DE60106838D1 - Solvent mixture for use in removing high purity precursors - Google Patents

Solvent mixture for use in removing high purity precursors

Info

Publication number
DE60106838D1
DE60106838D1 DE60106838T DE60106838T DE60106838D1 DE 60106838 D1 DE60106838 D1 DE 60106838D1 DE 60106838 T DE60106838 T DE 60106838T DE 60106838 T DE60106838 T DE 60106838T DE 60106838 D1 DE60106838 D1 DE 60106838D1
Authority
DE
Germany
Prior art keywords
high purity
manifold
source chemical
solvent
purity source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60106838T
Other languages
German (de)
Other versions
DE60106838T2 (en
Inventor
Robert Sam Zorich
Xinjian Lei
David James Silva
Cynthia Lee Trent
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Application granted granted Critical
Publication of DE60106838D1 publication Critical patent/DE60106838D1/en
Publication of DE60106838T2 publication Critical patent/DE60106838T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027Cleaning the internal surfaces; Removal of blockages
    • B08B9/032Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027Cleaning the internal surfaces; Removal of blockages
    • B08B9/032Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
    • B08B9/0321Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5018Halogenated solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5027Hydrocarbons
    • C11D2111/44
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/24Hydrocarbons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Detergent Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The present invention is a process for cleaning a manifold which delivers high purity source chemical from a high purity source chemical container to a point of use after delivery of the high purity source chemical through the manifold is discontinued, comprising; evacuating the manifold by connection to a source of vacuum, terminating the evacuation, introducing at least one solvent for the high purity source chemical into the manifold from at least one source of the at least one solvent, dissolving any residual high purity source chemical in the manifold into the at least one solvent, venting a resulting mixture of residual high purity source chemical and solvent from the manifold, purging such as by pressurizing the manifold by connection to a source of preferably elevated pressure inert gas and terminating the purging i.e. pressurizing, before reintroducing high purity source chemical into the manifold.
DE60106838T 2000-09-29 2001-09-28 Solvent mixture for use in the removal of high purity precursors Expired - Fee Related DE60106838T2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67643700A 2000-09-29 2000-09-29
US676437 2000-09-29

Publications (2)

Publication Number Publication Date
DE60106838D1 true DE60106838D1 (en) 2004-12-09
DE60106838T2 DE60106838T2 (en) 2005-04-14

Family

ID=24714510

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60106838T Expired - Fee Related DE60106838T2 (en) 2000-09-29 2001-09-28 Solvent mixture for use in the removal of high purity precursors

Country Status (6)

Country Link
EP (1) EP1193309B1 (en)
JP (1) JP2002219432A (en)
KR (1) KR100408736B1 (en)
AT (1) ATE281510T1 (en)
DE (1) DE60106838T2 (en)
TW (1) TW486392B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7041609B2 (en) 2002-08-28 2006-05-09 Micron Technology, Inc. Systems and methods for forming metal oxides using alcohols
US7112485B2 (en) 2002-08-28 2006-09-26 Micron Technology, Inc. Systems and methods for forming zirconium and/or hafnium-containing layers
US6958300B2 (en) * 2002-08-28 2005-10-25 Micron Technology, Inc. Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides
TWI258768B (en) 2004-03-10 2006-07-21 Samsung Electronics Co Ltd Sense amplifier and method for generating variable reference level
US8129577B2 (en) 2008-09-16 2012-03-06 Air Products And Chemicals, Inc. Process and system for providing acetylene
DE102014206875A1 (en) * 2014-04-09 2015-10-15 Wacker Chemie Ag Process for cleaning technical parts of metal halides
JP6935330B2 (en) * 2015-09-30 2021-09-15 芝浦メカトロニクス株式会社 Substrate processing equipment and substrate processing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401429A (en) * 1993-04-01 1995-03-28 Minnesota Mining And Manufacturing Company Azeotropic compositions containing perfluorinated cycloaminoether
WO1995032274A1 (en) * 1994-05-19 1995-11-30 Ag Technology Co., Ltd. Mixed solvent composition
US5964230A (en) * 1997-10-06 1999-10-12 Air Products And Chemicals, Inc. Solvent purge mechanism

Also Published As

Publication number Publication date
EP1193309B1 (en) 2004-11-03
ATE281510T1 (en) 2004-11-15
DE60106838T2 (en) 2005-04-14
JP2002219432A (en) 2002-08-06
KR100408736B1 (en) 2003-12-11
KR20020025820A (en) 2002-04-04
TW486392B (en) 2002-05-11
EP1193309A1 (en) 2002-04-03

Similar Documents

Publication Publication Date Title
EP1312984A3 (en) Lithographic projection apparatus and device manufacturing method
TW200607558A (en) Gas abatement
JP2008518482A5 (en)
ATE478689T1 (en) VACUUM STERILIZATION METHOD AND APPARATUS
KR101837354B1 (en) A method for preparing a pressure vessel for high purity acetylene and a pressure vessel prepared thereby
CA2443046A1 (en) Improved ozone sterilization method
IL153844A0 (en) Cabinet for chemical delivery with solvent purging
WO2012018375A3 (en) Plasma mediated ashing processes
DE60106838D1 (en) Solvent mixture for use in removing high purity precursors
WO2003071004A3 (en) Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
EP1188918A3 (en) Self-clearing vacuum purge system
EP1624477A3 (en) Adhesive injection apparatus and method
CZ20014632A3 (en) Ethylene regeneration process
ATE355324T1 (en) METHOD FOR CHEMICALLY MODIFYING THE SURFACE PROPERTIES OF A POLYMERIC OBJECT
CN1146379A (en) Method for distribution of ultra-high purity gas with minimum corrosion
JP2005521267A5 (en)
EP1346951A4 (en) Method of recovering enriched gaseous oxygen
EP1022044A3 (en) High pressure purge pressure swing adsorption process
JPH10182861A (en) Apparatus for treating with fluorine and method for surface-treating substrate
JPS63291624A (en) Treatment of exhaust gas in dry etching of gallium-arsenide wafer
TW200637644A (en) Method of suppressing contamination of a noble gas
ATE518807T1 (en) DEVICE WITH PLASMA TORCH FOR CLEANING A SEMICONDUCTOR MATERIAL
WO2004067133B1 (en) Cyclic membrane separation process
JP2003022799A (en) Assembly carrier for pouring electrolyte, and electrolyte pouring method and device
JP2006517146A5 (en)

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee