DE602004011969D1 - Selektives schicht-millimeterwellen-oberflächenhaltsystem und -verfahren - Google Patents

Selektives schicht-millimeterwellen-oberflächenhaltsystem und -verfahren

Info

Publication number
DE602004011969D1
DE602004011969D1 DE602004011969T DE602004011969T DE602004011969D1 DE 602004011969 D1 DE602004011969 D1 DE 602004011969D1 DE 602004011969 T DE602004011969 T DE 602004011969T DE 602004011969 T DE602004011969 T DE 602004011969T DE 602004011969 D1 DE602004011969 D1 DE 602004011969D1
Authority
DE
Germany
Prior art keywords
millimeter wave
surface mounting
mounting system
wave surface
selective layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004011969T
Other languages
English (en)
Other versions
DE602004011969T2 (de
Inventor
James R Gallivan
Kenneth W Brown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Publication of DE602004011969D1 publication Critical patent/DE602004011969D1/de
Application granted granted Critical
Publication of DE602004011969T2 publication Critical patent/DE602004011969T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/66—Circuits
    • H05B6/68—Circuits for monitoring or control
    • H05B6/686—Circuits comprising a signal generator and power amplifier, e.g. using solid state oscillators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/70—Feed lines
    • H05B6/705—Feed lines using microwave tuning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/72—Radiators or antennas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B40/00—Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of High-Frequency Heating Circuits (AREA)
  • Constitution Of High-Frequency Heating (AREA)
DE602004011969T 2003-10-24 2004-10-19 Selektives schicht-millimeterwellen-oberflächenhaltsystem und -verfahren Active DE602004011969T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/693,125 US7498549B2 (en) 2003-10-24 2003-10-24 Selective layer millimeter-wave surface-heating system and method
US693125 2003-10-24
PCT/US2004/034572 WO2005043957A1 (en) 2003-10-24 2004-10-19 Selective layer millimeter-wave surface-heating system and method

Publications (2)

Publication Number Publication Date
DE602004011969D1 true DE602004011969D1 (de) 2008-04-03
DE602004011969T2 DE602004011969T2 (de) 2009-01-08

Family

ID=34522306

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004011969T Active DE602004011969T2 (de) 2003-10-24 2004-10-19 Selektives schicht-millimeterwellen-oberflächenhaltsystem und -verfahren

Country Status (5)

Country Link
US (1) US7498549B2 (de)
EP (1) EP1676463B1 (de)
JP (1) JP4782690B2 (de)
DE (1) DE602004011969T2 (de)
WO (1) WO2005043957A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8525085B2 (en) * 2006-05-10 2013-09-03 Massachusetts Institute Of Technology Directed energy melter
WO2011027963A2 (ko) * 2009-09-01 2011-03-10 엘지전자 주식회사 마이크로웨이브를 이용한 조리기기
EP2445313B1 (de) * 2010-10-21 2015-05-13 Electrolux Home Products Corporation N.V. Mikrowellenherdinnenraum und Mikrowellenherd
WO2013103761A1 (en) * 2012-01-06 2013-07-11 Ranjit Gharpurey Microwave oven with antenna array
KR102402039B1 (ko) 2015-11-16 2022-05-26 삼성전자주식회사 조리 장치 및 이의 제어 방법
DE102016114708B4 (de) * 2016-08-09 2020-06-10 Miele & Cie. Kg Verfahren zum Betreiben eines Gargerätes
CN111201835A (zh) * 2017-08-15 2020-05-26 高知有限公司 六端口功率测量
US10516216B2 (en) 2018-01-12 2019-12-24 Eagle Technology, Llc Deployable reflector antenna system
US11639225B2 (en) 2018-04-05 2023-05-02 Koninklifke Fabriek Inventum B.V. Solid state radio frequency (SSRF) water heater device
US10939511B2 (en) 2018-04-05 2021-03-02 Rockwell Collins, Inc. Solid state radio frequency (SSRF) microwave oven for aircraft galley
US10707552B2 (en) 2018-08-21 2020-07-07 Eagle Technology, Llc Folded rib truss structure for reflector antenna with zero over stretch
KR20210012306A (ko) 2019-07-24 2021-02-03 삼성전자주식회사 능동 소자 어레이를 사용하는 송수신기 및 이를 포함하는 안테나 모듈
US20230345585A1 (en) * 2022-04-22 2023-10-26 Bsh Home Appliances Corporation System having discrete zone energy transmission utilizing heating element array and object occupancy and location sensing

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH369836A (de) 1959-07-15 1963-06-15 Therma Ag Vorrichtung zur Erwärmung von Stoffen mittels Hochfrequenzenergie
US3854022A (en) * 1972-10-25 1974-12-10 Chemetron Corp Electromagnetic oven system for automatically heating variable numbers and sizes of food items or the like
US4756765A (en) 1982-01-26 1988-07-12 Avco Research Laboratory, Inc. Laser removal of poor thermally-conductive materials
US5101086A (en) * 1990-10-25 1992-03-31 Hydro-Quebec Electromagnetic inductor with ferrite core for heating electrically conducting material
US5214394A (en) * 1991-04-15 1993-05-25 Rockwell International Corporation High efficiency bi-directional spatial power combiner amplifier
US5268548A (en) 1992-05-08 1993-12-07 The United States Of America As Represented By The Secretary Of The Army Microwave assisted paint stripping
US5886671A (en) * 1995-12-21 1999-03-23 The Boeing Company Low-cost communication phased-array antenna
DE19744180C2 (de) 1997-10-07 1999-08-12 Karlsruhe Forschzent Vorrichtung zur Erwärmung von Speisen vorzugsweise in einem Flugzeug
JP2000078931A (ja) * 1998-06-23 2000-03-21 Takenaka Komuten Co Ltd 土壌の温度制御装置
US6572830B1 (en) * 1998-10-09 2003-06-03 Motorola, Inc. Integrated multilayered microfludic devices and methods for making the same
JP2001135473A (ja) 1999-11-08 2001-05-18 Mitsubishi Electric Corp ミリ波加熱装置
US6353706B1 (en) * 1999-11-18 2002-03-05 Uentech International Corporation Optimum oil-well casing heating
DE10016259C2 (de) 2000-04-03 2002-06-20 Karlsruhe Forschzent Kompakte millimeterwellentechnische Einrichtung zum Enteisen und/oder Vorbeugeneiner Vereisung
US6408649B1 (en) * 2000-04-28 2002-06-25 Gyrotron Technology, Inc. Method for the rapid thermal treatment of glass and glass-like materials using microwave radiation
US6872927B2 (en) * 2001-12-26 2005-03-29 Lambda Technologies, Inc. Systems and methods for processing pathogen-contaminated mail pieces
JP2003261344A (ja) * 2002-03-08 2003-09-16 Nippon Sheet Glass Co Ltd 熱強化ガラス物品の製造方法、およびそれに用いる製造装置
US6765535B1 (en) * 2002-05-20 2004-07-20 Raytheon Company Monolithic millimeter wave reflect array system

Also Published As

Publication number Publication date
EP1676463A1 (de) 2006-07-05
JP4782690B2 (ja) 2011-09-28
US20050087529A1 (en) 2005-04-28
WO2005043957A1 (en) 2005-05-12
US7498549B2 (en) 2009-03-03
DE602004011969T2 (de) 2009-01-08
EP1676463B1 (de) 2008-02-20
JP2007509483A (ja) 2007-04-12

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