DE68916168D1 - Verfahren und Vorrichtung zur Analyse einer Oberfläche. - Google Patents

Verfahren und Vorrichtung zur Analyse einer Oberfläche.

Info

Publication number
DE68916168D1
DE68916168D1 DE68916168T DE68916168T DE68916168D1 DE 68916168 D1 DE68916168 D1 DE 68916168D1 DE 68916168 T DE68916168 T DE 68916168T DE 68916168 T DE68916168 T DE 68916168T DE 68916168 D1 DE68916168 D1 DE 68916168D1
Authority
DE
Germany
Prior art keywords
analyzing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68916168T
Other languages
English (en)
Other versions
DE68916168T2 (de
Inventor
Ken Hitachi Koyasudai Ninomiya
Shigeru Nishimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE68916168D1 publication Critical patent/DE68916168D1/de
Publication of DE68916168T2 publication Critical patent/DE68916168T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G01N23/2273—Measuring photoelectron spectrum, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE68916168T 1988-10-24 1989-10-24 Verfahren und Vorrichtung zur Analyse einer Oberfläche. Expired - Fee Related DE68916168T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63266037A JP2793818B2 (ja) 1988-10-24 1988-10-24 表面分析方法およびその装置

Publications (2)

Publication Number Publication Date
DE68916168D1 true DE68916168D1 (de) 1994-07-21
DE68916168T2 DE68916168T2 (de) 1994-09-22

Family

ID=17425511

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68916168T Expired - Fee Related DE68916168T2 (de) 1988-10-24 1989-10-24 Verfahren und Vorrichtung zur Analyse einer Oberfläche.

Country Status (4)

Country Link
US (1) US5028778A (de)
EP (1) EP0366096B1 (de)
JP (1) JP2793818B2 (de)
DE (1) DE68916168T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5233191A (en) * 1990-04-02 1993-08-03 Hitachi, Ltd. Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process
US5463459A (en) 1991-04-02 1995-10-31 Hitachi, Ltd. Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process
US5198667A (en) * 1991-12-20 1993-03-30 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for performing scanning tunneling optical absorption spectroscopy
US5393980A (en) * 1993-05-11 1995-02-28 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Quality monitor and monitoring technique employing optically stimulated electron emmission
IL137208A0 (en) * 2000-07-06 2001-07-24 Yeda Res & Dev Method for depth profiling of a sample
DE10217513B4 (de) * 2002-04-19 2004-06-17 Gesellschaft zur Förderung der Spektrochemie und angewandten Spektroskopie e.V. Verfahren und Vorrichtung zur Analyse von verdeckten, oberflächennahen Schichten mittels Photoelektronen-Spektrometrie
JP3519397B1 (ja) * 2002-10-09 2004-04-12 沖電気工業株式会社 固体表面層の膜厚方向組成プロファイル解析方法
DE10304852B4 (de) * 2003-02-06 2007-10-11 Siemens Ag Röntgen-Monochromator für eine Röntgeneinrichtung
KR20050043257A (ko) * 2003-11-05 2005-05-11 삼성전자주식회사 3차원 표면 분석 방법
JP4410154B2 (ja) * 2005-06-09 2010-02-03 株式会社東芝 デコンボリューション解析装置、デコンボリューション解析プログラム及びデコンボリューション解析方法
US8011830B2 (en) * 2008-04-29 2011-09-06 Revera Incorporated Method and system for calibrating an X-ray photoelectron spectroscopy measurement
US7952073B2 (en) * 2008-08-01 2011-05-31 Direct Electron, Lp Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
US10302556B2 (en) 2015-09-04 2019-05-28 The United States Of America As Represented By The Administrator Of Nasa Optically stimulated electron emission measurement device and method for characterizing and comparing levels and species of surface contaminants

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4590376A (en) * 1984-05-30 1986-05-20 Photo Acoustic Technology, Inc. Apparatus and technique for monitoring photoelectron emission from surfaces

Also Published As

Publication number Publication date
JP2793818B2 (ja) 1998-09-03
EP0366096B1 (de) 1994-06-15
US5028778A (en) 1991-07-02
JPH02114159A (ja) 1990-04-26
DE68916168T2 (de) 1994-09-22
EP0366096A2 (de) 1990-05-02
EP0366096A3 (en) 1990-08-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee