DE602004008521D1 - Dielektrische Filme und Materialien für ihre Herstellung - Google Patents

Dielektrische Filme und Materialien für ihre Herstellung

Info

Publication number
DE602004008521D1
DE602004008521D1 DE200460008521 DE602004008521T DE602004008521D1 DE 602004008521 D1 DE602004008521 D1 DE 602004008521D1 DE 200460008521 DE200460008521 DE 200460008521 DE 602004008521 T DE602004008521 T DE 602004008521T DE 602004008521 D1 DE602004008521 D1 DE 602004008521D1
Authority
DE
Germany
Prior art keywords
materials
production
dielectric films
dielectric
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE200460008521
Other languages
English (en)
Other versions
DE602004008521T2 (de
Inventor
Shinya Nagano
Jiichiro Hashimoto
Kiyoharu Tsutsumi
Yoshinori Funaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Publication of DE602004008521D1 publication Critical patent/DE602004008521D1/de
Application granted granted Critical
Publication of DE602004008521T2 publication Critical patent/DE602004008521T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/04Acids; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/18Polybenzimidazoles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02Alignment layer characterised by chemical composition
    • C09K2323/027Polyimide
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • Y10T428/31681Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Formation Of Insulating Films (AREA)
DE200460008521 2003-03-26 2004-03-22 Dielektrische Filme und Materialien für ihre Herstellung Expired - Fee Related DE602004008521T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003086164 2003-03-26
JP2003086164 2003-03-26
JP2003325518A JP2004307803A (ja) 2003-03-26 2003-09-18 絶縁膜形成材料及び絶縁膜
JP2003325518 2003-09-18

Publications (2)

Publication Number Publication Date
DE602004008521D1 true DE602004008521D1 (de) 2007-10-11
DE602004008521T2 DE602004008521T2 (de) 2007-12-27

Family

ID=32829046

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200460008521 Expired - Fee Related DE602004008521T2 (de) 2003-03-26 2004-03-22 Dielektrische Filme und Materialien für ihre Herstellung

Country Status (6)

Country Link
US (2) US7090925B2 (de)
EP (1) EP1462470B1 (de)
JP (1) JP2004307803A (de)
KR (1) KR20040084802A (de)
DE (1) DE602004008521T2 (de)
TW (1) TW200422362A (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004307803A (ja) * 2003-03-26 2004-11-04 Daicel Chem Ind Ltd 絶縁膜形成材料及び絶縁膜
JP4499391B2 (ja) * 2003-03-26 2010-07-07 ダイセル化学工業株式会社 絶縁膜形成材料及び絶縁膜
KR20060116200A (ko) * 2003-11-05 2006-11-14 다이셀 가가꾸 고교 가부시끼가이샤 방향족 폴리아민 유도체
JP4520724B2 (ja) * 2003-11-05 2010-08-11 ダイセル化学工業株式会社 プレポリマー組成物の製造法、及び絶縁膜の製造法
EP1711550B1 (de) * 2003-12-23 2010-12-01 Silecs OY Adamantylmonomere und polymere für low-k-dielektrik anwendungen
JP4809622B2 (ja) * 2005-04-18 2011-11-09 Jsr株式会社 ポリベンゾオキサゾール前駆体とその製造方法,及びポリベンゾオキサゾール
JP4935195B2 (ja) * 2005-06-08 2012-05-23 住友ベークライト株式会社 ベンゾオキサゾール前駆体、樹脂組成物およびそれを用いたコーティングワニス、樹脂膜並びに半導体装置
JP4935196B2 (ja) * 2005-06-08 2012-05-23 住友ベークライト株式会社 ベンゾオキサゾール前駆体、樹脂組成物およびそれを用いたコーティングワニス、樹脂膜並びに半導体装置
EP1953181A4 (de) * 2005-09-21 2011-08-31 Sumitomo Bakelite Co Harzzusammensetzung, lack, harzfilm und halbleitervorrichtung
JP4987317B2 (ja) * 2006-02-14 2012-07-25 株式会社ダイセル 絶縁膜形成材料及び絶縁膜
KR20090004969A (ko) 2006-03-29 2009-01-12 스미토모 베이클리트 컴퍼니 리미티드 수지 조성물, 바니시, 수지막 및 그것을 이용한 반도체 장치
JP6884026B2 (ja) * 2017-04-19 2021-06-09 三井化学株式会社 半導体用膜形成用組成物、半導体用膜形成用組成物の製造方法、半導体用部材の製造方法、及び半導体用工程材の製造方法
CN109535346B (zh) * 2018-12-05 2021-04-27 中科院广州化学有限公司南雄材料生产基地 一种抗黏土型聚羧酸减水剂及其制备方法和应用

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142036A (en) * 1976-06-01 1979-02-27 Standard Oil Company (Indiana) Polyphenylcarboxylic acid adamantane compounds and polymers prepared therefrom
JPS62183881A (ja) 1986-02-07 1987-08-12 Res Dev Corp Of Japan 複素芳香族高分子超薄膜の製造方法
EP1164125A4 (de) * 1999-11-08 2005-05-04 Daicel Chem Adamantan derivate und ein verfahren zu deren herstellung
US6903006B2 (en) * 2000-03-17 2005-06-07 Matsushita Electric Industrial Co., Ltd. Interlayer dielectric film, and method for forming the same and interconnection
JP3578722B2 (ja) 2000-03-17 2004-10-20 松下電器産業株式会社 層間絶縁膜、その形成方法及び配線の形成方法
JP2004307803A (ja) * 2003-03-26 2004-11-04 Daicel Chem Ind Ltd 絶縁膜形成材料及び絶縁膜
JP4499391B2 (ja) * 2003-03-26 2010-07-07 ダイセル化学工業株式会社 絶縁膜形成材料及び絶縁膜

Also Published As

Publication number Publication date
JP2004307803A (ja) 2004-11-04
US20060241275A1 (en) 2006-10-26
EP1462470B1 (de) 2007-08-29
KR20040084802A (ko) 2004-10-06
US7090925B2 (en) 2006-08-15
US20040192880A1 (en) 2004-09-30
TW200422362A (en) 2004-11-01
DE602004008521T2 (de) 2007-12-27
EP1462470A1 (de) 2004-09-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee