DE602004017499D1 - Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bett - Google Patents

Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bett

Info

Publication number
DE602004017499D1
DE602004017499D1 DE602004017499T DE602004017499T DE602004017499D1 DE 602004017499 D1 DE602004017499 D1 DE 602004017499D1 DE 602004017499 T DE602004017499 T DE 602004017499T DE 602004017499 T DE602004017499 T DE 602004017499T DE 602004017499 D1 DE602004017499 D1 DE 602004017499D1
Authority
DE
Germany
Prior art keywords
subbeds
clichés
printing
flat
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004017499T
Other languages
English (en)
Inventor
Redhill Chapman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE602004017499D1 publication Critical patent/DE602004017499D1/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F1/00Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed
    • B41F1/26Details
    • B41F1/28Sheet-conveying, -aligning or -clamping devices
    • B41F1/34Registering devices, e.g. gauges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F1/00Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed
    • B41F1/16Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed for offset printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259Multistep manufacturing methods
    • H01L27/1292Multistep manufacturing methods using liquid deposition, e.g. printing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78603Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Printing Methods (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
DE602004017499T 2003-12-09 2004-12-07 Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bett Expired - Fee Related DE602004017499D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0328459.3A GB0328459D0 (en) 2003-12-09 2003-12-09 Printing
PCT/IB2004/052691 WO2005056294A1 (en) 2003-12-09 2004-12-07 Method and apparatus for printing a patterned layer on a flatsubstrate with a flat-type-bed

Publications (1)

Publication Number Publication Date
DE602004017499D1 true DE602004017499D1 (de) 2008-12-11

Family

ID=30129851

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004017499T Expired - Fee Related DE602004017499D1 (de) 2003-12-09 2004-12-07 Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bett

Country Status (10)

Country Link
US (1) US20080276813A1 (de)
EP (1) EP1694506B1 (de)
JP (1) JP2007519946A (de)
KR (1) KR20060123257A (de)
CN (1) CN100553971C (de)
AT (1) ATE412518T1 (de)
DE (1) DE602004017499D1 (de)
GB (1) GB0328459D0 (de)
TW (1) TW200532397A (de)
WO (1) WO2005056294A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100805047B1 (ko) * 2003-09-08 2008-02-20 엘지.필립스 엘시디 주식회사 인쇄 장비 및 이를 이용한 패턴 형성 방법
DE102008029299B4 (de) * 2008-06-19 2012-02-16 Itw Morlock Gmbh Tampondruckmaschine
US8281715B2 (en) * 2009-02-16 2012-10-09 Vistaprint Technologies Limited Printer pallet assembly for use in printing multiple articles of manufacture
CN103415829B (zh) * 2011-03-09 2016-04-06 株式会社Lg化学 制造两个以上图形化基板的方法及制造装置
KR102233737B1 (ko) * 2020-01-17 2021-03-30 메탈쓰리디 주식회사 시편 출력을 통한 금속 3d 프린터 공정 최적화 방법

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL67035C (de) * 1947-03-18
JPH01225553A (ja) * 1988-03-07 1989-09-08 Denki Kagaku Kogyo Kk プラスチック成形体浸透印刷装置
US5272980A (en) * 1990-08-31 1993-12-28 Dai Nippon Printing Co. Ltd. Alignment method for transfer and alignment device
US5352634A (en) * 1992-03-23 1994-10-04 Brody Thomas P Process for fabricating an active matrix circuit
US5407763A (en) * 1992-05-28 1995-04-18 Ceridian Corporation Mask alignment mark system
US5367953A (en) * 1992-07-01 1994-11-29 Nsk Ltd. Roller offset printing apparatus
US5335595A (en) * 1992-07-01 1994-08-09 Nsk Ltd. Roller offset printing apparatus
SG52730A1 (en) * 1993-11-03 1998-09-28 Corning Inc Color filter and method of printing
KR100502797B1 (ko) * 1997-12-01 2005-10-19 삼성전자주식회사 액정 표시 장치 및 그의 제조 방법
JP2001154371A (ja) * 1999-11-30 2001-06-08 Nikon Corp 回路デバイスや表示デバイスの製造方法、及び大型ディスプレー装置
KR100611041B1 (ko) * 2000-02-17 2006-08-09 엘지.필립스 엘시디 주식회사 대면적 액정표시장치를 위한 포토마스크와 어레이기판제작방법
FR2817767B1 (fr) * 2000-12-07 2003-02-28 Technip Cie Procede et installation pour la recuperation et la purification de l'ethylene produit par pyrolyse d'hydrocarbures, et gaz obtenus par procede
US6983688B1 (en) * 2003-08-26 2006-01-10 The Gem Group, Inc. Decoration for bags and cases and method for applying the same
KR100805047B1 (ko) * 2003-09-08 2008-02-20 엘지.필립스 엘시디 주식회사 인쇄 장비 및 이를 이용한 패턴 형성 방법

Also Published As

Publication number Publication date
US20080276813A1 (en) 2008-11-13
KR20060123257A (ko) 2006-12-01
CN1890100A (zh) 2007-01-03
ATE412518T1 (de) 2008-11-15
EP1694506B1 (de) 2008-10-29
TW200532397A (en) 2005-10-01
EP1694506A1 (de) 2006-08-30
JP2007519946A (ja) 2007-07-19
GB0328459D0 (en) 2004-01-14
WO2005056294A1 (en) 2005-06-23
CN100553971C (zh) 2009-10-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee