DE602005019581D1 - Verfahren zum ablösen einer dünnen halbleiterschaltung von ihrer basis - Google Patents

Verfahren zum ablösen einer dünnen halbleiterschaltung von ihrer basis

Info

Publication number
DE602005019581D1
DE602005019581D1 DE602005019581T DE602005019581T DE602005019581D1 DE 602005019581 D1 DE602005019581 D1 DE 602005019581D1 DE 602005019581 T DE602005019581 T DE 602005019581T DE 602005019581 T DE602005019581 T DE 602005019581T DE 602005019581 D1 DE602005019581 D1 DE 602005019581D1
Authority
DE
Germany
Prior art keywords
base
thin semiconductor
semiconductor switch
semiconductor circuit
support substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005019581T
Other languages
English (en)
Inventor
Andreas Gakis
Wolfgang Schnitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
NXP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NXP BV filed Critical NXP BV
Publication of DE602005019581D1 publication Critical patent/DE602005019581D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68359Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during manufacture of interconnect decals or build up layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19041Component type being a capacitor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Wire Bonding (AREA)
  • Die Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
  • Bipolar Transistors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE602005019581T 2004-08-20 2005-08-09 Verfahren zum ablösen einer dünnen halbleiterschaltung von ihrer basis Active DE602005019581D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04104002 2004-08-20
PCT/IB2005/052635 WO2006018787A2 (en) 2004-08-20 2005-08-09 Method of detaching a thin semiconductor circuit from its base

Publications (1)

Publication Number Publication Date
DE602005019581D1 true DE602005019581D1 (de) 2010-04-08

Family

ID=35559365

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005019581T Active DE602005019581D1 (de) 2004-08-20 2005-08-09 Verfahren zum ablösen einer dünnen halbleiterschaltung von ihrer basis

Country Status (7)

Country Link
US (1) US8338228B2 (de)
EP (1) EP1782462B1 (de)
JP (1) JP2008511051A (de)
CN (1) CN101044610A (de)
AT (1) ATE459101T1 (de)
DE (1) DE602005019581D1 (de)
WO (1) WO2006018787A2 (de)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3116085B2 (ja) 1997-09-16 2000-12-11 東京農工大学長 半導体素子形成法
US6036809A (en) * 1999-02-16 2000-03-14 International Business Machines Corporation Process for releasing a thin-film structure from a substrate
JP2001185519A (ja) * 1999-12-24 2001-07-06 Hitachi Ltd 半導体装置及びその製造方法
US6444560B1 (en) * 2000-09-26 2002-09-03 International Business Machines Corporation Process for making fine pitch connections between devices and structure made by the process
US6946314B2 (en) * 2001-01-02 2005-09-20 The Charles Stark Draper Laboratory, Inc. Method for microfabricating structures using silicon-on-insulator material
DE10122324A1 (de) * 2001-05-08 2002-11-14 Philips Corp Intellectual Pty Flexible integrierte monolithische Schaltung
US6797537B2 (en) 2001-10-30 2004-09-28 Irvine Sensors Corporation Method of making stackable layers containing encapsulated integrated circuit chips with one or more overlaying interconnect layers
TWI229435B (en) 2002-06-18 2005-03-11 Sanyo Electric Co Manufacture of semiconductor device
CN100383936C (zh) * 2002-12-20 2008-04-23 国际商业机器公司 三维器件制造方法

Also Published As

Publication number Publication date
EP1782462B1 (de) 2010-02-24
US8338228B2 (en) 2012-12-25
EP1782462A2 (de) 2007-05-09
ATE459101T1 (de) 2010-03-15
WO2006018787A2 (en) 2006-02-23
US20090215226A1 (en) 2009-08-27
JP2008511051A (ja) 2008-04-10
WO2006018787A3 (en) 2006-08-17
CN101044610A (zh) 2007-09-26

Similar Documents

Publication Publication Date Title
ATE473489T1 (de) Duales chipkartensystem
ATE457526T1 (de) Hybrides leitfähiges beschichtungsverfahren zur elektrischen brückenverbindung von rfid- einzelchips mit einer verbundantenne
TW200742249A (en) Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus
ATE511703T1 (de) Herstellungsverfahren für durchkontakte
ATE459083T1 (de) Anordnung für die oberflächenmontage eines elektrischen bauteils durch löten und elektrisches bauteil für eine solche anordnung
TW200605253A (en) Method of manufacturing semiconductor integrated circuit and probe card
TW200627562A (en) Chip electrical connection structure and fabrication method thereof
TW200616128A (en) Semiconductor device and process for manufacturing the same and kit
ATE377843T1 (de) Multichip-schaltungsmodul und verfahren zur herstellung hierzu
MXPA05010527A (es) Metodo para la elaboracion de un modulo electronico y un modulo electronico.
TW200511500A (en) Semiconductor device having electrical contact from opposite sides and method therefor
TW200633089A (en) Conductive bump structure of circuit board and method for fabricating the same
TW200721432A (en) Semiconductor device, fabrication method therefor, and film fabrication method
TW200634915A (en) Manufacturing method of semiconductor device, semiconductor device, circuit board, electro-optic device, and electronic apparatus
WO2002056652A3 (de) Verfahren zur herstellung einer elektronischen baugruppe
SG133571A1 (en) Semiconductor device, method of manufacturing the same, and camera module
WO2005091366A3 (de) Halbleitermodul mit einem kopplungssubstrat und verfahren zur herstellung desselben
BR9709319A (pt) Elemento de substrato para um chip semicondutor
WO2005112113A3 (en) Mounting with auxiliary bumps
SG162682A1 (en) Manufacturing method for semiconductor devices
WO2000035262A3 (en) Method for mounting an electronic component
ATE434264T1 (de) Verfahren zum zusammenbau einer doppelseitigen schaltungskomponente
DE602005019581D1 (de) Verfahren zum ablösen einer dünnen halbleiterschaltung von ihrer basis
EP1515366A3 (de) Anordnungstechniken von Anschlüssen auf Schaltungschips
JP2004111809A5 (de)

Legal Events

Date Code Title Description
8364 No opposition during term of opposition