DE60132679D1 - Vorrichtung mit optischer Kavität - Google Patents

Vorrichtung mit optischer Kavität

Info

Publication number
DE60132679D1
DE60132679D1 DE60132679T DE60132679T DE60132679D1 DE 60132679 D1 DE60132679 D1 DE 60132679D1 DE 60132679 T DE60132679 T DE 60132679T DE 60132679 T DE60132679 T DE 60132679T DE 60132679 D1 DE60132679 D1 DE 60132679D1
Authority
DE
Germany
Prior art keywords
optical cavity
cavity
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60132679T
Other languages
English (en)
Other versions
DE60132679T2 (de
Inventor
Dennis Stanley Greywall
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agere Systems LLC
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Agere Systems Guardian Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc, Agere Systems Guardian Corp filed Critical Lucent Technologies Inc
Publication of DE60132679D1 publication Critical patent/DE60132679D1/de
Application granted granted Critical
Publication of DE60132679T2 publication Critical patent/DE60132679T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Optical Elements Other Than Lenses (AREA)
DE60132679T 2000-03-25 2001-03-12 Vorrichtung mit optischer Kavität Expired - Lifetime DE60132679T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/536,344 US6356689B1 (en) 2000-03-25 2000-03-25 Article comprising an optical cavity
US536344 2000-03-25

Publications (2)

Publication Number Publication Date
DE60132679D1 true DE60132679D1 (de) 2008-03-20
DE60132679T2 DE60132679T2 (de) 2009-01-29

Family

ID=24138129

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60132679T Expired - Lifetime DE60132679T2 (de) 2000-03-25 2001-03-12 Vorrichtung mit optischer Kavität

Country Status (4)

Country Link
US (1) US6356689B1 (de)
EP (1) EP1139159B1 (de)
JP (2) JP2001296483A (de)
DE (1) DE60132679T2 (de)

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US6761829B2 (en) * 2001-04-26 2004-07-13 Rockwell Automation Technologies, Inc. Method for fabricating an isolated microelectromechanical system (MEMS) device using an internal void
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US6794271B2 (en) * 2001-09-28 2004-09-21 Rockwell Automation Technologies, Inc. Method for fabricating a microelectromechanical system (MEMS) device using a pre-patterned bridge
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US6782205B2 (en) 2001-06-25 2004-08-24 Silicon Light Machines Method and apparatus for dynamic equalization in wavelength division multiplexing
US6747781B2 (en) 2001-06-25 2004-06-08 Silicon Light Machines, Inc. Method, apparatus, and diffuser for reducing laser speckle
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US6690178B2 (en) 2001-10-26 2004-02-10 Rockwell Automation Technologies, Inc. On-board microelectromechanical system (MEMS) sensing device for power semiconductors
US6710922B2 (en) * 2001-12-07 2004-03-23 Nortel Networks Limited Optical filters
US6800238B1 (en) 2002-01-15 2004-10-05 Silicon Light Machines, Inc. Method for domain patterning in low coercive field ferroelectrics
US6828171B2 (en) * 2002-01-16 2004-12-07 Xerox Corporation Systems and methods for thermal isolation of a silicon structure
JP3558066B2 (ja) * 2002-02-19 2004-08-25 ソニー株式会社 Ｍｅｍｓ素子とその製造方法、光変調素子、ｇｌｖデバイスとその製造方法、及びレーザディスプレイ
US20030197176A1 (en) * 2002-04-22 2003-10-23 Glimmerglass Networks, Inc. Silicon on insulator standoff and method for manufacture thereof
US6828887B2 (en) 2002-05-10 2004-12-07 Jpmorgan Chase Bank Bistable microelectromechanical system based structures, systems and methods
US6728023B1 (en) 2002-05-28 2004-04-27 Silicon Light Machines Optical device arrays with optimized image resolution
US6767751B2 (en) 2002-05-28 2004-07-27 Silicon Light Machines, Inc. Integrated driver process flow
US6822797B1 (en) 2002-05-31 2004-11-23 Silicon Light Machines, Inc. Light modulator structure for producing high-contrast operation using zero-order light
US6829258B1 (en) 2002-06-26 2004-12-07 Silicon Light Machines, Inc. Rapidly tunable external cavity laser
US6813059B2 (en) * 2002-06-28 2004-11-02 Silicon Light Machines, Inc. Reduced formation of asperities in contact micro-structures
JP2004061937A (ja) * 2002-07-30 2004-02-26 Japan Aviation Electronics Industry Ltd 微小可動デバイス
US6859324B2 (en) * 2002-07-31 2005-02-22 Agere Systems Inc. Optical demultiplexer/multiplexer architecture
US20040021931A1 (en) * 2002-07-31 2004-02-05 Stanton Stuart T. Article including an optical gain equalizer
US6801354B1 (en) 2002-08-20 2004-10-05 Silicon Light Machines, Inc. 2-D diffraction grating for substantially eliminating polarization dependent losses
US6712480B1 (en) 2002-09-27 2004-03-30 Silicon Light Machines Controlled curvature of stressed micro-structures
US6850354B2 (en) 2002-09-30 2005-02-01 Lucent Technologies Inc. Monolithic MEMS device for optical switches
US6859300B2 (en) * 2002-09-30 2005-02-22 Lucent Technologies Inc. Monolithic two-axis MEMS device for optical switches
US6924581B2 (en) * 2002-09-30 2005-08-02 Lucent Technologies Inc. Split spring providing multiple electrical leads for MEMS devices
US7370185B2 (en) * 2003-04-30 2008-05-06 Hewlett-Packard Development Company, L.P. Self-packaged optical interference display device having anti-stiction bumps, integral micro-lens, and reflection-absorbing layers
US6806997B1 (en) 2003-02-28 2004-10-19 Silicon Light Machines, Inc. Patterned diffractive light modulator ribbon for PDL reduction
US6829077B1 (en) 2003-02-28 2004-12-07 Silicon Light Machines, Inc. Diffractive light modulator with dynamically rotatable diffraction plane
US6975193B2 (en) * 2003-03-25 2005-12-13 Rockwell Automation Technologies, Inc. Microelectromechanical isolating circuit
US7447891B2 (en) 2003-04-30 2008-11-04 Hewlett-Packard Development Company, L.P. Light modulator with concentric control-electrode structure
TW590984B (en) * 2003-06-09 2004-06-11 Walsin Lihwa Corp A micro-structure gap control technique and its method
US7106487B2 (en) * 2003-06-25 2006-09-12 Intel Corporation Thermal tuning of a laser using doped silicon etalon
JP2005165067A (ja) * 2003-12-03 2005-06-23 Seiko Epson Corp 波長可変フィルタおよび波長可変フィルタの製造方法
DE102004024755B4 (de) * 2004-05-12 2006-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Halterung für optische Elemente
US7193492B2 (en) * 2004-09-29 2007-03-20 Lucent Technologies Inc. Monolithic MEMS device having a balanced cantilever plate
US7733553B2 (en) 2005-09-21 2010-06-08 Hewlett-Packard Development Company, L.P. Light modulator with tunable optical state
JP4814257B2 (ja) * 2006-01-12 2011-11-16 日本電信電話株式会社 ミラー素子およびミラー素子の製造方法
US7550810B2 (en) * 2006-02-23 2009-06-23 Qualcomm Mems Technologies, Inc. MEMS device having a layer movable at asymmetric rates
JP4735513B2 (ja) * 2006-11-06 2011-07-27 株式会社デンソー 光学素子
JP5076844B2 (ja) * 2007-11-29 2012-11-21 セイコーエプソン株式会社 光学デバイス、波長可変フィルタモジュール、および光スペクトラムアナライザ
KR20110017545A (ko) * 2009-08-14 2011-02-22 한국전자통신연구원 광 결합기
JP5625614B2 (ja) * 2010-08-20 2014-11-19 セイコーエプソン株式会社 光フィルター、光フィルターモジュール、分光測定器および光機器
JP5845588B2 (ja) 2011-02-09 2016-01-20 セイコーエプソン株式会社 波長可変干渉フィルター、光モジュール、光分析装置および波長可変干渉フィルターの製造方法
CN103048283B (zh) * 2012-11-23 2015-03-18 姜利军 可调滤波器以及非色散气体探测器
JP6201484B2 (ja) * 2013-07-26 2017-09-27 セイコーエプソン株式会社 光学フィルターデバイス、光学モジュール、電子機器、及びｍｅｍｓデバイス
EP3650913A4 (de) * 2017-07-06 2021-03-31 Hamamatsu Photonics K.K. Optisches modul

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US5408319A (en) * 1992-09-01 1995-04-18 International Business Machines Corporation Optical wavelength demultiplexing filter for passing a selected one of a plurality of optical wavelengths
JPH10253912A (ja) * 1997-01-13 1998-09-25 Denso Corp 光走査装置
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US6246708B1 (en) * 1997-08-27 2001-06-12 Xerox Corporation Semiconductor laser with associated electronic components integrally formed therewith
FR2768812B1 (fr) * 1997-09-19 1999-10-22 Commissariat Energie Atomique Interferometre fabry-perot accordable integre
EP1119792A2 (de) * 1998-09-02 2001-08-01 Xros, Inc. Mikromechanische gekoppelte glieder für relativdrehung durch verdrillbare biegegelenke
DE19857946C1 (de) * 1998-12-16 2000-01-20 Bosch Gmbh Robert Mikroschwingspiegel
US6242324B1 (en) * 1999-08-10 2001-06-05 The United States Of America As Represented By The Secretary Of The Navy Method for fabricating singe crystal materials over CMOS devices

Also Published As

Publication number Publication date
EP1139159A2 (de) 2001-10-04
JP2007299008A (ja) 2007-11-15
DE60132679T2 (de) 2009-01-29
EP1139159B1 (de) 2008-02-06
EP1139159A3 (de) 2004-01-02
US6356689B1 (en) 2002-03-12
JP2001296483A (ja) 2001-10-26

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