DE602006002916D1 - Interferometer und Kalibrierverfahren dafür - Google Patents
Interferometer und Kalibrierverfahren dafürInfo
- Publication number
- DE602006002916D1 DE602006002916D1 DE602006002916T DE602006002916T DE602006002916D1 DE 602006002916 D1 DE602006002916 D1 DE 602006002916D1 DE 602006002916 T DE602006002916 T DE 602006002916T DE 602006002916 T DE602006002916 T DE 602006002916T DE 602006002916 D1 DE602006002916 D1 DE 602006002916D1
- Authority
- DE
- Germany
- Prior art keywords
- interferometer
- calibration method
- calibration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02004—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005128872 | 2005-04-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006002916D1 true DE602006002916D1 (de) | 2008-11-13 |
Family
ID=36653580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006002916T Active DE602006002916D1 (de) | 2005-04-27 | 2006-04-27 | Interferometer und Kalibrierverfahren dafür |
Country Status (3)
Country | Link |
---|---|
US (1) | US7511827B2 (de) |
EP (1) | EP1717546B1 (de) |
DE (1) | DE602006002916D1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006035022A1 (de) * | 2006-07-28 | 2008-01-31 | Carl Zeiss Smt Ag | Verfahren zum Herstellen einer optischen Komponente, Interferometeranordnung und Beugungsgitter |
TWI326354B (en) * | 2007-05-18 | 2010-06-21 | Univ Nat Taipei Technology | Method and apparatus for simultaneously acquiring interferograms and method for solving the phase |
JP5558768B2 (ja) * | 2008-10-24 | 2014-07-23 | キヤノン株式会社 | 測定装置、光源装置、干渉測定装置、露光装置、及びデバイス製造方法 |
TWI470184B (zh) * | 2011-08-20 | 2015-01-21 | Tonta Electro Optical Co Ltd | 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法 |
JP5988643B2 (ja) * | 2012-03-26 | 2016-09-07 | キヤノン株式会社 | 計測装置、計測方法及び光学部品の製造方法 |
WO2014165414A1 (en) * | 2013-03-31 | 2014-10-09 | Kla-Tencor Corporation | Reducing registration error of front and back wafer surfaces utilizing a see-through calibration wafer |
US20150077759A1 (en) * | 2013-07-30 | 2015-03-19 | University Of Rochester | Compact, Slope Sensitive Optical Probe |
US9222810B1 (en) | 2013-09-19 | 2015-12-29 | Sandia Corporation | In situ calibration of a light source in a sensor device |
JP6246875B1 (ja) * | 2016-08-24 | 2017-12-13 | Ckd株式会社 | 計測装置 |
CN110243289A (zh) * | 2018-12-27 | 2019-09-17 | 桂林电子科技大学 | 一种实时云纹干涉图高速相位提取系统及提取方法 |
JP7296844B2 (ja) * | 2019-10-08 | 2023-06-23 | 株式会社ミツトヨ | 解析装置、解析方法、干渉測定システム、およびプログラム |
DE102019215707A1 (de) * | 2019-10-14 | 2021-04-15 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
CN114235023B (zh) * | 2021-11-18 | 2024-05-03 | 北京卫星制造厂有限公司 | 相移器在线标定方法及装置 |
CN117030207B (zh) * | 2023-08-25 | 2024-03-08 | 茂莱(南京)仪器有限公司 | 一种激光干涉仪自动质评方法、装置、设备及介质 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2821685B2 (ja) | 1989-04-27 | 1998-11-05 | 理化学研究所 | 2次元情報取得装置 |
EP0561015A1 (de) * | 1992-03-17 | 1993-09-22 | International Business Machines Corporation | Interferometrische Phasenmessung |
JP2000329535A (ja) | 1999-05-18 | 2000-11-30 | Mitsutoyo Corp | 位相シフト干渉縞の同時計測装置 |
US6304330B1 (en) | 1999-10-06 | 2001-10-16 | Metrolaser, Inc. | Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry |
JP3426552B2 (ja) * | 2000-02-18 | 2003-07-14 | 株式会社ミツトヨ | 形状計測装置 |
JP2002340538A (ja) * | 2001-05-14 | 2002-11-27 | Matsushita Electric Ind Co Ltd | 薄板材の平坦度測定装置および方法 |
DE10249409B4 (de) * | 2001-10-25 | 2007-09-20 | Canon K.K. | Interferometer und Positionsmessvorrichtung |
AU2002364544A1 (en) | 2001-12-10 | 2003-07-09 | Zygo Corporation | Method and apparatus for calibrating a wavelength-tuning interferometer |
EP1411321B1 (de) * | 2002-10-15 | 2017-04-19 | Mitutoyo Corporation | Interferometer mit integrierter Bildaufnahmematrix, Polarisator hoher dichte und Phasenverschiebungsmatrix |
GB2401937B (en) * | 2003-05-23 | 2006-07-19 | Taylor Hobson Ltd | Surface profiling apparatus |
US6992778B2 (en) * | 2003-08-08 | 2006-01-31 | Mitutoyo Corporation | Method and apparatus for self-calibration of a tunable-source phase shifting interferometer |
US7212290B2 (en) * | 2004-07-28 | 2007-05-01 | Agilent Technologies, Inc. | Differential interferometers creating desired beam patterns |
-
2006
- 2006-04-27 EP EP06113217A patent/EP1717546B1/de not_active Expired - Fee Related
- 2006-04-27 US US11/411,809 patent/US7511827B2/en not_active Expired - Fee Related
- 2006-04-27 DE DE602006002916T patent/DE602006002916D1/de active Active
Also Published As
Publication number | Publication date |
---|---|
EP1717546B1 (de) | 2008-10-01 |
EP1717546A1 (de) | 2006-11-02 |
US20060250618A1 (en) | 2006-11-09 |
US7511827B2 (en) | 2009-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |