DE602005002571D1 - Photobasengenerator und härtbare Zusammensetzung - Google Patents

Photobasengenerator und härtbare Zusammensetzung

Info

Publication number
DE602005002571D1
DE602005002571D1 DE602005002571T DE602005002571T DE602005002571D1 DE 602005002571 D1 DE602005002571 D1 DE 602005002571D1 DE 602005002571 T DE602005002571 T DE 602005002571T DE 602005002571 T DE602005002571 T DE 602005002571T DE 602005002571 D1 DE602005002571 D1 DE 602005002571D1
Authority
DE
Germany
Prior art keywords
curable composition
photobase generator
photobase
generator
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005002571T
Other languages
English (en)
Other versions
DE602005002571T2 (de
Inventor
Hitoshi Okazaki
Junya Hayakawa
Motoharu Takeuchi
Masahiro Jono
Kenji Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Publication of DE602005002571D1 publication Critical patent/DE602005002571D1/de
Application granted granted Critical
Publication of DE602005002571T2 publication Critical patent/DE602005002571T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B7/00—Special arrangements or measures in connection with doors or windows
    • E06B7/28—Other arrangements on doors or windows, e.g. door-plates, windows adapted to carry plants, hooks for window cleaners
    • E06B7/36—Finger guards or other measures preventing harmful access between the door and the door frame
    • E06B7/367—Finger guards or other measures preventing harmful access between the door and the door frame by covering the gap between the door and the door frame at the hinge side
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/06—Polythioethers from cyclic thioethers
    • C08G75/08—Polythioethers from cyclic thioethers from thiiranes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/04—Polysulfides
    • E—FIXED CONSTRUCTIONS
    • E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B7/00—Special arrangements or measures in connection with doors or windows
    • E06B7/16—Sealing arrangements on wings or parts co-operating with the wings
    • E06B7/22—Sealing arrangements on wings or parts co-operating with the wings by means of elastic edgings, e.g. elastic rubber tubes; by means of resilient edgings, e.g. felt or plush strips, resilient metal strips
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • E—FIXED CONSTRUCTIONS
    • E05—LOCKS; KEYS; WINDOW OR DOOR FITTINGS; SAFES
    • E05Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES E05D AND E05F, RELATING TO CONSTRUCTION ELEMENTS, ELECTRIC CONTROL, POWER SUPPLY, POWER SIGNAL OR TRANSMISSION, USER INTERFACES, MOUNTING OR COUPLING, DETAILS, ACCESSORIES, AUXILIARY OPERATIONS NOT OTHERWISE PROVIDED FOR, APPLICATION THEREOF
    • E05Y2800/00—Details, accessories and auxiliary operations not otherwise provided for
    • E05Y2800/10—Additional functions
    • E05Y2800/12—Sealing
    • E—FIXED CONSTRUCTIONS
    • E05—LOCKS; KEYS; WINDOW OR DOOR FITTINGS; SAFES
    • E05Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES E05D AND E05F, RELATING TO CONSTRUCTION ELEMENTS, ELECTRIC CONTROL, POWER SUPPLY, POWER SIGNAL OR TRANSMISSION, USER INTERFACES, MOUNTING OR COUPLING, DETAILS, ACCESSORIES, AUXILIARY OPERATIONS NOT OTHERWISE PROVIDED FOR, APPLICATION THEREOF
    • E05Y2800/00—Details, accessories and auxiliary operations not otherwise provided for
    • E05Y2800/40—Physical or chemical protection
    • E05Y2800/41—Physical or chemical protection against finger injury
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Materials For Photolithography (AREA)
  • Hydrogenated Pyridines (AREA)
DE602005002571T 2004-02-16 2005-01-26 Photobasengenerator und härtbare Zusammensetzung Active DE602005002571T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004039081 2004-02-16
JP2004039081 2004-02-16

Publications (2)

Publication Number Publication Date
DE602005002571D1 true DE602005002571D1 (de) 2007-11-08
DE602005002571T2 DE602005002571T2 (de) 2008-01-31

Family

ID=34697970

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005002571T Active DE602005002571T2 (de) 2004-02-16 2005-01-26 Photobasengenerator und härtbare Zusammensetzung

Country Status (5)

Country Link
US (1) US7300747B2 (de)
EP (1) EP1564255B1 (de)
KR (1) KR101208206B1 (de)
DE (1) DE602005002571T2 (de)
TW (1) TWI359829B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101114694B1 (ko) * 2006-12-14 2012-03-13 아사히 가세이 케미칼즈 가부시키가이샤 광염기 발생제 및 광경화성 수지조성물
US20090071693A1 (en) * 2007-08-30 2009-03-19 Mitsui Chemicals, Inc. Negative photosensitive material and circuit board
EP2270114B1 (de) 2008-03-31 2014-07-09 San-Apro Limited Photobasengenerator
EP2368875B1 (de) * 2008-12-02 2014-09-03 Wako Pure Chemical Industries, Ltd. Photobasengenerator
EP2665788A1 (de) 2010-06-30 2013-11-27 3M Innovative Properties Company Härtbare zusammensetzung mit dualer reaktiver silanfunktion
US8840993B2 (en) 2010-06-30 2014-09-23 3M Innovative Properties Company Curable polysiloxane coating composition
WO2012003152A1 (en) * 2010-06-30 2012-01-05 3M Innovative Properties Company Curable-on-demand composition comprising dual reactive silane functionality
WO2012147709A1 (ja) * 2011-04-28 2012-11-01 三菱瓦斯化学株式会社 硬化性組成物および光学用接着剤
CN102338985A (zh) * 2011-06-29 2012-02-01 山东大学 含羟基的烃基双环胍光碱产生剂的环保型光刻胶组合物
JP6336398B2 (ja) 2011-12-29 2018-06-06 スリーエム イノベイティブ プロパティズ カンパニー オンデマンド型硬化性ポリシロキサンコーティング組成物
EP2797998A1 (de) 2011-12-29 2014-11-05 3M Innovative Properties Company Härtbare polysiloxanzusammensetzung
CN105164184A (zh) 2011-12-29 2015-12-16 3M创新有限公司 可固化聚硅氧烷涂料组合物
US8741551B2 (en) 2012-04-09 2014-06-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and composition of a dual sensitive resist
US9264012B2 (en) 2012-06-25 2016-02-16 Ppc Broadband, Inc. Radio frequency signal splitter
US8932799B2 (en) 2013-03-12 2015-01-13 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist system and method
US10095113B2 (en) 2013-12-06 2018-10-09 Taiwan Semiconductor Manufacturing Company Photoresist and method
US9581908B2 (en) 2014-05-16 2017-02-28 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and method
US9958776B2 (en) * 2015-12-28 2018-05-01 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
US10662274B2 (en) 2016-12-02 2020-05-26 Georgia Tech Research Corporation Self-immolative polymers, articles thereof, and methods of making and using same
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759971A (en) * 1951-10-01 1956-08-21 Sterling Drug Inc 2-amino and acylamino-1-(hydrocarbylmercaptophenyl)-1, 3-propanediols and preparation thereof
US6635195B1 (en) * 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses

Also Published As

Publication number Publication date
US20050181300A1 (en) 2005-08-18
EP1564255B1 (de) 2007-09-26
EP1564255A1 (de) 2005-08-17
TW200602385A (en) 2006-01-16
DE602005002571T2 (de) 2008-01-31
KR101208206B1 (ko) 2012-12-04
TWI359829B (en) 2012-03-11
US7300747B2 (en) 2007-11-27
KR20060041962A (ko) 2006-05-12

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Legal Events

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