DE68927482D1 - Positionierungsmechanismus und -verfahren - Google Patents

Positionierungsmechanismus und -verfahren

Info

Publication number
DE68927482D1
DE68927482D1 DE68927482T DE68927482T DE68927482D1 DE 68927482 D1 DE68927482 D1 DE 68927482D1 DE 68927482 T DE68927482 T DE 68927482T DE 68927482 T DE68927482 T DE 68927482T DE 68927482 D1 DE68927482 D1 DE 68927482D1
Authority
DE
Germany
Prior art keywords
procedure
positioning mechanism
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68927482T
Other languages
English (en)
Other versions
DE68927482T2 (de
Inventor
Nobutoshi Mizusawa
Yutaka Tanaka
Ryuichi Ebinuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68927482D1 publication Critical patent/DE68927482D1/de
Application granted granted Critical
Publication of DE68927482T2 publication Critical patent/DE68927482T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Machine Tool Units (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Positioning Apparatuses (AREA)
DE68927482T 1988-01-28 1989-01-27 Positionierungsmechanismus und -verfahren Expired - Fee Related DE68927482T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63015859A JP2631485B2 (ja) 1988-01-28 1988-01-28 位置決め装置

Publications (2)

Publication Number Publication Date
DE68927482D1 true DE68927482D1 (de) 1997-01-09
DE68927482T2 DE68927482T2 (de) 1997-04-03

Family

ID=11900526

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68927482T Expired - Fee Related DE68927482T2 (de) 1988-01-28 1989-01-27 Positionierungsmechanismus und -verfahren

Country Status (4)

Country Link
US (1) US4999506A (de)
EP (1) EP0326425B1 (de)
JP (1) JP2631485B2 (de)
DE (1) DE68927482T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2777915B2 (ja) * 1989-08-30 1998-07-23 キヤノン株式会社 位置合わせ機構
JP2860578B2 (ja) * 1990-03-02 1999-02-24 キヤノン株式会社 露光装置
JPH03273663A (ja) * 1990-03-23 1991-12-04 Canon Inc 基板保持装置
EP0452041B1 (de) * 1990-04-06 1996-11-27 Canon Kabushiki Kaisha Transportvorrichtung für Substrate und Verfahren zur Kontrolle
JP3068843B2 (ja) * 1990-09-12 2000-07-24 キヤノン株式会社 露光装置の位置決め方法と位置決め機構
JP3173928B2 (ja) * 1992-09-25 2001-06-04 キヤノン株式会社 基板保持装置、基板保持方法および露光装置
KR0139039B1 (ko) * 1993-06-30 1998-06-01 미타라이 하지메 노광장치와 이것을 이용한 디바이스 제조방법
US5450245A (en) * 1993-10-26 1995-09-12 Laser Communications, Inc. Laser alignment apparatus
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
JP3815750B2 (ja) * 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
US5854819A (en) * 1996-02-07 1998-12-29 Canon Kabushiki Kaisha Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same
US6151100A (en) * 1996-12-12 2000-11-21 Canon Kabushiki Kaisha Positioning system
JP3745167B2 (ja) * 1998-07-29 2006-02-15 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法
JP3631045B2 (ja) 1999-06-16 2005-03-23 キヤノン株式会社 駆動装置、光学素子駆動装置、露光装置およびデバイス製造方法
US6915582B1 (en) 2004-02-20 2005-07-12 Arinc Incorporated Alignment structure
US7143520B2 (en) * 2004-04-16 2006-12-05 Arinc Incorporated Alignment structure
JP5324251B2 (ja) * 2008-05-16 2013-10-23 キヤノンアネルバ株式会社 基板保持装置
JP5186280B2 (ja) * 2008-05-19 2013-04-17 オリンパス株式会社 移動ステージ装置
JP2011064461A (ja) * 2009-09-15 2011-03-31 Kohzu Precision Co Ltd 位置決めステージ
JP5861133B2 (ja) * 2011-01-17 2016-02-16 株式会社アドバンストシステムズジャパン 常温低周波ボンディング装置
JP2014008553A (ja) * 2012-06-28 2014-01-20 Mitsuboshi Diamond Industrial Co Ltd 加工ヘッド
FR3086877A1 (fr) 2018-10-09 2020-04-10 Psa Automobiles Sa Dispositif de positionnement rapide
CN115274529B (zh) * 2022-09-27 2022-12-20 无锡邑文电子科技有限公司 一种调节定位机构、调节定位方法以及半导体去胶机

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3300618A (en) * 1963-12-26 1967-01-24 Welding Research Inc Optical viewing system for electron beam welders
US3926323A (en) * 1970-04-10 1975-12-16 Packard Instrument Co Inc Method of and apparatus for vial transferring and changing
JPS51111076A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Exposure device
US4401406A (en) * 1980-10-31 1983-08-30 Miguel Rovira Remote three axis cable transport system
US4528576A (en) * 1982-04-15 1985-07-09 Canon Kabushiki Kaisha Recording apparatus
JPS58194561A (ja) * 1982-05-11 1983-11-12 Canon Inc 記録装置
US4514858A (en) * 1983-03-15 1985-04-30 Micronix Partners Lithography system
US4669867A (en) * 1984-02-20 1987-06-02 Canon Kabushiki Kaisha Alignment and exposure apparatus
US4676630A (en) * 1985-04-25 1987-06-30 Canon Kabushiki Kaisha Exposure apparatus
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPS6235513A (ja) * 1985-08-09 1987-02-16 Hitachi Ltd 分子線エピタキシ装置

Also Published As

Publication number Publication date
EP0326425B1 (de) 1996-11-27
JPH01193689A (ja) 1989-08-03
US4999506A (en) 1991-03-12
DE68927482T2 (de) 1997-04-03
EP0326425A3 (de) 1989-12-20
EP0326425A2 (de) 1989-08-02
JP2631485B2 (ja) 1997-07-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee