DE602006002264D1 - Magnetanordnung für eine Sputter-Ionenpumpe - Google Patents

Magnetanordnung für eine Sputter-Ionenpumpe

Info

Publication number
DE602006002264D1
DE602006002264D1 DE602006002264T DE602006002264T DE602006002264D1 DE 602006002264 D1 DE602006002264 D1 DE 602006002264D1 DE 602006002264 T DE602006002264 T DE 602006002264T DE 602006002264 T DE602006002264 T DE 602006002264T DE 602006002264 D1 DE602006002264 D1 DE 602006002264D1
Authority
DE
Germany
Prior art keywords
magnet arrangement
ion pump
sputter ion
sputter
pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006002264T
Other languages
German (de)
English (en)
Inventor
Michele Mura
Luca Bonmassar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian SpA
Original Assignee
Varian SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian SpA filed Critical Varian SpA
Publication of DE602006002264D1 publication Critical patent/DE602006002264D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
DE602006002264T 2006-06-01 2006-06-01 Magnetanordnung für eine Sputter-Ionenpumpe Active DE602006002264D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06425377A EP1863068B1 (fr) 2006-06-01 2006-06-01 Ensemble d'aimants pour pompe ionique à pulvérisation cathodique

Publications (1)

Publication Number Publication Date
DE602006002264D1 true DE602006002264D1 (de) 2008-09-25

Family

ID=37188921

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006002264T Active DE602006002264D1 (de) 2006-06-01 2006-06-01 Magnetanordnung für eine Sputter-Ionenpumpe

Country Status (4)

Country Link
US (1) US20070280834A1 (fr)
EP (1) EP1863068B1 (fr)
JP (1) JP2007324134A (fr)
DE (1) DE602006002264D1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009166478A (ja) 2007-12-17 2009-07-30 Pilot Ink Co Ltd 変色性積層体
WO2009101814A1 (fr) * 2008-02-14 2009-08-20 National Institute Of Information And Communications Technology Système de pompe ionique et générateur de champ électromagnétique
EP2151849B1 (fr) * 2008-08-08 2011-12-14 Agilent Technologies Italia S.p.A. Système de pompe à vide comprenant plusieurs pompes ioniques à pulvérisation
WO2015012671A1 (fr) * 2013-07-22 2015-01-29 Saparqaliyev Aldan Asanovich Système de dispositifs et composants de celui-ci
CN104952685B (zh) * 2015-01-19 2017-11-21 中国航天员科研训练中心 轻量化大抽速离子泵
CN109830422B (zh) * 2019-02-26 2020-05-19 东北大学 一种溅射离子泵的磁路结构及溅射离子泵

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4672346A (en) * 1984-04-11 1987-06-09 Sumotomo Special Metal Co., Ltd. Magnetic field generating device for NMR-CT
US4727293A (en) * 1984-08-16 1988-02-23 Board Of Trustees Operating Michigan State University Plasma generating apparatus using magnets and method
FR2611975B1 (fr) * 1987-03-03 1995-02-17 Commissariat Energie Atomique Systeme d'aimants permanents pour un champ magnetique intense
GB2215522B (en) * 1988-02-26 1990-11-28 Picker Int Ltd Magnet arrangements
US4964968A (en) * 1988-04-30 1990-10-23 Mitsubishi Kasei Corp. Magnetron sputtering apparatus
US5133826A (en) * 1989-03-09 1992-07-28 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source
GB9006073D0 (en) * 1990-03-17 1990-05-16 D G Teer Coating Services Limi Magnetron sputter ion plating
DE4009151A1 (de) * 1990-03-22 1991-09-26 Leybold Ag Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
US5262028A (en) * 1992-06-01 1993-11-16 Sierra Applied Sciences, Inc. Planar magnetron sputtering magnet assembly
GB9302837D0 (en) * 1993-02-12 1993-03-31 Oxford Instr Uk Ltd Magnet assembly
US5592090A (en) * 1994-12-12 1997-01-07 Houston Advanced Research Center Compact, open geometry U-shaped magnet for magnetic resonance imaging
US5929732A (en) * 1997-04-17 1999-07-27 Lockheed Martin Corporation Apparatus and method for amplifying a magnetic beam
JPH11297673A (ja) * 1998-04-15 1999-10-29 Hitachi Ltd プラズマ処理装置及びクリーニング方法
JP4563629B2 (ja) * 2001-11-19 2010-10-13 株式会社エフ・ティ・エスコーポレーション 対向ターゲット式スパッタ装置
US6835048B2 (en) * 2002-12-18 2004-12-28 Varian, Inc. Ion pump having secondary magnetic field
JP2006093026A (ja) * 2004-09-27 2006-04-06 Toshiba Corp スパッタイオンポンプおよび画像表示装置
JP4557681B2 (ja) * 2004-11-09 2010-10-06 株式会社アルバック スパッタイオンポンプ

Also Published As

Publication number Publication date
EP1863068A1 (fr) 2007-12-05
JP2007324134A (ja) 2007-12-13
EP1863068B1 (fr) 2008-08-13
US20070280834A1 (en) 2007-12-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition