DE60143841D1 - Neue thiazolverbindungen and verfahren zu deren herstellung - Google Patents

Neue thiazolverbindungen and verfahren zu deren herstellung

Info

Publication number
DE60143841D1
DE60143841D1 DE60143841T DE60143841T DE60143841D1 DE 60143841 D1 DE60143841 D1 DE 60143841D1 DE 60143841 T DE60143841 T DE 60143841T DE 60143841 T DE60143841 T DE 60143841T DE 60143841 D1 DE60143841 D1 DE 60143841D1
Authority
DE
Germany
Prior art keywords
new
production
thiazol compounds
thiazol
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60143841T
Other languages
English (en)
Inventor
Dae Chul Yoon
Seung Won Yoo
Dong Gyun Shin
Myoung Ki Lee
Mi Soon Park
Yoon Seok Lee
Yoon Seok Song
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hanmi Fine Chemicals Co Ltd
Original Assignee
Hanmi Fine Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hanmi Fine Chemicals Co Ltd filed Critical Hanmi Fine Chemicals Co Ltd
Application granted granted Critical
Publication of DE60143841D1 publication Critical patent/DE60143841D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/22Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D277/30Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/32Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D277/38Nitrogen atoms
    • C07D277/40Unsubstituted amino or imino radicals
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
DE60143841T 2000-03-06 2001-03-06 Neue thiazolverbindungen and verfahren zu deren herstellung Expired - Lifetime DE60143841D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020000011127A KR100342600B1 (ko) 2000-03-06 2000-03-06 신규한 티아졸 화합물 및 그의 제조 방법
PCT/KR2001/000333 WO2001066532A1 (en) 2000-03-06 2001-03-06 New thiazol compounds and their preparations

Publications (1)

Publication Number Publication Date
DE60143841D1 true DE60143841D1 (de) 2011-02-24

Family

ID=19652652

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60143841T Expired - Lifetime DE60143841D1 (de) 2000-03-06 2001-03-06 Neue thiazolverbindungen and verfahren zu deren herstellung

Country Status (6)

Country Link
US (1) US6277996B1 (de)
EP (1) EP1274695B1 (de)
JP (1) JP4022070B2 (de)
KR (1) KR100342600B1 (de)
DE (1) DE60143841D1 (de)
WO (1) WO2001066532A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100342600B1 (ko) * 2000-03-06 2002-07-04 한미정밀화학주식회사 신규한 티아졸 화합물 및 그의 제조 방법
KR100392409B1 (ko) * 2000-03-20 2003-07-22 한미정밀화학주식회사 신규한 티아졸 화합물을 이용한 세팔로스포린계항생물질의 제조 방법
JP2004149412A (ja) * 2000-06-21 2004-05-27 Fujisawa Pharmaceut Co Ltd 7−[2−(2−アミノチアゾール−4−イル)−2−低級アルコキシカルボニルメトキシイミノアセトアミド]−3−セフェム化合物の製造法
CN1312158C (zh) * 2005-05-20 2007-04-25 天津市医药集团技术发展有限公司 一种头孢克肟的制备方法
CN102199132A (zh) * 2011-03-02 2011-09-28 河北科技大学 2-(2-氨基-4-噻唑)-2(z)-[[(叔丁氧羰基)甲氧]亚氨]乙酸及其盐的制备方法
CN102924483B (zh) * 2012-10-31 2015-06-17 海南合瑞制药股份有限公司 一种头孢他啶晶体化合物、其制备方法及其无菌混合粉形式的药物组合物
CN103044415A (zh) * 2012-12-17 2013-04-17 浙江华方药业有限责任公司 一种氨曲南的合成方法
CN103044416A (zh) * 2012-12-17 2013-04-17 浙江华方药业有限责任公司 一种卡芦莫南钠的合成方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE279887C (de) *
AR228726A1 (es) 1978-05-26 1983-04-15 Glaxo Group Ltd Procedimiento para la preparacion del antibiotico(6r,7r)-7-((z)-2-(2-aminotiazol-4-il)-2-(2-carboxiprop-2-oxiimino)acetamido)-3-(1-piridiniometil)cef-3-em-4-carboxilato
IT1145686B (it) 1979-05-25 1986-11-05 Glaxo Group Ltd Intermedi per la preparazione di antibiotici cefalosporinici e procedimento per prepararli
FR2494275A2 (fr) * 1980-11-20 1982-05-21 Rhone Poulenc Ind Nouveaux derives de vinyl-3 cephalosporines et leur preparation
DE3375013D1 (en) * 1982-04-29 1988-02-04 Glaxo Group Ltd Thiazole derivative, process for its preparation and use in the preparation of beta-lactam antibiotics
JPS60208986A (ja) * 1984-03-31 1985-10-21 Toyama Chem Co Ltd 新規セファロスポリン類およびその製造法
US5182383A (en) 1986-09-10 1993-01-26 Biochemie Gesellschaft M.B.H. Stable, crystalline form of a cephalosporin intermediate product
DD279887A1 (de) * 1987-07-03 1990-06-20 Inst Pharmakologische Forschun Verfahren zur herstellung von d-alpha-(4(1h)-1,5-naphthyridon-3-carboxamido)-benzylpenicillin und anderen beta-lactamantibiotika
GB8800295D0 (en) * 1988-01-07 1988-02-10 Fujisawa Pharmaceutical Co Process for preparation of 7-(2-amino-thiazol-4-y)-2-hydroxyimino-acetanidol-3-cephem compounds
JPH0635464B2 (ja) * 1988-09-02 1994-05-11 明治製菓株式会社 新規セフェム化合物、その製造法及び抗菌剤
US5143911A (en) * 1990-08-23 1992-09-01 Bristol-Myers Squibb Company Antibiotic c-3 di-hydroxyphenyl substituted cephalosporin compounds, compositions and method of use thereof
FR2712512B1 (fr) * 1993-11-18 1996-02-02 Seva Dispositif et installation de mixage de produits visqueux et/ou fluides et utilisation d'un tel dispositif.
TW538045B (en) 1997-01-16 2003-06-21 Biochemie Gmbh Process for purifying cefixime
KR100342600B1 (ko) * 2000-03-06 2002-07-04 한미정밀화학주식회사 신규한 티아졸 화합물 및 그의 제조 방법

Also Published As

Publication number Publication date
US6277996B1 (en) 2001-08-21
JP4022070B2 (ja) 2007-12-12
KR100342600B1 (ko) 2002-07-04
EP1274695B1 (de) 2011-01-12
JP2003525932A (ja) 2003-09-02
EP1274695A1 (de) 2003-01-15
KR20010087055A (ko) 2001-09-15
EP1274695A4 (de) 2004-09-15
WO2001066532A1 (en) 2001-09-13

Similar Documents

Publication Publication Date Title
DE60115902D1 (de) Osteoimplantat und verfahren zu seiner herstellung
ATA10852001A (de) Bauelement und verfahren zu seiner herstellung
DE50103010D1 (de) Induktives bauelement und verfahren zu seiner herstellung
DE60228573D1 (de) Vernetztes elastin und verfahren zu deren herstellung
DE60233058D1 (de) Silsesquioxanderivate und verfahren zu ihrer herstellung
DE60144235D1 (de) Zusammengesetzter film mit mehreren komponenten und verfahren zu seiner herstellung
DE60027698D1 (de) Lasttragendes osteoimplantat und verfahren zu seiner herstellung
DE60134016D1 (de) Wabenstruktur und wabenfilter und verfahren zu deren herstellung
DE50214717D1 (de) Und verfahren zu seiner herstellung
DE60125394D1 (de) Tintenstrahltinte und verfahren zu deren herstellung
DE60223026D1 (de) Vernetzte pulpe und verfahren zu deren herstellung
ATE551940T1 (de) Mehrschichtfolie und verfahren zu deren herstellung
DE69932361D1 (de) Trennschicht und verfahren zu deren herstellung
DE60114415D1 (de) Niob- und tantal-pulver und verfahren zu deren herstellung
DE60131708D1 (de) Druckkopf und Verfahren zu dessen Herstellung
DE60026034D1 (de) Zusammendrückbeständiges mikriporöses material und verfahren zu seiner herstellung
DE60144032D1 (de) Galvanisch abgeschiedener verbundfilm und verfahren zu seiner herstellung
DE60020163D1 (de) Fotomaske, verfahren zu ihrer herstellung
DE60116486D1 (de) Gallengangstent und verfahren zu seiner herstellung
DE60111904D1 (de) Biosensor und verfahren zu dessen herstellung
DE60235706D1 (de) Photochrome bis-naphtopyranverbindungen und verfahren zu deren herstellung
DE60234678D1 (de) Leiterplatte und verfahren zu ihrer herstellung
DE60225508D1 (de) Leiterplatte und verfahren zu ihrer herstellung
DE50010354D1 (de) Verbundteil und verfahren zu dessen herstellung
DE69905326D1 (de) Sollerschlitz und Verfahren zu dessen Herstellung