DE68914420D1 - Synchrotron-Bestrahlungsgerät. - Google Patents

Synchrotron-Bestrahlungsgerät.

Info

Publication number
DE68914420D1
DE68914420D1 DE89122557T DE68914420T DE68914420D1 DE 68914420 D1 DE68914420 D1 DE 68914420D1 DE 89122557 T DE89122557 T DE 89122557T DE 68914420 T DE68914420 T DE 68914420T DE 68914420 D1 DE68914420 D1 DE 68914420D1
Authority
DE
Germany
Prior art keywords
radiation device
synchrotron radiation
synchrotron
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE89122557T
Other languages
English (en)
Other versions
DE68914420T2 (de
Inventor
Yoshimi C O Fujitsu Yamashita
Kei C O Fujitsu Limit Horiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE68914420D1 publication Critical patent/DE68914420D1/de
Application granted granted Critical
Publication of DE68914420T2 publication Critical patent/DE68914420T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G21K1/043—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers changing time structure of beams by mechanical means, e.g. choppers, spinning filter wheels
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68914420T 1988-12-08 1989-12-07 Synchrotron-Bestrahlungsgerät. Expired - Fee Related DE68914420T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63310422A JPH0695159B2 (ja) 1988-12-08 1988-12-08 放射線装置

Publications (2)

Publication Number Publication Date
DE68914420D1 true DE68914420D1 (de) 1994-05-11
DE68914420T2 DE68914420T2 (de) 1994-07-28

Family

ID=18005069

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68914420T Expired - Fee Related DE68914420T2 (de) 1988-12-08 1989-12-07 Synchrotron-Bestrahlungsgerät.

Country Status (5)

Country Link
US (1) US4996700A (de)
EP (1) EP0373504B1 (de)
JP (1) JPH0695159B2 (de)
KR (1) KR930002560B1 (de)
DE (1) DE68914420T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04369500A (ja) * 1991-06-18 1992-12-22 Seiko Seiki Co Ltd 放射線装置
US5195121A (en) * 1992-01-22 1993-03-16 B.C. Medical Ltd. X-ray beam modulator
JP4235480B2 (ja) 2002-09-03 2009-03-11 キヤノン株式会社 差動排気システム及び露光装置
JP3703447B2 (ja) * 2002-09-06 2005-10-05 キヤノン株式会社 差動排気システム及び露光装置
US20050223973A1 (en) * 2004-03-30 2005-10-13 Infineon Technologies Ag EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
JP4417410B2 (ja) 2007-08-28 2010-02-17 株式会社神戸製鋼所 中性子チョッパー
RU2496285C2 (ru) * 2007-12-28 2013-10-20 Фоникс Нуклие Лэбс ЛЛС Источник протонов или нейтронов высокой энергии
DK2513640T3 (da) 2009-12-15 2020-04-27 Phoenix Llc Fremgangsmåde og indretning til at udføre aktiv neutroninterrogation af containere
DE102014004994B3 (de) * 2014-04-02 2015-07-23 Airbus Ds Gmbh Chopperscheibe sowie Vorrichtung und Verfahren zu deren Herstellung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2170980B (en) * 1985-02-07 1988-05-25 Steve Webb Ct scanner and detector therefor
JPS62222634A (ja) * 1986-03-18 1987-09-30 Fujitsu Ltd Ｘ線露光方法
DE3806950A1 (de) * 1988-03-03 1989-09-14 Siemens Ag Vorrichtung zur belichtung einer mit einer strahlungsempfindlichen schicht versehenen probe

Also Published As

Publication number Publication date
US4996700A (en) 1991-02-26
KR900010927A (ko) 1990-07-11
JPH0695159B2 (ja) 1994-11-24
JPH02156200A (ja) 1990-06-15
EP0373504B1 (de) 1994-04-06
EP0373504A1 (de) 1990-06-20
KR930002560B1 (en) 1993-04-03
DE68914420T2 (de) 1994-07-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee