DE60133707D1 - Durchbruchsdiode und verfahren zur herstellung - Google Patents

Durchbruchsdiode und verfahren zur herstellung

Info

Publication number
DE60133707D1
DE60133707D1 DE60133707T DE60133707T DE60133707D1 DE 60133707 D1 DE60133707 D1 DE 60133707D1 DE 60133707 T DE60133707 T DE 60133707T DE 60133707 T DE60133707 T DE 60133707T DE 60133707 D1 DE60133707 D1 DE 60133707D1
Authority
DE
Germany
Prior art keywords
diode
region
tvsd
substrate
punch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60133707T
Other languages
English (en)
Other versions
DE60133707T2 (de
Inventor
Godefridus A Hurkx
Edwin A Hijzen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
NXP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NXP BV filed Critical NXP BV
Publication of DE60133707D1 publication Critical patent/DE60133707D1/de
Application granted granted Critical
Publication of DE60133707T2 publication Critical patent/DE60133707T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/8618Diodes with bulk potential barrier, e.g. Camel diodes, Planar Doped Barrier diodes, Graded bandgap diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
DE60133707T 2000-02-15 2001-01-24 Durchbruchsdiode und verfahren zur herstellung Expired - Lifetime DE60133707T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00200510 2000-02-15
EP00200510 2000-02-15
PCT/EP2001/000773 WO2001061762A2 (en) 2000-02-15 2001-01-24 Punch-through diode and method of manufacturing the same

Publications (2)

Publication Number Publication Date
DE60133707D1 true DE60133707D1 (de) 2008-06-05
DE60133707T2 DE60133707T2 (de) 2008-08-28

Family

ID=8171017

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60133707T Expired - Lifetime DE60133707T2 (de) 2000-02-15 2001-01-24 Durchbruchsdiode und verfahren zur herstellung

Country Status (6)

Country Link
US (1) US6597052B2 (de)
EP (1) EP1200994B1 (de)
JP (1) JP2003523634A (de)
AT (1) ATE393478T1 (de)
DE (1) DE60133707T2 (de)
WO (1) WO2001061762A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004075303A1 (en) * 2003-02-18 2004-09-02 Koninklijke Philips Electronics N.V. Semiconductor device and method of manufacturing such a device
US7244970B2 (en) * 2004-12-22 2007-07-17 Tyco Electronics Corporation Low capacitance two-terminal barrier controlled TVS diodes
US20060216913A1 (en) * 2005-03-25 2006-09-28 Pu-Ju Kung Asymmetric bidirectional transient voltage suppressor and method of forming same
DE102005047000A1 (de) * 2005-09-30 2007-04-12 Infineon Technologies Ag Halbleiterstruktur zur Ableitung eines Überspannungsimpulses und Verfahren zur Herstellung desselben
US8288839B2 (en) 2009-04-30 2012-10-16 Alpha & Omega Semiconductor, Inc. Transient voltage suppressor having symmetrical breakdown voltages
US8384126B2 (en) * 2010-06-22 2013-02-26 Littelfuse, Inc. Low voltage PNPN protection device
US8557654B2 (en) 2010-12-13 2013-10-15 Sandisk 3D Llc Punch-through diode
CN102097492A (zh) * 2010-12-24 2011-06-15 中山大学 异质结构场效应二极管及制造方法
US8730629B2 (en) 2011-12-22 2014-05-20 General Electric Company Variable breakdown transient voltage suppressor
JP6107430B2 (ja) * 2012-06-08 2017-04-05 豊田合成株式会社 半導体装置
US20160293592A1 (en) * 2015-03-31 2016-10-06 Vishay General Semiconductor Llc Thin bi-directional transient voltage suppressor (tvs) or zener diode
JP6455335B2 (ja) 2015-06-23 2019-01-23 三菱電機株式会社 半導体装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5880511A (en) * 1995-06-30 1999-03-09 Semtech Corporation Low-voltage punch-through transient suppressor employing a dual-base structure
WO2000062346A1 (en) * 1999-04-08 2000-10-19 Koninklijke Philips Electronics N.V. Punchthrough diode and method of manufacturing the same

Also Published As

Publication number Publication date
WO2001061762A2 (en) 2001-08-23
EP1200994B1 (de) 2008-04-23
US20010017389A1 (en) 2001-08-30
US6597052B2 (en) 2003-07-22
DE60133707T2 (de) 2008-08-28
WO2001061762A3 (en) 2002-02-21
EP1200994A2 (de) 2002-05-02
JP2003523634A (ja) 2003-08-05
ATE393478T1 (de) 2008-05-15

Similar Documents

Publication Publication Date Title
DE60133707D1 (de) Durchbruchsdiode und verfahren zur herstellung
TW335513B (en) Semiconductor component for high voltage
ATE257977T1 (de) Bipolar mos-leistungstransistor ohne latch-up
EP1031873A3 (de) Halbleiterbauelement und Verfahren zu dessen Herstellung
EP1229589A3 (de) Hochspannungshalbleiterbauelement
WO2002061845A1 (en) Semiconductor device and method of manufacturing the same
AU2002338615A1 (en) Power semiconductor devices and methods of forming same
WO2005081748A3 (en) Semiconductor structure having strained semiconductor and method therefor
AU6027698A (en) Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage
TW356569B (en) Bulk silicon voltage plane for SOI applications
DE60128028D1 (de) Stapelkondensator und Verfahren zur Herstellung
MXPA04004099A (es) Dispositivo semiconductor y metodo de fabricacion del mismo.
WO1998059374A3 (en) Insulated gate power semiconductor device having a semi-insulating semiconductor substrate
EP1187194A3 (de) Herstellungsverfahren einer integrierten Halbleiterschaltung
TW200501430A (en) Semiconductor device and method of manufacturing such a device
EP0337823A3 (de) MOS-Feldeffekttransistor mit hoher Durchbruchspannung
EP0404008A3 (de) Substratvorspannungs-Generatorschaltung für integrierte Halbleiterschaltung
SE9604142L (sv) Halvledaranordning och förfarande vid densamma
ATE185451T1 (de) Integrierte schaltung
ATE430379T1 (de) Zenerdiode, zenerdiodenschaltung und verfahren zur herstellung einer zenerdiode
WO2002025334B1 (en) Isolation device between optically conductive areas
WO1997036313A3 (en) A field controlled semiconductor device of sic and a method for production thereof
Li et al. Submicron BiCMOS compatible high voltage MOS transistors
WO2003003460A3 (en) Esd implant following spacer deposition
EP0109888A3 (de) Vergrabene Zenerdiode

Legal Events

Date Code Title Description
8364 No opposition during term of opposition