DE602006003129D1 - ) zum Erzeugen einer Schicht hoher Qualität - Google Patents

) zum Erzeugen einer Schicht hoher Qualität

Info

Publication number
DE602006003129D1
DE602006003129D1 DE200660003129 DE602006003129T DE602006003129D1 DE 602006003129 D1 DE602006003129 D1 DE 602006003129D1 DE 200660003129 DE200660003129 DE 200660003129 DE 602006003129 T DE602006003129 T DE 602006003129T DE 602006003129 D1 DE602006003129 D1 DE 602006003129D1
Authority
DE
Germany
Prior art keywords
producing
high quality
quality layer
layer
quality
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200660003129
Other languages
English (en)
Inventor
Annelise Delabie
Matty Caymax
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interuniversitair Microelektronica Centrum vzw IMEC
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP05447261A external-priority patent/EP1790758A1/de
Application filed by Interuniversitair Microelektronica Centrum vzw IMEC filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Publication of DE602006003129D1 publication Critical patent/DE602006003129D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

DE200660003129 2005-06-01 2006-06-01 ) zum Erzeugen einer Schicht hoher Qualität Active DE602006003129D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US68681105P 2005-06-01 2005-06-01
EP05447261A EP1790758A1 (de) 2005-11-25 2005-11-25 Beschichtungsverfahren mit atomaren Schichten (ald) zum Erzeugen einer Schicht hoher Qualität

Publications (1)

Publication Number Publication Date
DE602006003129D1 true DE602006003129D1 (de) 2008-11-27

Family

ID=37647567

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200660003129 Active DE602006003129D1 (de) 2005-06-01 2006-06-01 ) zum Erzeugen einer Schicht hoher Qualität

Country Status (3)

Country Link
JP (1) JP4769638B2 (de)
AT (1) ATE411410T1 (de)
DE (1) DE602006003129D1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101678776B1 (ko) * 2015-04-13 2016-11-22 충남대학교산학협력단 박막 트랜지스터 제조방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2828152B2 (ja) * 1991-08-13 1998-11-25 富士通 株式会社 薄膜形成方法、多層構造膜及びシリコン薄膜トランジスタの形成方法

Also Published As

Publication number Publication date
JP4769638B2 (ja) 2011-09-07
ATE411410T1 (de) 2008-10-15
JP2006352109A (ja) 2006-12-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition