DE68929314D1 - Vorrichtung zur Detektion der Positionsrelation zwischen zwei Objekten - Google Patents
Vorrichtung zur Detektion der Positionsrelation zwischen zwei ObjektenInfo
- Publication number
- DE68929314D1 DE68929314D1 DE68929314T DE68929314T DE68929314D1 DE 68929314 D1 DE68929314 D1 DE 68929314D1 DE 68929314 T DE68929314 T DE 68929314T DE 68929314 T DE68929314 T DE 68929314T DE 68929314 D1 DE68929314 D1 DE 68929314D1
- Authority
- DE
- Germany
- Prior art keywords
- objects
- detecting
- positional relationship
- positional
- relationship
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22600688 | 1988-09-09 | ||
JP22580988 | 1988-09-09 | ||
JP1209928A JP2581227B2 (ja) | 1988-09-09 | 1989-08-14 | 位置検出装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68929314D1 true DE68929314D1 (de) | 2001-08-23 |
DE68929314T2 DE68929314T2 (de) | 2002-05-02 |
Family
ID=27329069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68929314T Expired - Fee Related DE68929314T2 (de) | 1988-09-09 | 1989-09-07 | Vorrichtung zur Detektion der Positionsrelation zwischen zwei Objekten |
Country Status (3)
Country | Link |
---|---|
US (1) | US5148038A (de) |
EP (1) | EP0358511B1 (de) |
DE (1) | DE68929314T2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0455443B1 (de) * | 1990-05-01 | 1997-11-12 | Canon Kabushiki Kaisha | Verfahren und Apparat zur Detektion von Lageabweichungen |
JPH0563909A (ja) * | 1991-08-28 | 1993-03-12 | Canon Inc | カラー画像読取装置 |
JP3296239B2 (ja) * | 1997-03-27 | 2002-06-24 | ウシオ電機株式会社 | 間隙設定機構を備えたプロキシミティ露光装置 |
DE60123463T2 (de) * | 2000-11-27 | 2007-08-02 | The Procter & Gamble Company, Cincinnati | Geschirrspülverfahren |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
US4360273A (en) * | 1980-02-14 | 1982-11-23 | Sperry Corporation | Optical alignment of masks for X-ray lithography |
US4326805A (en) * | 1980-04-11 | 1982-04-27 | Bell Telephone Laboratories, Incorporated | Method and apparatus for aligning mask and wafer members |
US4539482A (en) * | 1980-10-09 | 1985-09-03 | Canon Kabushiki Kaisha | Reading apparatus |
US4398824A (en) * | 1981-04-15 | 1983-08-16 | Bell Telephone Laboratories, Incorporated | Wafer tilt compensation in zone plate alignment system |
US4629313A (en) * | 1982-10-22 | 1986-12-16 | Nippon Kogaku K.K. | Exposure apparatus |
US4636626A (en) * | 1983-01-14 | 1987-01-13 | Nippon Kogaku K.K. | Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication |
US4545683A (en) * | 1983-02-28 | 1985-10-08 | The Perkin-Elmer Corporation | Wafer alignment device |
US4514858A (en) * | 1983-03-15 | 1985-04-30 | Micronix Partners | Lithography system |
US4656347A (en) * | 1984-01-30 | 1987-04-07 | Nippon Telegraph & Telephone Public Corporation | Diffraction grating position adjuster using a grating and a reflector |
JPS61111402A (ja) * | 1984-11-06 | 1986-05-29 | Nippon Kogaku Kk <Nikon> | 位置検出装置 |
-
1989
- 1989-09-07 DE DE68929314T patent/DE68929314T2/de not_active Expired - Fee Related
- 1989-09-07 EP EP89309094A patent/EP0358511B1/de not_active Expired - Lifetime
-
1991
- 1991-12-10 US US07/804,514 patent/US5148038A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5148038A (en) | 1992-09-15 |
EP0358511B1 (de) | 2001-07-18 |
DE68929314T2 (de) | 2002-05-02 |
EP0358511A2 (de) | 1990-03-14 |
EP0358511A3 (de) | 1990-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |