DE68928093D1 - Vorrichtung zur Positionsdetektion zwischen zwei Objekten - Google Patents

Vorrichtung zur Positionsdetektion zwischen zwei Objekten

Info

Publication number
DE68928093D1
DE68928093D1 DE68928093T DE68928093T DE68928093D1 DE 68928093 D1 DE68928093 D1 DE 68928093D1 DE 68928093 T DE68928093 T DE 68928093T DE 68928093 T DE68928093 T DE 68928093T DE 68928093 D1 DE68928093 D1 DE 68928093D1
Authority
DE
Germany
Prior art keywords
objects
position detection
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68928093T
Other languages
English (en)
Other versions
DE68928093T2 (de
Inventor
Masakazu Matsugu
Minoru Yoshii
Naoto Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63226010A external-priority patent/JP2692890B2/ja
Priority claimed from JP1209929A external-priority patent/JP2626078B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68928093D1 publication Critical patent/DE68928093D1/de
Application granted granted Critical
Publication of DE68928093T2 publication Critical patent/DE68928093T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
DE1989628093 1988-09-09 1989-09-07 Vorrichtung zur Positionsdetektion zwischen zwei Objekten Expired - Fee Related DE68928093T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63226010A JP2692890B2 (ja) 1988-09-09 1988-09-09 位置関係検出装置
JP22580288 1988-09-09
JP1209929A JP2626078B2 (ja) 1988-09-09 1989-08-14 位置検出装置

Publications (2)

Publication Number Publication Date
DE68928093D1 true DE68928093D1 (de) 1997-07-10
DE68928093T2 DE68928093T2 (de) 1997-10-16

Family

ID=27329070

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989628093 Expired - Fee Related DE68928093T2 (de) 1988-09-09 1989-09-07 Vorrichtung zur Positionsdetektion zwischen zwei Objekten

Country Status (2)

Country Link
EP (1) EP0358515B1 (de)
DE (1) DE68928093T2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3031993B2 (ja) * 1990-11-05 2000-04-10 株式会社東芝 Ｘ線露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265542A (en) * 1977-11-04 1981-05-05 Computervision Corporation Apparatus and method for fine alignment of a photomask to a semiconductor wafer
US4694186A (en) * 1984-09-10 1987-09-15 Canon Kabushiki Kaisha System for photoelectric detection
JPH0626178B2 (ja) * 1985-06-03 1994-04-06 株式会社日立製作所 パターン位置検出方法とその装置
US4728193A (en) * 1986-12-11 1988-03-01 Hughes Aircraft Company Precision automatic mask-wafer alignment system

Also Published As

Publication number Publication date
EP0358515A2 (de) 1990-03-14
EP0358515B1 (de) 1997-06-04
EP0358515A3 (de) 1990-12-27
DE68928093T2 (de) 1997-10-16

Similar Documents

Publication Publication Date Title
DE68925618T2 (de) Vorrichtung zur Kreuzkorrelation von zwei komplexen abgetasteten Signalen
DE69304320T2 (de) Blutabnahme vorrichtung
DE59409256D1 (de) Vorrichtung zur Distanzmessung
KR890012171A (ko) 위치검출장치
DE68909988D1 (de) Vorrichtung zur kontinuierlichen Vacuumbeschichtung.
DE68901933T2 (de) Vorrichtung zur lagefeststellung.
DE58903084D1 (de) Vorrichtung zur abstandsmessung.
DE69033144D1 (de) Detektionsgerät
DE69004192T4 (de) Induktive Vorrichtung.
DE69032110D1 (de) Ellipsometrische Vorrichtung mit hohem Auflösungsvermögen
DE69124853D1 (de) Vorrichtung zur Detektion von Unterschieden zwischen Bewegtbildern
DE68913058D1 (de) Vorrichtung zur Teilchenmessung.
DE68905948D1 (de) Vorrichtung zur geschwindigkeitsmessung.
DE69214123D1 (de) Vorrichtung zur positionsauswertung
DE68921324D1 (de) Vorrichtung zur Bewegung eines Wandlers.
DE59005960D1 (de) Vorrichtung zur absoluten zweidimensionalen positionsmessung.
DE68905271D1 (de) Eine vorrichtung zur durchflussmessung.
DE68925142T2 (de) Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten
KR900000878U (ko) 각도 검출장치
DE69127253D1 (de) Vorrichtung zur selektiven Auffindung eines sich bewegenden Objekts
DE69003594D1 (de) Vorrichtung mit mehreren winkelpositionssensoren.
DE68929314D1 (de) Vorrichtung zur Detektion der Positionsrelation zwischen zwei Objekten
DE68928093T2 (de) Vorrichtung zur Positionsdetektion zwischen zwei Objekten
DE68926021T2 (de) Gerät zur Hochfrequenz-Richtungsbestimmung
DE59406643D1 (de) Vorrichtung zur Messung einer Bewegung zwischen zwei Teilen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee