DE60115463D1 - Spektrometrisches instrument mit kleinem brennfleck und reduzierter polarisation - Google Patents

Spektrometrisches instrument mit kleinem brennfleck und reduzierter polarisation

Info

Publication number
DE60115463D1
DE60115463D1 DE60115463T DE60115463T DE60115463D1 DE 60115463 D1 DE60115463 D1 DE 60115463D1 DE 60115463 T DE60115463 T DE 60115463T DE 60115463 T DE60115463 T DE 60115463T DE 60115463 D1 DE60115463 D1 DE 60115463D1
Authority
DE
Germany
Prior art keywords
spectrometrical
instrument
reduced polarization
small burn
burn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60115463T
Other languages
English (en)
Other versions
DE60115463T2 (de
Inventor
E Norton
C Johnson
E Stanke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Therma Wave Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Therma Wave Inc filed Critical Therma Wave Inc
Application granted granted Critical
Publication of DE60115463D1 publication Critical patent/DE60115463D1/de
Publication of DE60115463T2 publication Critical patent/DE60115463T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0224Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using polarising or depolarising elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0243Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows having a through-hole enabling the optical element to fulfil an additional optical function, e.g. a mirror or grating having a throughhole for a light collecting or light injecting optical fiber
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Microscoopes, Condenser (AREA)
DE60115463T 2000-08-18 2001-08-17 Spektrometrisches instrument mit kleinem brennfleck und reduzierter polarisation Expired - Lifetime DE60115463T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22639600P 2000-08-18 2000-08-18
US226396P 2000-08-18
PCT/US2001/041770 WO2002016893A2 (en) 2000-08-18 2001-08-17 Small-spot spectrometry instrument with reduced polarization

Publications (2)

Publication Number Publication Date
DE60115463D1 true DE60115463D1 (de) 2006-01-05
DE60115463T2 DE60115463T2 (de) 2006-07-27

Family

ID=22848745

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60115463T Expired - Lifetime DE60115463T2 (de) 2000-08-18 2001-08-17 Spektrometrisches instrument mit kleinem brennfleck und reduzierter polarisation

Country Status (6)

Country Link
US (1) US6667805B2 (de)
EP (1) EP1311893B8 (de)
JP (1) JP4774186B2 (de)
AU (1) AU2001287190A1 (de)
DE (1) DE60115463T2 (de)
WO (1) WO2002016893A2 (de)

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DE10120424B4 (de) * 2001-04-26 2004-08-05 Leica Microsystems Heidelberg Gmbh Scanmikroskop und Auskoppelelement
US6738136B2 (en) 2001-11-09 2004-05-18 Therma-Wave, Inc. Accurate small-spot spectrometry instrument
US7095496B2 (en) * 2001-12-12 2006-08-22 Tokyo Electron Limited Method and apparatus for position-dependent optical metrology calibration
US7064828B1 (en) 2001-12-19 2006-06-20 Nanometrics Incorporated Pulsed spectroscopy with spatially variable polarization modulation element
JP4238633B2 (ja) * 2003-05-19 2009-03-18 コニカミノルタオプト株式会社 偏光解消素子、その素子を用いた分光器及び光ファイバー増幅器
US7230704B2 (en) * 2003-06-06 2007-06-12 Tokyo Electron Limited Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay
US7230703B2 (en) * 2003-07-17 2007-06-12 Tokyo Electron Limited Apparatus and method for measuring overlay by diffraction gratings
US7061613B1 (en) 2004-01-13 2006-06-13 Nanometrics Incorporated Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
US7268881B2 (en) * 2004-02-17 2007-09-11 The Curators Of The University Of Missouri Light scattering detector
US20050201419A1 (en) * 2004-03-10 2005-09-15 Nokia Corporation System and associated terminal, method and computer program product for synchronizing distributively presented multimedia objects
DE102004023178B4 (de) * 2004-05-07 2006-06-29 Hellma Gmbh & Co. Kg Vorrichtung für die Analyse oder Absorptionsmessung an einer kleinen Menge eines flüssigen Mediums mit Hilfe von Licht
US7903252B2 (en) * 2005-01-13 2011-03-08 The Curators Of The University Of Missouri Noise cancellation in fourier transform spectrophotometry
US7262844B2 (en) * 2005-01-13 2007-08-28 The Curators Of The University Of Missouri Ultrasensitive spectrophotometer
JP2006300886A (ja) * 2005-04-25 2006-11-02 Shin Etsu Handotai Co Ltd 顕微光学分析システム
CN101131445A (zh) * 2006-08-25 2008-02-27 Jds尤尼弗思公司 无源消偏器
US20110083493A1 (en) * 2008-06-11 2011-04-14 The Curators Of The University Of Missouri Liquid Chromatography Detector and Flow Controller Therefor
JP5482195B2 (ja) * 2009-12-25 2014-04-23 横河電機株式会社 リタデーション測定装置
KR101294220B1 (ko) * 2011-11-21 2013-08-07 동우 화인켐 주식회사 패턴화 리타더의 영상 획득 장치
GB201713740D0 (en) * 2017-08-25 2017-10-11 Nkt Photonics As Depolarizing homogenizer
KR20220074626A (ko) * 2020-11-27 2022-06-03 삼성전자주식회사 HSI(Hyper Spectral Imaging) 장치 및 이를 포함하는 검사 장치
CN112859359B (zh) * 2021-02-05 2022-02-08 中国工程物理研究院激光聚变研究中心 一种焦斑控制方法

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JPS59155806A (ja) 1983-02-24 1984-09-05 Kokusai Denshin Denwa Co Ltd <Kdd> 無偏光素子
EP0176826A3 (de) * 1984-09-24 1987-09-02 Kollmorgen Technologies Corporation Verfahren und Vorrichtung für spektrale Zweistrahldurchlässigkeitsmessungen
US4818169A (en) * 1985-05-17 1989-04-04 Schram Richard R Automated wafer inspection system
US4712912A (en) 1986-03-10 1987-12-15 Spectra-Tech, Inc. Spectrophotometric image scrambler for full aperture microspectroscopy
JPH0827212B2 (ja) 1987-11-09 1996-03-21 大塚電子株式会社 分光器
JP2572627B2 (ja) 1988-05-13 1997-01-16 ティーディーケイ株式会社 光アイソレータ及び光サーキユレータ
US5037200A (en) 1989-07-11 1991-08-06 Tosoh Corporation Laser-operated detector
JPH04358115A (ja) 1991-06-04 1992-12-11 Fujitsu Ltd 偏光依存性解消フィルタアセンブリ
US5218652A (en) 1991-08-29 1993-06-08 Minnesota Mining And Manufacturing Company Depolarizer for electromagnetic radiation
JP3289941B2 (ja) * 1992-03-13 2002-06-10 オリンパス光学工業株式会社 システム顕微鏡
EP0570151B1 (de) 1992-05-08 1997-10-29 Kokusai Denshin Denwa Co., Ltd Optischer Sender mit Lichtsignal von geringem Polarisationsgrad und optische entpolarisierende Schaltung
US5243465A (en) * 1992-05-12 1993-09-07 Tencor Instruments Area-division beamsplitter with broad spectral bandwidth
JP3647892B2 (ja) 1994-01-28 2005-05-18 並木精密宝石株式会社 光アイソレータ
US5578832A (en) 1994-09-02 1996-11-26 Affymetrix, Inc. Method and apparatus for imaging a sample on a device
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JPH08122706A (ja) 1994-10-19 1996-05-17 Advantest Corp 偏光解消装置及びこれを用いた分光装置
JP3563800B2 (ja) * 1995-01-09 2004-09-08 オリンパス株式会社 観察光学装置
US6040906A (en) 1996-07-11 2000-03-21 Harhay; Gregory P. Resonance raman spectroscopy for identifying and quantitating biomatter, organic, and inorganic analytes
US5877859A (en) * 1996-07-24 1999-03-02 Therma-Wave, Inc. Broadband spectroscopic rotating compensator ellipsometer
JPH1054793A (ja) * 1996-08-09 1998-02-24 Dainippon Screen Mfg Co Ltd 分光反射光量測定装置
US5933555A (en) 1997-05-01 1999-08-03 Alliance Fiber Optics Products, Inc. Optical recirculation depolarizer and method of depolarizing light
JPH11231222A (ja) * 1998-01-27 1999-08-27 Carl Zeiss Jena Gmbh 走査ユニット付顕微鏡、そのための配置および操作方法

Also Published As

Publication number Publication date
EP1311893B8 (de) 2006-02-01
WO2002016893B1 (en) 2003-01-09
EP1311893A2 (de) 2003-05-21
US6667805B2 (en) 2003-12-23
DE60115463T2 (de) 2006-07-27
JP2004507727A (ja) 2004-03-11
WO2002016893A2 (en) 2002-02-28
JP4774186B2 (ja) 2011-09-14
US20020021441A1 (en) 2002-02-21
WO2002016893A3 (en) 2002-08-29
AU2001287190A1 (en) 2002-03-04
EP1311893B1 (de) 2005-11-30

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: TOKYO ELECTRON LTD., TOKIO/TOKYO, JP

8364 No opposition during term of opposition