DE68915472D1 - Apparat zum Nachweis von Fremdmaterial auf der Oberfläche eines Substrates. - Google Patents

Apparat zum Nachweis von Fremdmaterial auf der Oberfläche eines Substrates.

Info

Publication number
DE68915472D1
DE68915472D1 DE68915472T DE68915472T DE68915472D1 DE 68915472 D1 DE68915472 D1 DE 68915472D1 DE 68915472 T DE68915472 T DE 68915472T DE 68915472 T DE68915472 T DE 68915472T DE 68915472 D1 DE68915472 D1 DE 68915472D1
Authority
DE
Germany
Prior art keywords
substrate
detection
foreign material
foreign
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68915472T
Other languages
English (en)
Other versions
DE68915472T2 (de
Inventor
Yutaka Saijo
Masaaki Ishihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Ltd
Original Assignee
Horiba Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Ltd filed Critical Horiba Ltd
Publication of DE68915472D1 publication Critical patent/DE68915472D1/de
Application granted granted Critical
Publication of DE68915472T2 publication Critical patent/DE68915472T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DE68915472T 1988-03-28 1989-03-14 Apparat zum Nachweis von Fremdmaterial auf der Oberfläche eines Substrates. Expired - Fee Related DE68915472T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7541588A JPH0774788B2 (ja) 1988-03-28 1988-03-28 異物有無検査装置

Publications (2)

Publication Number Publication Date
DE68915472D1 true DE68915472D1 (de) 1994-06-30
DE68915472T2 DE68915472T2 (de) 1994-10-06

Family

ID=13575524

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68915472T Expired - Fee Related DE68915472T2 (de) 1988-03-28 1989-03-14 Apparat zum Nachweis von Fremdmaterial auf der Oberfläche eines Substrates.

Country Status (3)

Country Link
EP (1) EP0335163B1 (de)
JP (1) JPH0774788B2 (de)
DE (1) DE68915472T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5118191A (en) * 1990-05-29 1992-06-02 The United States Of America As Represented By The Secretary Of The Air Force High contrast switchable target discriminator
FR2665959B1 (fr) * 1990-08-16 1994-01-14 Oreal Appareil destine a permettre d'evaluer la brillance d'une surface, en particulier de la peau.
US5563702A (en) * 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
DE4434474C2 (de) * 1994-09-27 2000-06-15 Basler Ag Verfahren und Vorrichtung zur vollständigen optischen Qualitätskontrolle von Gegenständen
US5798829A (en) * 1996-03-05 1998-08-25 Kla-Tencor Corporation Single laser bright field and dark field system for detecting anomalies of a sample
KR100301067B1 (ko) 1999-08-23 2001-11-01 윤종용 마이크로 스크래치 검사방법 및 이를 적용한 장치
DE102004001411B4 (de) * 2004-01-09 2006-05-11 Infineon Technologies Ag Verfahren und Vorrichtung zum Bestimmen von Defekten in einer regelmäßigen Struktur
JP4344284B2 (ja) 2004-06-18 2009-10-14 株式会社堀場製作所 異物検査装置および異物検査方法
JP4638864B2 (ja) * 2006-12-20 2011-02-23 株式会社日立ハイテクノロジーズ 試料表面の欠陥検査装置
KR101237583B1 (ko) * 2007-10-23 2013-02-26 시바우라 메카트로닉스 가부시키가이샤 촬영 화상에 기초한 검사 방법 및 검사 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI63835C (fi) * 1981-02-10 1983-08-10 Altim Control Ky Foerfarande foer identifiering av ett virkes ytegenskaper
JPS61104243A (ja) * 1984-10-29 1986-05-22 Hitachi Ltd 異物検出方法及びその装置
JPS61230048A (ja) * 1985-04-05 1986-10-14 Hitachi Ltd 異物検出方法
JP2661913B2 (ja) * 1986-05-02 1997-10-08 パ−テイクル、メジユアリング、システムズ インコ−ポレ−テツド 表面分析方法および表面分析装置
JPS62261044A (ja) * 1986-05-06 1987-11-13 Hitachi Electronics Eng Co Ltd 異物検査装置
JPH01172737A (ja) * 1987-12-28 1989-07-07 Sumitomo Metal Mining Co Ltd 光磁気記録媒体欠損解析装置

Also Published As

Publication number Publication date
EP0335163A3 (de) 1991-01-09
EP0335163B1 (de) 1994-05-25
EP0335163A2 (de) 1989-10-04
JPH0774788B2 (ja) 1995-08-09
DE68915472T2 (de) 1994-10-06
JPH01245136A (ja) 1989-09-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee