DE60326724D1 - Strukturierungsverfahren - Google Patents

Strukturierungsverfahren

Info

Publication number
DE60326724D1
DE60326724D1 DE60326724T DE60326724T DE60326724D1 DE 60326724 D1 DE60326724 D1 DE 60326724D1 DE 60326724 T DE60326724 T DE 60326724T DE 60326724 T DE60326724 T DE 60326724T DE 60326724 D1 DE60326724 D1 DE 60326724D1
Authority
DE
Germany
Prior art keywords
structuring process
structuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60326724T
Other languages
English (en)
Inventor
Bruno Michel
Hugo E Rothuizen
Peter Vettiger
Gian-Luca Bona
Hans Biebuyck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE60326724D1 publication Critical patent/DE60326724D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/975—Substrate or mask aligning feature

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
DE60326724T 2002-05-30 2003-05-28 Strukturierungsverfahren Expired - Lifetime DE60326724D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405431 2002-05-30
PCT/IB2003/002278 WO2003102691A1 (en) 2002-05-30 2003-05-28 Patterning method

Publications (1)

Publication Number Publication Date
DE60326724D1 true DE60326724D1 (de) 2009-04-30

Family

ID=29595060

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60326724T Expired - Lifetime DE60326724D1 (de) 2002-05-30 2003-05-28 Strukturierungsverfahren

Country Status (5)

Country Link
US (1) US7235464B2 (de)
EP (1) EP1516228B1 (de)
JP (1) JP4147221B2 (de)
DE (1) DE60326724D1 (de)
WO (1) WO2003102691A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
JP4726789B2 (ja) * 2003-09-29 2011-07-20 インターナショナル・ビジネス・マシーンズ・コーポレーション 製造方法
US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
EP1704585B1 (de) 2003-12-19 2017-03-15 The University Of North Carolina At Chapel Hill Verfahren zur herstellung isolierter mikro- und nanostrukturen unter verwendung von soft- oder druck-lithographie
WO2006084202A2 (en) * 2005-02-03 2006-08-10 The University Of North Carolina At Chapel Hill Low surface energy polymeric material for use in liquid crystal displays
US20090304992A1 (en) * 2005-08-08 2009-12-10 Desimone Joseph M Micro and Nano-Structure Metrology
US20070290282A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Bonded chip assembly with a micro-mover for microelectromechanical systems
US20070121477A1 (en) * 2006-06-15 2007-05-31 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US20070291623A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US20080023885A1 (en) * 2006-06-15 2008-01-31 Nanochip, Inc. Method for forming a nano-imprint lithography template having very high feature counts
US20080181958A1 (en) * 2006-06-19 2008-07-31 Rothrock Ginger D Nanoparticle fabrication methods, systems, and materials
US20080074984A1 (en) * 2006-09-21 2008-03-27 Nanochip, Inc. Architecture for a Memory Device
US20080074792A1 (en) * 2006-09-21 2008-03-27 Nanochip, Inc. Control scheme for a memory device
US7832416B2 (en) * 2006-10-10 2010-11-16 Hewlett-Packard Development Company, L.P. Imprint lithography apparatus and methods
KR100785033B1 (ko) * 2006-12-06 2007-12-12 삼성전자주식회사 자구벽 이동을 이용한 정보 저장 장치 및 그 제조방법
WO2008118861A2 (en) * 2007-03-23 2008-10-02 The University Of North Carolina At Chapel Hill Discrete size and shape specific organic nanoparticles designed to elicit an immune response
US7763484B2 (en) * 2007-06-13 2010-07-27 Sumitomo Electric Industries, Ltd. Method to form an optical grating and to form a distributed feedback laser diode with the optical grating
EP2300207A4 (de) * 2008-06-26 2012-05-09 Harvard College Mittels replikation hergestellte vielseitige betätigbare nanostrukturierte materialien
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
WO2010059781A1 (en) * 2008-11-19 2010-05-27 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
US8261660B2 (en) * 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
DE102010052033A1 (de) * 2010-11-23 2012-05-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Verfahren zur Herstellung von metallischen Strukturen
CN106199795B (zh) 2011-02-08 2019-03-05 浜松光子学株式会社 光学元件及其制造方法
JP6234667B2 (ja) 2012-08-06 2017-11-22 浜松ホトニクス株式会社 光学素子及びその製造方法
US10522389B2 (en) 2014-10-28 2019-12-31 Analog Devices, Inc. Transfer printing method
FR3066624B1 (fr) * 2017-05-20 2019-09-13 Sunpartner Technologies Procede de lithographie par nanoimpression utilisant une etape d'autoguidage
JP7041545B2 (ja) * 2018-02-16 2022-03-24 キヤノン株式会社 インプリント装置、物品の製造方法及びモールド

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372258B2 (ja) * 1995-08-04 2003-01-27 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン リソグラフィ・プロセス用のスタンプ
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
NO311797B1 (no) * 1999-05-12 2002-01-28 Thin Film Electronics Asa Fremgangsmåter til mönstring av polymerfilmer og anvendelse av fremgangsmåtene
SG108820A1 (en) * 2001-02-23 2005-02-28 Agency Science Tech & Res Method and apparatus for forming a metallic feature on a substrate
US6656398B2 (en) * 2001-06-19 2003-12-02 Corning Incorporated Process of making a pattern in a film
AU2003217184A1 (en) * 2002-01-11 2003-09-02 Massachusetts Institute Of Technology Microcontact printing

Also Published As

Publication number Publication date
US20050124092A1 (en) 2005-06-09
US7235464B2 (en) 2007-06-26
JP2005520213A (ja) 2005-07-07
WO2003102691A1 (en) 2003-12-11
EP1516228A1 (de) 2005-03-23
EP1516228B1 (de) 2009-03-18
JP4147221B2 (ja) 2008-09-10

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8364 No opposition during term of opposition