DE68908304D1 - Photopolymerisierbare harzzusammensetzung auf waessriger grundlage. - Google Patents

Photopolymerisierbare harzzusammensetzung auf waessriger grundlage.

Info

Publication number
DE68908304D1
DE68908304D1 DE8989309017T DE68908304T DE68908304D1 DE 68908304 D1 DE68908304 D1 DE 68908304D1 DE 8989309017 T DE8989309017 T DE 8989309017T DE 68908304 T DE68908304 T DE 68908304T DE 68908304 D1 DE68908304 D1 DE 68908304D1
Authority
DE
Germany
Prior art keywords
resin composition
photopolymerizable resin
aqueous basis
aqueous
basis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8989309017T
Other languages
English (en)
Other versions
DE68908304T2 (de
Inventor
Naoya Katsumata
Toshimi - Aoyama
Syunzi Nakazato
Katsuyuki Ohta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Application granted granted Critical
Publication of DE68908304D1 publication Critical patent/DE68908304D1/de
Publication of DE68908304T2 publication Critical patent/DE68908304T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
DE89309017T 1988-09-08 1989-09-06 Photopolymerisierbare Harzzusammensetzung auf wässriger Grundlage. Expired - Fee Related DE68908304T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63223564A JPH0273810A (ja) 1988-09-08 1988-09-08 光重合性樹脂組成物

Publications (2)

Publication Number Publication Date
DE68908304D1 true DE68908304D1 (de) 1993-09-16
DE68908304T2 DE68908304T2 (de) 1994-01-27

Family

ID=16800137

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89309017T Expired - Fee Related DE68908304T2 (de) 1988-09-08 1989-09-06 Photopolymerisierbare Harzzusammensetzung auf wässriger Grundlage.

Country Status (4)

Country Link
US (1) US4933260A (de)
EP (1) EP0358479B1 (de)
JP (1) JPH0273810A (de)
DE (1) DE68908304T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5233141A (en) * 1989-02-23 1993-08-03 Automotive Technologies International Inc. Spring mass passenger compartment crash sensors
US7135269B2 (en) * 2003-01-30 2006-11-14 Shin-Etsu Chemical Co., Ltd. Polymer, resist composition and patterning process
EP1783552B1 (de) 2005-11-03 2015-10-07 Kissel & Wolf GmbH Photopolymerisierbare Zusammensetzung zur Herstellung von Druckformen
US10280318B2 (en) 2015-04-23 2019-05-07 Electronics For Imaging, Inc. Monomers and oligomers with application in energy curing chemistry

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3897295A (en) * 1969-01-16 1975-07-29 Ppg Industries Inc Ionizing radiation method for forming acrylic pressure sensitive adhesives and coated substrates
JPS503041B1 (de) * 1970-03-27 1975-01-31
DE3329443A1 (de) * 1983-08-16 1985-03-07 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes kopiermaterial
JPS61228002A (ja) * 1985-04-02 1986-10-11 Nippon Paint Co Ltd 高感度光硬化性樹脂組成物
JPS62199608A (ja) * 1986-02-27 1987-09-03 Kohjin Co Ltd 紫外線硬化樹脂及び電子線硬化樹脂用希釈剤
JPH01163174A (ja) * 1987-12-18 1989-06-27 Soken Kagaku Kk テトラヒドロフルフリオキシメチルアクリルアミド

Also Published As

Publication number Publication date
DE68908304T2 (de) 1994-01-27
JPH0273810A (ja) 1990-03-13
US4933260A (en) 1990-06-12
EP0358479A1 (de) 1990-03-14
EP0358479B1 (de) 1993-08-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee