DE602004017943D1 - Magnetowiderstandseffekt-Film, Magnetowiderstandseffekt-Kopf und Festzustandspeicher - Google Patents

Magnetowiderstandseffekt-Film, Magnetowiderstandseffekt-Kopf und Festzustandspeicher

Info

Publication number
DE602004017943D1
DE602004017943D1 DE602004017943T DE602004017943T DE602004017943D1 DE 602004017943 D1 DE602004017943 D1 DE 602004017943D1 DE 602004017943 T DE602004017943 T DE 602004017943T DE 602004017943 T DE602004017943 T DE 602004017943T DE 602004017943 D1 DE602004017943 D1 DE 602004017943D1
Authority
DE
Germany
Prior art keywords
magnetoresistance effect
solid state
state memory
head
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004017943T
Other languages
English (en)
Inventor
Kenji Noma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE602004017943D1 publication Critical patent/DE602004017943D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3281—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn only by use of asymmetry of the magnetic film pair itself, i.e. so-called pseudospin valve [PSV] structure, e.g. NiFe/Cu/Co

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Semiconductor Memories (AREA)
DE602004017943T 2003-09-03 2004-06-18 Magnetowiderstandseffekt-Film, Magnetowiderstandseffekt-Kopf und Festzustandspeicher Expired - Fee Related DE602004017943D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003310946A JP2005079487A (ja) 2003-09-03 2003-09-03 磁気抵抗効果膜並びにこれを用いた磁気抵抗効果ヘッドおよび固体メモリ

Publications (1)

Publication Number Publication Date
DE602004017943D1 true DE602004017943D1 (de) 2009-01-08

Family

ID=34131831

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004017943T Expired - Fee Related DE602004017943D1 (de) 2003-09-03 2004-06-18 Magnetowiderstandseffekt-Film, Magnetowiderstandseffekt-Kopf und Festzustandspeicher

Country Status (6)

Country Link
US (1) US7154717B2 (de)
EP (1) EP1513167B1 (de)
JP (1) JP2005079487A (de)
KR (1) KR100635316B1 (de)
CN (1) CN1284144C (de)
DE (1) DE602004017943D1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070035889A1 (en) * 2004-04-02 2007-02-15 Tdk Corporation Spin valve magnetoresistive sensor in current perpendicular to plane scheme
US7900342B2 (en) * 2007-02-23 2011-03-08 Hitachi Global Storage Technologies Netherlands, B.V. Methods of fabricating magnetoresistance sensors pinned by an etch induced magnetic anisotropy
US20090168269A1 (en) * 2007-12-28 2009-07-02 Matthew Joseph Carey Current perpendicular to plane spin valve with high-polarization material in ap1 layer for reduced spin torque
JP2009283094A (ja) * 2008-05-26 2009-12-03 Fujitsu Ltd 磁気ヘッドおよび磁気ディスク装置
US8493693B1 (en) 2012-03-30 2013-07-23 Western Digital (Fremont), Llc Perpendicular magnetic recording transducer with AFM insertion layer
US9361913B1 (en) 2013-06-03 2016-06-07 Western Digital (Fremont), Llc Recording read heads with a multi-layer AFM layer methods and apparatuses
EP3314675A4 (de) * 2015-06-26 2019-05-29 Intel Corporation Magnetspeicher mit geringem streufeld
US10944050B2 (en) * 2018-05-08 2021-03-09 Applied Materials, Inc. Magnetic tunnel junction structures and methods of manufacture thereof
CN112310271B (zh) * 2019-07-25 2023-04-07 上海磁宇信息科技有限公司 磁性随机存储器的磁性隧道结结构
CN111929625B (zh) * 2020-08-13 2023-03-28 中国科学院微电子研究所 磁场传感器及测试方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3207790A (en) * 1961-07-06 1965-09-21 Dow Chemical Co Process for reducing the color of discolored alkanolamines
US3819710A (en) * 1973-01-04 1974-06-25 Olin Corp Process for improving color and color stability of ethanolamines
US5847221A (en) * 1993-06-28 1998-12-08 Union Carbide Chemicals & Plastics Technology Corporation Method for decolorization of alkanolamines and alkyleneamines
US5465185A (en) 1993-10-15 1995-11-07 International Business Machines Corporation Magnetoresistive spin valve sensor with improved pinned ferromagnetic layer and magnetic recording system using the sensor
JPH11185219A (ja) 1997-12-17 1999-07-09 Hitachi Ltd 磁気抵抗効果型磁気ヘッド及び磁気記録再生装置
JP3235572B2 (ja) * 1998-09-18 2001-12-04 日本電気株式会社 磁気抵抗効果素子，磁気抵抗効果センサ及びそれらを利用したシステム
DE19855383A1 (de) * 1998-12-01 2000-06-08 Basf Ag Verfahren zur Reinigung von Triethanolamin
US6222707B1 (en) * 1998-12-28 2001-04-24 Read-Rite Corporation Bottom or dual spin valve having a seed layer that results in an improved antiferromagnetic layer
DE19942300A1 (de) * 1999-09-04 2001-03-08 Basf Ag Verfahren zur Herstellung von Alkanolaminen mit verbesserter Farbqualität
DE10011942A1 (de) * 2000-03-11 2001-09-13 Basf Ag Verfahren zur Herstellung von Alkanolaminen mit verbesserter Farbqualität
US6773515B2 (en) * 2002-01-16 2004-08-10 Headway Technologies, Inc. FeTa nano-oxide layer as a capping layer for enhancement of giant magnetoresistance in bottom spin valve structures
US6707084B2 (en) * 2002-02-06 2004-03-16 Micron Technology, Inc. Antiferromagnetically stabilized pseudo spin valve for memory applications
US6774264B2 (en) * 2002-12-06 2004-08-10 Air Products And Chemicals, Inc. Catalyst to improve the color stability of N,N-dialkylalkanolamines
US7038890B2 (en) * 2003-07-29 2006-05-02 Hitachi Global Storage Technologies Netherlands B.V. Current perpendicular to the planes (CPP) sensor with a highly conductive cap structure
US6974708B2 (en) * 2004-04-08 2005-12-13 Headway Technologies, Inc. Oxidation structure/method to fabricate a high-performance magnetic tunneling junction MRAM
US7331100B2 (en) * 2004-07-07 2008-02-19 Headway Technologies, Inc. Process of manufacturing a seed/AFM combination for a CPP GMR device

Also Published As

Publication number Publication date
CN1284144C (zh) 2006-11-08
KR100635316B1 (ko) 2006-10-18
JP2005079487A (ja) 2005-03-24
EP1513167A2 (de) 2005-03-09
US20050047029A1 (en) 2005-03-03
CN1591580A (zh) 2005-03-09
KR20050025238A (ko) 2005-03-14
EP1513167A3 (de) 2005-09-07
US7154717B2 (en) 2006-12-26
EP1513167B1 (de) 2008-11-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: SEEGER SEEGER LINDNER PARTNERSCHAFT PATENTANWAELTE

8339 Ceased/non-payment of the annual fee