DE60316020D1 - Verfahren und vorrichtung zur herstellung und rückführung von fluor - Google Patents

Verfahren und vorrichtung zur herstellung und rückführung von fluor

Info

Publication number
DE60316020D1
DE60316020D1 DE60316020T DE60316020T DE60316020D1 DE 60316020 D1 DE60316020 D1 DE 60316020D1 DE 60316020 T DE60316020 T DE 60316020T DE 60316020 T DE60316020 T DE 60316020T DE 60316020 D1 DE60316020 D1 DE 60316020D1
Authority
DE
Germany
Prior art keywords
fluor
retrieving
producing
retrieving fluor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60316020T
Other languages
English (en)
Other versions
DE60316020T2 (de
Inventor
Donald K Smith
Matthew M Besen
William M Holber
Stephen F Horne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MKS Instruments Inc
Original Assignee
MKS Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MKS Instruments Inc filed Critical MKS Instruments Inc
Application granted granted Critical
Publication of DE60316020D1 publication Critical patent/DE60316020D1/de
Publication of DE60316020T2 publication Critical patent/DE60316020T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/36—Controlling flow of gases or vapour
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00164—Controlling or regulating processes controlling the flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treating Waste Gases (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
DE60316020T 2002-12-06 2003-12-04 Verfahren und vorrichtung zur herstellung und rückführung von fluor Expired - Lifetime DE60316020T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/313,516 US7238266B2 (en) 2002-12-06 2002-12-06 Method and apparatus for fluorine generation and recirculation
US313516 2002-12-06
PCT/US2003/038721 WO2004053198A2 (en) 2002-12-06 2003-12-04 Method and apparatus for fluorine generation and recirculation

Publications (2)

Publication Number Publication Date
DE60316020D1 true DE60316020D1 (de) 2007-10-11
DE60316020T2 DE60316020T2 (de) 2008-05-21

Family

ID=32468269

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60316020T Expired - Lifetime DE60316020T2 (de) 2002-12-06 2003-12-04 Verfahren und vorrichtung zur herstellung und rückführung von fluor

Country Status (8)

Country Link
US (1) US7238266B2 (de)
EP (1) EP1567448B1 (de)
JP (1) JP2006508799A (de)
KR (1) KR100994298B1 (de)
CN (1) CN100515927C (de)
AU (1) AU2003298946A1 (de)
DE (1) DE60316020T2 (de)
WO (1) WO2004053198A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003282925A1 (en) * 2002-10-04 2004-05-04 The Regents Of The University Of California Fluorine separation and generation device
JP4804345B2 (ja) * 2004-03-31 2011-11-02 関東電化工業株式会社 Ｆ２含有ガスの製造方法及びｆ２含有ガスの製造装置
JP4621126B2 (ja) * 2005-12-13 2011-01-26 セントラル硝子株式会社 Ｆ２ガスの製造方法
WO2007129165A2 (en) * 2006-04-28 2007-11-15 Ge Healthcare Limited Production of [18f] from [18f]-fluoride using a plasma induced scrambling procedure
WO2008150769A2 (en) * 2007-05-31 2008-12-11 Thinsilicon Corporation Photovoltaic device and method of manufacturing photovoltaic devices
US20110114156A1 (en) * 2009-06-10 2011-05-19 Thinsilicon Corporation Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode
JP2012523716A (ja) * 2009-06-10 2012-10-04 シンシリコン・コーポレーション 光起電モジュール、及び、複数半導体層スタックを有する光起電モジュールの製造方法
CN102602891B (zh) * 2012-01-18 2013-09-11 万华化学集团股份有限公司 一种氯化氢制备氯气的方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB346774A (en) 1930-01-09 1931-04-09 Ig Farbenindustrie Ag Process for the electrolytic manufacture of gaseous fluorine
US2463850A (en) * 1946-07-20 1949-03-08 Standard Oil Dev Co Process for the production of chlorohydrins
GB1407579A (en) * 1973-03-13 1975-09-24 Kali Chemie Fluor Gmbh Method of electrolytically producing elemental fluorine
FR2627767A1 (fr) 1978-06-27 1989-09-01 Onera (Off Nat Aerospatiale) Chambre de combustion pour laser chimique
IL67047A0 (en) * 1981-10-28 1983-02-23 Eltech Systems Corp Narrow gap electrolytic cells
JPH0737677B2 (ja) * 1986-05-26 1995-04-26 日本鋼管株式会社 電気亜鉛めっき浴
US4707224A (en) * 1986-10-30 1987-11-17 The Dow Chemical Company Device and method for fluorinating compounds
JPH02201983A (ja) * 1989-01-31 1990-08-10 Ebara Corp ＡｒＦレーザ、ＫｒＦレーザ用フツ素ガス補給装置
JP2726769B2 (ja) * 1991-04-03 1998-03-11 三菱電機株式会社 空調素子及び空調容器装置
US5403619A (en) * 1993-01-19 1995-04-04 International Business Machines Corporation Solid state ionic polishing of diamond
IL105442A (en) * 1993-04-19 1996-01-19 Carbon Membranes Ltd Method for the separation of gases at low temperatures
JP3566996B2 (ja) * 1994-10-19 2004-09-15 日本パイオニクス株式会社 ハロゲンガスの精製方法
US5597495A (en) * 1994-11-07 1997-01-28 Keil; Mark Method and apparatus for etching surfaces with atomic fluorine
US5914434A (en) * 1995-01-16 1999-06-22 Carbon Membranes, Ltd. Separation of linear from branched hydrocarbons using a carbon membrane
JPH08203881A (ja) * 1995-01-30 1996-08-09 Aneruba Kk 表面処理装置
DE19543678A1 (de) * 1995-11-23 1997-05-28 Bayer Ag Verfahren zur direkten elektrochemischen Gasphasen-Phosgensynthese
US6020035A (en) * 1996-10-29 2000-02-01 Applied Materials, Inc. Film to tie up loose fluorine in the chamber after a clean process
US6079426A (en) * 1997-07-02 2000-06-27 Applied Materials, Inc. Method and apparatus for determining the endpoint in a plasma cleaning process
JPH11140624A (ja) * 1997-11-14 1999-05-25 Nikon Corp フッ化物薄膜の製造方法及びその方法により製造した光学薄膜
IL123462A0 (en) * 1998-02-26 1998-09-24 Carbon Membranes Ltd A method for potting or casting inorganic hollow fiber membranes intotube sheets
DE19847618A1 (de) * 1998-10-15 2000-04-20 Basf Ag Verfahren zur Herstellung von festen Dosierungsformen
US6374831B1 (en) * 1999-02-04 2002-04-23 Applied Materials, Inc. Accelerated plasma clean
US6432256B1 (en) 1999-02-25 2002-08-13 Applied Materials, Inc. Implanatation process for improving ceramic resistance to corrosion
GB9923951D0 (en) * 1999-10-08 1999-12-08 Boc Group Plc Treatment of gas mixture
US6500356B2 (en) * 2000-03-27 2002-12-31 Applied Materials, Inc. Selectively etching silicon using fluorine without plasma
US6863019B2 (en) * 2000-06-13 2005-03-08 Applied Materials, Inc. Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
JP2002085939A (ja) * 2000-09-14 2002-03-26 Air Water Inc フッ素系排ガス分解処理方法
JP2002129334A (ja) * 2000-10-26 2002-05-09 Applied Materials Inc 気相堆積装置のクリーニング方法及び気相堆積装置
JP2002320844A (ja) * 2001-04-24 2002-11-05 Sekisui Chem Co Ltd 排ガス分解処理方法
AU2003282925A1 (en) * 2002-10-04 2004-05-04 The Regents Of The University Of California Fluorine separation and generation device
US6872909B2 (en) * 2003-04-16 2005-03-29 Applied Science And Technology, Inc. Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
JP2005224771A (ja) * 2004-02-16 2005-08-25 Mitsubishi Heavy Ind Ltd 排水処理装置

Also Published As

Publication number Publication date
US7238266B2 (en) 2007-07-03
CN100515927C (zh) 2009-07-22
JP2006508799A (ja) 2006-03-16
EP1567448B1 (de) 2007-08-29
DE60316020T2 (de) 2008-05-21
CN1720195A (zh) 2006-01-11
KR20050092697A (ko) 2005-09-22
WO2004053198A2 (en) 2004-06-24
AU2003298946A1 (en) 2004-06-30
AU2003298946A8 (en) 2004-06-30
US20040109817A1 (en) 2004-06-10
EP1567448A2 (de) 2005-08-31
KR100994298B1 (ko) 2010-11-12
WO2004053198A3 (en) 2005-03-31

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