DE68925655D1 - Beschichtungsfilm enthaltend eine negativ arbeitende lichtempfindliche Zusammensetzung und Bilderzeugungsverfahren - Google Patents

Beschichtungsfilm enthaltend eine negativ arbeitende lichtempfindliche Zusammensetzung und Bilderzeugungsverfahren

Info

Publication number
DE68925655D1
DE68925655D1 DE68925655T DE68925655T DE68925655D1 DE 68925655 D1 DE68925655 D1 DE 68925655D1 DE 68925655 T DE68925655 T DE 68925655T DE 68925655 T DE68925655 T DE 68925655T DE 68925655 D1 DE68925655 D1 DE 68925655D1
Authority
DE
Germany
Prior art keywords
coating film
film containing
photosensitive composition
imaging process
negative working
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68925655T
Other languages
English (en)
Other versions
DE68925655T2 (de
Inventor
Minoru Toriumi
Nobuaki Hayashi
Michiaki Hashimoto
Takumi Ueno
Takao Iwayanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Application granted granted Critical
Publication of DE68925655D1 publication Critical patent/DE68925655D1/de
Publication of DE68925655T2 publication Critical patent/DE68925655T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
DE68925655T 1988-03-23 1989-03-23 Beschichtungsfilm enthaltend eine negativ arbeitende lichtempfindliche Zusammensetzung und Bilderzeugungsverfahren Expired - Fee Related DE68925655T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63069082A JP2643261B2 (ja) 1988-03-23 1988-03-23 ネガ型感光性組成物及びパタン形成方法

Publications (2)

Publication Number Publication Date
DE68925655D1 true DE68925655D1 (de) 1996-03-28
DE68925655T2 DE68925655T2 (de) 1996-09-19

Family

ID=13392309

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68925655T Expired - Fee Related DE68925655T2 (de) 1988-03-23 1989-03-23 Beschichtungsfilm enthaltend eine negativ arbeitende lichtempfindliche Zusammensetzung und Bilderzeugungsverfahren

Country Status (4)

Country Link
EP (1) EP0334381B1 (de)
JP (1) JP2643261B2 (de)
KR (1) KR890015072A (de)
DE (1) DE68925655T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0616701B1 (de) * 1991-12-10 2002-02-13 The Dow Chemical Company Strahlungshärtbare cyclobutaren zusammensetzungen
US5854302A (en) * 1993-04-29 1998-12-29 The Dow Chemical Company Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins
CA2106231A1 (en) * 1993-09-15 1995-03-16 Sambasivan Venkat Eswaran Negative photoresist and a process therefor
KR101872443B1 (ko) * 2015-10-21 2018-06-28 퓨어 피싱 재팬 가부시키가이샤 낚시용 릴

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58203438A (ja) * 1982-05-24 1983-11-26 Hitachi Ltd 微細パタ−ン形成方法
JPS5936245A (ja) * 1982-08-25 1984-02-28 Hitachi Ltd 感光性組成物

Also Published As

Publication number Publication date
EP0334381A2 (de) 1989-09-27
JPH01241543A (ja) 1989-09-26
JP2643261B2 (ja) 1997-08-20
DE68925655T2 (de) 1996-09-19
EP0334381B1 (de) 1996-02-14
EP0334381A3 (en) 1990-10-10
KR890015072A (ko) 1989-10-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee