DE602004032452D1 - Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke - Google Patents
Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dickeInfo
- Publication number
- DE602004032452D1 DE602004032452D1 DE602004032452T DE602004032452T DE602004032452D1 DE 602004032452 D1 DE602004032452 D1 DE 602004032452D1 DE 602004032452 T DE602004032452 T DE 602004032452T DE 602004032452 T DE602004032452 T DE 602004032452T DE 602004032452 D1 DE602004032452 D1 DE 602004032452D1
- Authority
- DE
- Germany
- Prior art keywords
- coatings
- production
- large thickness
- photopolymerizable systems
- clear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
- C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
- C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/46—Friedel-Crafts reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/64—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of functional groups containing oxygen only in singly bound form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000028A ITVA20030028A1 (it) | 2003-08-07 | 2003-08-07 | Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore. |
| PCT/EP2004/051699 WO2005014515A2 (en) | 2003-08-07 | 2004-08-03 | Clear photopolymerizable systems for the preparation of high thickness coatings |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602004032452D1 true DE602004032452D1 (de) | 2011-06-09 |
Family
ID=34131257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602004032452T Expired - Lifetime DE602004032452D1 (de) | 2003-08-07 | 2004-08-03 | Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7534880B2 (enExample) |
| EP (1) | EP1670740B1 (enExample) |
| JP (1) | JP4638869B2 (enExample) |
| CN (1) | CN100554234C (enExample) |
| AT (1) | ATE507200T1 (enExample) |
| CA (1) | CA2532458C (enExample) |
| DE (1) | DE602004032452D1 (enExample) |
| DK (1) | DK1670740T3 (enExample) |
| IT (1) | ITVA20030028A1 (enExample) |
| WO (1) | WO2005014515A2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITVA20030040A1 (it) * | 2003-10-27 | 2005-04-28 | Lamberti Spa | Fotoiniziatore solido bianco in polvere e procedimento per la sua preparazione. |
| ITVA20050049A1 (it) * | 2005-08-05 | 2007-02-06 | Lamberti Spa | Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita' |
| CN103601629B (zh) | 2010-11-12 | 2015-08-26 | 深圳市有为化学技术有限公司 | 对位或间位官能团化芳香酮类化合物、其制备方法及其光聚合引发剂 |
| CN102504054B (zh) * | 2011-11-01 | 2014-07-02 | 长沙新宇高分子科技有限公司 | 降低直至消除voc排放的多官能团羟基酮光引发剂 |
| BE1022066B1 (nl) * | 2013-06-28 | 2016-02-15 | Chemstream Bvba | Oppervlakteactief middel en bereiding daarvan |
| CN104974053B (zh) * | 2015-06-24 | 2017-04-26 | 天津久日新材料股份有限公司 | 一种新的氨基酮类光引发剂及在uv‑led光固化体系的应用 |
| DK3392232T3 (da) | 2015-12-15 | 2021-04-12 | Changzhou Tronly Advanced Electronic Mat Co Ltd | Multifunktionel fluorenfotoinitiator og fremstilling og anvendelse deraf, og fotosensitiv resinsammensætning indeholdende fluorenfotoinitiator og anvendelse deraf |
| JP6833171B2 (ja) | 2016-09-13 | 2021-02-24 | 常州強力先端電子材料有限公司Changzhou Tronly Advanced Electronic Materials Co.,Ltd. | フルオレン類光開始剤、その製造方法、それを有する光硬化性組成物、及び光硬化分野におけるフルオレン類光開始剤の使用 |
| US11399986B2 (en) * | 2016-12-16 | 2022-08-02 | The Procter & Gamble Company | Article comprising energy curable ink |
| EP3584242A4 (en) | 2017-02-17 | 2020-12-23 | Changzhou Tronly Advanced Electronic Materials Co., Ltd. | FLUORENYLAMINOCETONE PHOTOINITIATOR, ITS PREPARATION PROCESS AND UV PHOTOSETTING COMPOSITION CONTAINING IT |
| KR102764847B1 (ko) * | 2018-06-29 | 2025-02-06 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 이것을 함유하는 광중합개시제 |
| CN109678735B (zh) * | 2018-12-28 | 2022-02-22 | 山东久日化学科技有限公司 | 一种烷基胺原位回收利用技术制备 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3715293A (en) | 1971-12-17 | 1973-02-06 | Union Carbide Corp | Acetophenone-type photosensitizers for radiation curable coatings |
| DE2722264C2 (de) * | 1977-05-17 | 1984-06-28 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren |
| EP0003002B1 (de) | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
| EP0088050B1 (de) * | 1982-02-26 | 1986-09-03 | Ciba-Geigy Ag | Photohärtbare gefärbte Massen |
| IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
| IT1208494B (it) | 1985-01-28 | 1989-07-10 | Lamberti Flli Spa | Polimerizzazione. derivati solforati di chetoni aromatico-alifatici e alifatici come fotoiniziatori di |
| DE3880868D1 (en) * | 1987-03-26 | 1993-06-17 | Ciba Geigy Ag | Neue alpha-aminoacetophenone als photoinitiatoren. |
| AU3606195A (en) | 1995-09-11 | 1997-04-01 | Lamberti S.P.A. | Betaketosulfonic derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same |
| IT1303775B1 (it) * | 1998-11-19 | 2001-02-23 | Lamberti Spa | Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni. |
| ES2207485T3 (es) * | 1999-01-12 | 2004-06-01 | Clariant Finance (Bvi) Limited | Benzofenonas y su uso como fotoiniciadores. |
-
2003
- 2003-08-07 IT IT000028A patent/ITVA20030028A1/it unknown
-
2004
- 2004-08-03 US US10/566,880 patent/US7534880B2/en not_active Expired - Fee Related
- 2004-08-03 EP EP04766405A patent/EP1670740B1/en not_active Expired - Lifetime
- 2004-08-03 DK DK04766405.7T patent/DK1670740T3/da active
- 2004-08-03 CN CNB2004800224878A patent/CN100554234C/zh not_active Expired - Fee Related
- 2004-08-03 AT AT04766405T patent/ATE507200T1/de not_active IP Right Cessation
- 2004-08-03 WO PCT/EP2004/051699 patent/WO2005014515A2/en not_active Ceased
- 2004-08-03 JP JP2006522355A patent/JP4638869B2/ja not_active Expired - Fee Related
- 2004-08-03 CA CA2532458A patent/CA2532458C/en not_active Expired - Fee Related
- 2004-08-03 DE DE602004032452T patent/DE602004032452D1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CA2532458C (en) | 2012-01-03 |
| WO2005014515A2 (en) | 2005-02-17 |
| WO2005014515A3 (en) | 2005-04-28 |
| CN100554234C (zh) | 2009-10-28 |
| EP1670740B1 (en) | 2011-04-27 |
| US7534880B2 (en) | 2009-05-19 |
| CN1832912A (zh) | 2006-09-13 |
| EP1670740A2 (en) | 2006-06-21 |
| ATE507200T1 (de) | 2011-05-15 |
| US20060246228A1 (en) | 2006-11-02 |
| JP4638869B2 (ja) | 2011-02-23 |
| DK1670740T3 (da) | 2011-08-15 |
| CA2532458A1 (en) | 2005-02-17 |
| ITVA20030028A1 (it) | 2005-02-08 |
| JP2007501776A (ja) | 2007-02-01 |
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