DE602005009408D1 - Einkristall-Diamantsubstrat und dessen Herstellungsverfahren - Google Patents
Einkristall-Diamantsubstrat und dessen HerstellungsverfahrenInfo
- Publication number
- DE602005009408D1 DE602005009408D1 DE602005009408T DE602005009408T DE602005009408D1 DE 602005009408 D1 DE602005009408 D1 DE 602005009408D1 DE 602005009408 T DE602005009408 T DE 602005009408T DE 602005009408 T DE602005009408 T DE 602005009408T DE 602005009408 D1 DE602005009408 D1 DE 602005009408D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- single crystal
- crystal diamond
- diamond substrate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000013078 crystal Substances 0.000 title 1
- 229910003460 diamond Inorganic materials 0.000 title 1
- 239000010432 diamond Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004009047 | 2004-01-16 | ||
JP2004081815A JP4525897B2 (ja) | 2004-03-22 | 2004-03-22 | ダイヤモンド単結晶基板 |
JP2004322048A JP4697514B2 (ja) | 2004-01-16 | 2004-11-05 | ダイヤモンド単結晶基板の製造方法およびダイヤモンド単結晶基板 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005009408D1 true DE602005009408D1 (de) | 2008-10-16 |
Family
ID=34623593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005009408T Active DE602005009408D1 (de) | 2004-01-16 | 2005-01-14 | Einkristall-Diamantsubstrat und dessen Herstellungsverfahren |
Country Status (4)
Country | Link |
---|---|
US (2) | US7481879B2 (de) |
EP (1) | EP1555337B1 (de) |
KR (1) | KR101082656B1 (de) |
DE (1) | DE602005009408D1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4736338B2 (ja) * | 2004-03-24 | 2011-07-27 | 住友電気工業株式会社 | ダイヤモンド単結晶基板 |
WO2006048957A1 (ja) * | 2004-11-05 | 2006-05-11 | Sumitomo Electric Industries, Ltd. | 単結晶ダイヤモンド |
JP5594613B2 (ja) * | 2005-04-15 | 2014-09-24 | 住友電気工業株式会社 | 単結晶ダイヤモンドおよびその製造方法 |
JP5002982B2 (ja) * | 2005-04-15 | 2012-08-15 | 住友電気工業株式会社 | 単結晶ダイヤモンドの製造方法 |
EP2064368B1 (de) | 2006-09-05 | 2017-05-31 | Element Six Technologies Limited | Massive diamantelektrode |
US20080169730A1 (en) * | 2007-01-11 | 2008-07-17 | Romi Mayder | Inverted mesa quartz crystal time base reference for automatic test equipment |
US9034200B2 (en) | 2007-01-22 | 2015-05-19 | Element Six Limited Technologies Limited | Plasma etching of diamond surfaces |
WO2008094491A1 (en) * | 2007-01-29 | 2008-08-07 | Carnegie Institution Of Washington | New laser uses for single-crystal cvd diamond |
JP5377212B2 (ja) * | 2009-10-13 | 2013-12-25 | 信越化学工業株式会社 | 単結晶ダイヤモンド基板の製造方法 |
JP5468528B2 (ja) | 2010-06-28 | 2014-04-09 | 信越化学工業株式会社 | 単結晶ダイヤモンド成長用基材及びその製造方法並びに単結晶ダイヤモンド基板の製造方法 |
US8734753B2 (en) | 2010-12-30 | 2014-05-27 | Engis Corporation | Surface etched diamond particles and method for etching the surface of diamond particles |
WO2012091722A2 (en) * | 2010-12-30 | 2012-07-05 | Engis Corporation | Surface etched diamond particles and method for etching the surface of diamond particles |
JP6360041B2 (ja) | 2013-04-09 | 2018-07-18 | 住友電気工業株式会社 | 単結晶ダイヤモンドおよびダイヤモンド工具 |
DE102014205660B4 (de) * | 2014-03-26 | 2020-02-13 | Bundesrepublik Deutschland, vertr. durch das Bundesministerium für Wirtschaft und Energie, dieses vertreten durch den Präsidenten der Physikalisch-Technischen Bundesanstalt | Prüfkörper zur Kalibrierung eines Raman-Mikroskops |
JP6296001B2 (ja) * | 2015-05-20 | 2018-03-20 | 信越半導体株式会社 | シリコンエピタキシャルウェーハの製造方法及び評価方法 |
CN111321462A (zh) * | 2019-12-12 | 2020-06-23 | 上海征世科技有限公司 | 一种用微波等离子体技术生长单晶钻石的基片台 |
JP2023511395A (ja) * | 2020-01-20 | 2023-03-17 | エム・セブン・ディー コーポレーション | 大きなダイヤモンドの成長方法 |
CN114032613B (zh) * | 2021-10-14 | 2023-10-31 | 吉林大学 | 一种提高拼接法生长金刚石单晶拼接缝质量的方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0371145B1 (de) * | 1988-05-28 | 1994-02-16 | Sumitomo Electric Industries, Ltd. | Verfahren zur herstellung von diamant aus der dampfphase |
JP2730145B2 (ja) * | 1989-03-07 | 1998-03-25 | 住友電気工業株式会社 | 単結晶ダイヤモンド層の形成法 |
US5127983A (en) | 1989-05-22 | 1992-07-07 | Sumitomo Electric Industries, Ltd. | Method of producing single crystal of high-pressure phase material |
US6162412A (en) * | 1990-08-03 | 2000-12-19 | Sumitomo Electric Industries, Ltd. | Chemical vapor deposition method of high quality diamond |
US5614019A (en) | 1992-06-08 | 1997-03-25 | Air Products And Chemicals, Inc. | Method for the growth of industrial crystals |
JP3387154B2 (ja) | 1993-06-30 | 2003-03-17 | 住友電気工業株式会社 | ダイヤモンド単結晶 |
US5474021A (en) * | 1992-09-24 | 1995-12-12 | Sumitomo Electric Industries, Ltd. | Epitaxial growth of diamond from vapor phase |
JPH06173944A (ja) * | 1992-12-03 | 1994-06-21 | Ebara Corp | 気体動圧軸受 |
US5677372A (en) * | 1993-04-06 | 1997-10-14 | Sumitomo Electric Industries, Ltd. | Diamond reinforced composite material |
US5433977A (en) * | 1993-05-21 | 1995-07-18 | Trustees Of Boston University | Enhanced adherence of diamond coatings by combustion flame CVD |
JPH06345592A (ja) * | 1993-06-10 | 1994-12-20 | Kobe Steel Ltd | ダイヤモンド薄膜の形成方法 |
JPH0717793A (ja) | 1993-07-05 | 1995-01-20 | Hitachi Cable Ltd | 化合物半導体単結晶の製造方法 |
ZA946002B (en) * | 1993-08-12 | 1995-03-14 | De Beers Ind Diamond | Detecting ionising radiation |
JPH0948694A (ja) * | 1995-08-04 | 1997-02-18 | Kobe Steel Ltd | 単結晶ダイヤモンド膜の形成方法 |
JP3168961B2 (ja) * | 1997-10-06 | 2001-05-21 | 住友電気工業株式会社 | ダイヤモンド基板及びダイヤモンド基板の評価方法並びにダイヤモンド表面弾性波フィルタ |
US6589333B1 (en) * | 1999-09-17 | 2003-07-08 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. | Method for the manufacture of a substrate, substrate manufactured in accordance with this method, carrier wafer and diamond jewel |
EP1290251B8 (de) * | 2000-06-15 | 2006-02-01 | Element Six (PTY) Ltd | Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht |
CA2412853C (en) | 2000-06-15 | 2009-08-25 | Geoffrey Alan Scarsbrook | Single crystal diamond prepared by cvd |
JP4374823B2 (ja) | 2002-03-22 | 2009-12-02 | 住友電気工業株式会社 | ダイヤモンド単結晶の製造方法およびダイヤモンド単結晶基板の製造方法 |
EP1536043B1 (de) * | 2002-06-18 | 2011-03-02 | Sumitomo Electric Industries, Ltd. | Verfahren zur herstellung von n-halbleiterdiamant und halbleiterdiamant |
-
2005
- 2005-01-11 US US11/032,176 patent/US7481879B2/en not_active Expired - Fee Related
- 2005-01-14 EP EP05250164A patent/EP1555337B1/de active Active
- 2005-01-14 KR KR1020050003670A patent/KR101082656B1/ko active IP Right Grant
- 2005-01-14 DE DE602005009408T patent/DE602005009408D1/de active Active
-
2008
- 2008-08-15 US US12/192,515 patent/US7771693B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1555337A3 (de) | 2005-10-26 |
US20050155543A1 (en) | 2005-07-21 |
US20080311024A1 (en) | 2008-12-18 |
KR20050075715A (ko) | 2005-07-21 |
US7481879B2 (en) | 2009-01-27 |
EP1555337B1 (de) | 2008-09-03 |
KR101082656B1 (ko) | 2011-11-14 |
EP1555337A2 (de) | 2005-07-20 |
US7771693B2 (en) | 2010-08-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |