DE68901860D1 - Vorrichtung zur behandlung von halbleiterplatten in einem saeurebad. - Google Patents

Vorrichtung zur behandlung von halbleiterplatten in einem saeurebad.

Info

Publication number
DE68901860D1
DE68901860D1 DE8989119009T DE68901860T DE68901860D1 DE 68901860 D1 DE68901860 D1 DE 68901860D1 DE 8989119009 T DE8989119009 T DE 8989119009T DE 68901860 T DE68901860 T DE 68901860T DE 68901860 D1 DE68901860 D1 DE 68901860D1
Authority
DE
Germany
Prior art keywords
acid bath
treating semiconductor
semiconductor boards
boards
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8989119009T
Other languages
English (en)
Other versions
DE68901860T2 (de
Inventor
Silvestro Cardani
Flavio Pareschi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SRL
Original Assignee
SGS Thomson Microelectronics SRL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SGS Thomson Microelectronics SRL filed Critical SGS Thomson Microelectronics SRL
Application granted granted Critical
Publication of DE68901860D1 publication Critical patent/DE68901860D1/de
Publication of DE68901860T2 publication Critical patent/DE68901860T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/42—Heating elements having the shape of rods or tubes non-flexible
    • H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE8989119009T 1988-11-04 1989-10-12 Vorrichtung zur behandlung von halbleiterplatten in einem saeurebad. Expired - Lifetime DE68901860T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8822510A IT1227979B (it) 1988-11-04 1988-11-04 Apparecchio per il trattamento in un bagno acido di wafers o fette di silicio

Publications (2)

Publication Number Publication Date
DE68901860D1 true DE68901860D1 (de) 1992-07-23
DE68901860T2 DE68901860T2 (de) 1992-12-17

Family

ID=11197238

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8989119009T Expired - Lifetime DE68901860T2 (de) 1988-11-04 1989-10-12 Vorrichtung zur behandlung von halbleiterplatten in einem saeurebad.

Country Status (5)

Country Link
US (1) US5003999A (de)
EP (1) EP0374399B1 (de)
JP (1) JPH02210829A (de)
DE (1) DE68901860T2 (de)
IT (1) IT1227979B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5625249A (en) * 1994-07-20 1997-04-29 Submicron Systems, Inc. Megasonic cleaning system
DE102009035341A1 (de) 2009-07-23 2011-01-27 Gebr. Schmid Gmbh & Co. Vorrichtung zur Reinigung von Substraten an einem Träger
CN102201329B (zh) * 2011-04-29 2012-10-10 苏州凯西石英电子有限公司 石英加热槽
CN106423320B (zh) * 2016-11-10 2018-05-25 安徽理工大学 一种用于浸泡实验室玻璃器皿的酸缸

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1222426A (en) * 1917-04-10 John Henry Lepper Heating means for carbureters.
US1754080A (en) * 1929-04-05 1930-04-08 Adelbert L Briggs Crank-case heater for motor vehicles and the like
US2274445A (en) * 1940-05-16 1942-02-24 Edwin L Wiegand Heating means
US2860226A (en) * 1957-03-26 1958-11-11 Westinghouse Electric Corp Electric heater assembly
US3546431A (en) * 1969-04-25 1970-12-08 Erich L Gibbs Immersion heater and method of making the same
IT986735B (it) * 1973-06-14 1975-01-30 Rec Snc Gruppo riscaldatore intercambia bile dall esterno per vasche con tenenti liquidi
US3983361A (en) * 1975-03-20 1976-09-28 Radiant Technology Corporation Electric heating apparatus for heating corrosive solutions
US4408117A (en) * 1980-05-28 1983-10-04 Yurkanin Robert M Impedance heating system with skin effect particularly for railroad tank cars
US4593178A (en) * 1984-05-30 1986-06-03 Cepeda Associates, Inc. Removable electric heating assembly for fluid heaters and boilers
IT207577Z2 (it) * 1986-05-27 1988-01-25 Newa Srl Elemento scaldante per acquari e simili.
FR2623357A1 (fr) * 1987-11-12 1989-05-19 Ego France Thermoplongeur a double paroi

Also Published As

Publication number Publication date
US5003999A (en) 1991-04-02
EP0374399A1 (de) 1990-06-27
DE68901860T2 (de) 1992-12-17
IT8822510A0 (it) 1988-11-04
IT1227979B (it) 1991-05-20
EP0374399B1 (de) 1992-06-17
JPH02210829A (ja) 1990-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee