DE60123169D1 - Verfahren und Vorrichtung zum Erzeugen eines Diamantfilms - Google Patents

Verfahren und Vorrichtung zum Erzeugen eines Diamantfilms

Info

Publication number
DE60123169D1
DE60123169D1 DE60123169T DE60123169T DE60123169D1 DE 60123169 D1 DE60123169 D1 DE 60123169D1 DE 60123169 T DE60123169 T DE 60123169T DE 60123169 T DE60123169 T DE 60123169T DE 60123169 D1 DE60123169 D1 DE 60123169D1
Authority
DE
Germany
Prior art keywords
producing
diamond film
diamond
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60123169T
Other languages
English (en)
Other versions
DE60123169T2 (de
Inventor
Kiichi Meguro
Takashi Matsuura
Takahiro Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE60123169D1 publication Critical patent/DE60123169D1/de
Publication of DE60123169T2 publication Critical patent/DE60123169T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE60123169T 2000-06-07 2001-06-07 Verfahren und Vorrichtung zum Erzeugen eines Diamantfilms Expired - Lifetime DE60123169T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000170739 2000-06-07
JP2000170739A JP2001354492A (ja) 2000-06-07 2000-06-07 ダイヤモンド膜の形成方法および成膜装置

Publications (2)

Publication Number Publication Date
DE60123169D1 true DE60123169D1 (de) 2006-11-02
DE60123169T2 DE60123169T2 (de) 2007-09-13

Family

ID=18673406

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60123169T Expired - Lifetime DE60123169T2 (de) 2000-06-07 2001-06-07 Verfahren und Vorrichtung zum Erzeugen eines Diamantfilms

Country Status (5)

Country Link
US (2) US6458415B2 (de)
EP (1) EP1162285B1 (de)
JP (1) JP2001354492A (de)
CA (1) CA2348397C (de)
DE (1) DE60123169T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7155475B2 (en) * 2002-02-15 2006-12-26 Sony Corporation System, method, and computer program product for media publishing request processing
US7173334B2 (en) * 2002-10-11 2007-02-06 Chien-Min Sung Diamond composite heat spreader and associated methods
US7351285B2 (en) * 2005-03-29 2008-04-01 Tokyo Electron Limited Method and system for forming a variable thickness seed layer
US7749564B2 (en) * 2005-03-31 2010-07-06 Caterpillar Inc. Method and apparatus for the production of thin film coatings
US7791188B2 (en) 2007-06-18 2010-09-07 Chien-Min Sung Heat spreader having single layer of diamond particles and associated methods
JP2009059798A (ja) * 2007-08-30 2009-03-19 Sumitomo Electric Ind Ltd ダイヤモンド電子素子の製造方法
US8747963B2 (en) * 2009-01-23 2014-06-10 Lockheed Martin Corporation Apparatus and method for diamond film growth
US8778784B2 (en) 2010-09-21 2014-07-15 Ritedia Corporation Stress regulated semiconductor devices and associated methods
US9006086B2 (en) 2010-09-21 2015-04-14 Chien-Min Sung Stress regulated semiconductor devices and associated methods
TWI451942B (zh) 2010-09-21 2014-09-11 Ritedia Corp 具實質平坦顆粒尖端之超研磨工具及其相關方法
GB201121655D0 (en) * 2011-12-16 2012-01-25 Element Six Ltd Substrates for semiconductor devices
SG11201501091RA (en) 2012-08-30 2015-04-29 Iia Technologies Pte Ltd Apparatus and method of producing diamond
JP6292244B2 (ja) * 2016-03-01 2018-03-14 トヨタ自動車株式会社 成膜方法及びプラズマ化学気相成長装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4011521A (en) * 1967-02-16 1977-03-08 Avco Corporation High powered laser
US4407705A (en) * 1981-05-14 1983-10-04 The United States Of America As Represented By The Secretary Of The Air Force Production of negative ions of hydrogen
KR960016218B1 (ko) * 1987-06-05 1996-12-07 가부시기가이샤 히다찌세이사꾸쇼 표면처리방법 및 그 장치
JPH08757B2 (ja) * 1988-12-26 1996-01-10 住友電気工業株式会社 ダイヤモンドおよびその気相合成法
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching
JPH0492890A (ja) 1990-08-07 1992-03-25 Sumitomo Electric Ind Ltd ダイヤモンド合成方法
EP0470531B1 (de) * 1990-08-07 1994-04-20 Sumitomo Electric Industries, Ltd. Verfahren zur Diamantenherstellung
US5518759A (en) * 1993-07-28 1996-05-21 Applied Science And Technology, Inc. High growth rate plasma diamond deposition process and method of controlling same
US5571366A (en) * 1993-10-20 1996-11-05 Tokyo Electron Limited Plasma processing apparatus
TW524888B (en) * 2000-02-01 2003-03-21 Winbond Electronics Corp Optical temperature measurement as an in-situ monitor of etch rate

Also Published As

Publication number Publication date
JP2001354492A (ja) 2001-12-25
DE60123169T2 (de) 2007-09-13
CA2348397A1 (en) 2001-12-07
US6837935B2 (en) 2005-01-04
US20030000467A1 (en) 2003-01-02
US20020005170A1 (en) 2002-01-17
EP1162285B1 (de) 2006-09-20
EP1162285A2 (de) 2001-12-12
US6458415B2 (en) 2002-10-01
EP1162285A3 (de) 2004-11-03
CA2348397C (en) 2008-09-02

Similar Documents

Publication Publication Date Title
DE59901586D1 (de) Vorrichtung und Verfahren zum Herstellen eines dreidimensionalen Objektes
DE50001399D1 (de) Verfahren und vorrichtung zum herstellen eines dreidimensionalen objekts
DE60043483D1 (de) Verfahren und vorrichtung zum herstellen eines kissens
DE59702885D1 (de) Vorrichtung und verfahren zum herstellen eines dreidimensionalen objektes
DE60141314D1 (de) Vorrichtung und Verfahren zum Bestimmen eines seltenen Kurzschlusses
DE69901490D1 (de) Verfahren und vorrichtung zum gespannhalten eines farbbandes
DE69942794D1 (de) Vorrichtung und Verfahren zum Positionieren und Manipulieren eines Gerätes
DE59808697D1 (de) Verfahren und vorrichtung zum erzeugen eines plasmas
DE60214097D1 (de) Vorrichtung und Verfahren zum Anzeigen des Gebührenbereichs eines Fahrzeuges
DE60123169D1 (de) Verfahren und Vorrichtung zum Erzeugen eines Diamantfilms
ATA20122000A (de) Verfahren und vorrichtung zum herstellen eines zahnrades
DE60317748D1 (de) Verfahren und Vorrichtung zum Halten eines Spiegels und Spiegelaustauschverfahren
DE50309149D1 (de) Verfahren und Vorrichtung zum Waschen eines Gummituches
DE59801920D1 (de) Verfahren und vorrichtung zum Herstellen eines (Zigaretten-) Strangs
DE60102762D1 (de) Verfahren und Vorrichtung zum Etikettieren
DE602004002620T8 (de) Verfahren und Vorrichtung zum Schneiden eines beschichteten Blattes
DE50301955D1 (de) Verfahren und vorrichtung zum starten eines giessvorganges
DE60221767D1 (de) Vorrichtung und Verfahren zum Aufbauen eines Werkstückes
DE60102932D1 (de) Mechanisches verfahren und vorrichtung zum erzeugen von nanostrukturen
DE60108334D1 (de) Verfahren und vorrichtung zu herstellung eines flächigen werkstücks
DE50306292D1 (de) Verfahren und Vorrichtung zum Herstellen eines Hohlprofils
DE60215277D1 (de) Vorrichtung und Verfahren zum Zeichnen
DE10392568D2 (de) Vorrichtung und Verfahren zum Befestigen eines Werkzeugs
ATE304068T1 (de) Verfahren und vorrichtung zum herstellen eines drahtes
ATA10162000A (de) Verfahren und vorrichtung zum herstellen eines mopbesatzes

Legal Events

Date Code Title Description
8364 No opposition during term of opposition