DE68923844D1 - Entwickler für Positiv-Photolacke. - Google Patents

Entwickler für Positiv-Photolacke.

Info

Publication number
DE68923844D1
DE68923844D1 DE68923844T DE68923844T DE68923844D1 DE 68923844 D1 DE68923844 D1 DE 68923844D1 DE 68923844 T DE68923844 T DE 68923844T DE 68923844 T DE68923844 T DE 68923844T DE 68923844 D1 DE68923844 D1 DE 68923844D1
Authority
DE
Germany
Prior art keywords
developer
positive photoresists
photoresists
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68923844T
Other languages
English (en)
Other versions
DE68923844T2 (de
Inventor
Tetsuo Mitsubishi Gas C Aoyama
Susumu Mitsubishi Gas C Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63262687A external-priority patent/JP2712397B2/ja
Priority claimed from JP63264090A external-priority patent/JP2819568B2/ja
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Publication of DE68923844D1 publication Critical patent/DE68923844D1/de
Application granted granted Critical
Publication of DE68923844T2 publication Critical patent/DE68923844T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68923844T 1988-10-20 1989-10-13 Entwickler für Positiv-Photolacke. Expired - Fee Related DE68923844T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63262687A JP2712397B2 (ja) 1988-10-20 1988-10-20 ポジ型フォトレジスト現像液
JP63264090A JP2819568B2 (ja) 1988-10-21 1988-10-21 ポジ型フォトレジスト現像液

Publications (2)

Publication Number Publication Date
DE68923844D1 true DE68923844D1 (de) 1995-09-21
DE68923844T2 DE68923844T2 (de) 1995-12-21

Family

ID=26545655

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68923844T Expired - Fee Related DE68923844T2 (de) 1988-10-20 1989-10-13 Entwickler für Positiv-Photolacke.

Country Status (3)

Country Link
EP (1) EP0364895B1 (de)
KR (1) KR960003909B1 (de)
DE (1) DE68923844T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19755131C2 (de) * 1997-12-11 2002-10-31 Infineon Technologies Ag Lösung von Tetramethylammoniumhydroxid in Wasser und Verfahren zur Herstellung der Lösung
CA2851406C (en) 2012-04-13 2019-12-17 Huntsman Petrochemical Llc Using novel amines to stabilize quaternary trialkylalkanolamines

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE627820A (de) * 1962-02-01
US4374920A (en) * 1981-07-27 1983-02-22 American Hoechst Corporation Positive developer containing non-ionic surfactants
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
US4464461A (en) * 1983-07-22 1984-08-07 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
DE3346979A1 (de) * 1983-12-24 1985-07-04 Merck Patent Gmbh, 6100 Darmstadt Entwickler fuer positivfotoresists
JP2542898B2 (ja) * 1988-04-07 1996-10-09 富士写真フイルム株式会社 水なしｐｓ版用現像液

Also Published As

Publication number Publication date
KR900006822A (ko) 1990-05-08
KR960003909B1 (ko) 1996-03-23
EP0364895A1 (de) 1990-04-25
EP0364895B1 (de) 1995-08-16
DE68923844T2 (de) 1995-12-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee