DE602005004506D1 - Entfernen störender Geräteeinflüsse von einer Beugungsstruktur durch Entfaltung, wobei eine beugungswinkelabhängige Gerätefunktion verwendet wird - Google Patents

Entfernen störender Geräteeinflüsse von einer Beugungsstruktur durch Entfaltung, wobei eine beugungswinkelabhängige Gerätefunktion verwendet wird

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Publication number
DE602005004506D1
DE602005004506D1 DE602005004506T DE602005004506T DE602005004506D1 DE 602005004506 D1 DE602005004506 D1 DE 602005004506D1 DE 602005004506 T DE602005004506 T DE 602005004506T DE 602005004506 T DE602005004506 T DE 602005004506T DE 602005004506 D1 DE602005004506 D1 DE 602005004506D1
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Germany
Prior art keywords
diffraction
deployment
influences
dependent
remove disturbing
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Application number
DE602005004506T
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English (en)
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DE602005004506T2 (de
Inventor
Vladimir Kogan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Malvern Panalytical BV
Original Assignee
Panalytical BV
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Publication of DE602005004506D1 publication Critical patent/DE602005004506D1/de
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Publication of DE602005004506T2 publication Critical patent/DE602005004506T2/de
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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE602005004506T 2005-03-10 2005-03-10 Entfernen störender Geräteeinflüsse von einer Beugungsstruktur durch Entfaltung, wobei eine beugungswinkelabhängige Gerätefunktion verwendet wird Active DE602005004506T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05251451A EP1701154B1 (de) 2005-03-10 2005-03-10 Entfernen störender Geräteeinflüsse von einer Beugungsstruktur durch Entfaltung, wobei eine beugungswinkelabhängige Gerätefunktion verwendet wird

Publications (2)

Publication Number Publication Date
DE602005004506D1 true DE602005004506D1 (de) 2008-03-13
DE602005004506T2 DE602005004506T2 (de) 2009-01-22

Family

ID=34940561

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005004506T Active DE602005004506T2 (de) 2005-03-10 2005-03-10 Entfernen störender Geräteeinflüsse von einer Beugungsstruktur durch Entfaltung, wobei eine beugungswinkelabhängige Gerätefunktion verwendet wird

Country Status (4)

Country Link
US (1) US7516031B2 (de)
EP (1) EP1701154B1 (de)
JP (1) JP4950523B2 (de)
DE (1) DE602005004506T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8102137B2 (en) 2008-04-16 2012-01-24 Zf Friedrichshafen Ag Method of detecting a useful signal

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8625740B2 (en) 2011-04-14 2014-01-07 Morpho Detection, Inc. System and method for correcting X-ray diffraction profiles
CN103268272B (zh) * 2013-05-07 2014-07-23 中国人民解放军国防科学技术大学 基于场景的处理器系统级验证完备性度量方法
JP6999268B2 (ja) * 2016-01-11 2022-01-18 ブルカー テクノロジーズ リミテッド X線スキャタロメトリーのための方法および装置
GB201804427D0 (en) * 2018-03-20 2018-05-02 Univ Oxford Innovation Ltd Characterisation of amporphous content of complex formulations
JP2019191168A (ja) 2018-04-23 2019-10-31 ブルカー ジェイヴィ イスラエル リミテッドBruker Jv Israel Ltd. 小角x線散乱測定用のx線源光学系
US11181490B2 (en) 2018-07-05 2021-11-23 Bruker Technologies Ltd. Small-angle x-ray scatterometry
JP7165416B2 (ja) * 2020-01-15 2022-11-04 株式会社リガク X線分析装置、x線分析方法、及びx線分析プログラム
US11781999B2 (en) 2021-09-05 2023-10-10 Bruker Technologies Ltd. Spot-size control in reflection-based and scatterometry-based X-ray metrology systems

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2848751B2 (ja) * 1992-12-04 1999-01-20 株式会社東芝 元素分析方法
AU685950B2 (en) * 1994-06-25 1998-01-29 Panalytical B.V. Analysing a material sample
JP3584285B2 (ja) * 2001-04-27 2004-11-04 独立行政法人情報通信研究機構 歪画像補正方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8102137B2 (en) 2008-04-16 2012-01-24 Zf Friedrichshafen Ag Method of detecting a useful signal

Also Published As

Publication number Publication date
DE602005004506T2 (de) 2009-01-22
EP1701154A1 (de) 2006-09-13
US20060206278A1 (en) 2006-09-14
EP1701154B1 (de) 2008-01-23
US7516031B2 (en) 2009-04-07
JP4950523B2 (ja) 2012-06-13
JP2006250938A (ja) 2006-09-21

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