
DE102017006698B4 (de) 2017-06-25 2023-07-20 Bvp Gmbh Unter- und überdruckdichter Molekularsiebbehälter

Also Published As

Publication number Publication date
JPH02296320A (ja) 1990-12-06
JPH071757B2 (ja) 1995-01-11
DE69011567D1 (de) 1994-09-22
CA2010482C (en) 1998-08-25
EP0393897A1 (de) 1990-10-24
CA2010482A1 (en) 1990-10-18
US5427659A (en) 1995-06-27
EP0393897B1 (de) 1994-08-17

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee