DE60100965D1 - Verfahren zur Herstellung eines optischen Wellenleiters - Google Patents

Verfahren zur Herstellung eines optischen Wellenleiters

Info

Publication number
DE60100965D1
DE60100965D1 DE60100965T DE60100965T DE60100965D1 DE 60100965 D1 DE60100965 D1 DE 60100965D1 DE 60100965 T DE60100965 T DE 60100965T DE 60100965 T DE60100965 T DE 60100965T DE 60100965 D1 DE60100965 D1 DE 60100965D1
Authority
DE
Germany
Prior art keywords
manufacturing
optical waveguide
waveguide
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60100965T
Other languages
English (en)
Inventor
Takuya Komatsu
Kazuhisa Kashihara
Kazutaka Nara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Application granted granted Critical
Publication of DE60100965D1 publication Critical patent/DE60100965D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1446—Means for after-treatment or catching of worked reactant gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Integrated Circuits (AREA)
DE60100965T 2000-05-12 2001-05-04 Verfahren zur Herstellung eines optischen Wellenleiters Expired - Lifetime DE60100965D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000139837A JP2001318258A (ja) 2000-05-12 2000-05-12 光導波路の製造方法

Publications (1)

Publication Number Publication Date
DE60100965D1 true DE60100965D1 (de) 2003-11-20

Family

ID=18647220

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60100965T Expired - Lifetime DE60100965D1 (de) 2000-05-12 2001-05-04 Verfahren zur Herstellung eines optischen Wellenleiters

Country Status (4)

Country Link
US (1) US20020028300A1 (de)
EP (1) EP1153894B1 (de)
JP (1) JP2001318258A (de)
DE (1) DE60100965D1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007065562A (ja) 2005-09-02 2007-03-15 Furukawa Electric Co Ltd:The アレイ導波路回折格子
JP5100175B2 (ja) * 2007-03-28 2012-12-19 古河電気工業株式会社 アレイ導波路格子型の合分波装置
US20110085761A1 (en) * 2009-05-26 2011-04-14 Furukawa Electric Co., Ltd. Arrayed waveguide grating and method of manufacturing arrayed waveguide grating
US9199870B2 (en) 2012-05-22 2015-12-01 Corning Incorporated Electrostatic method and apparatus to form low-particulate defect thin glass sheets
US9422187B1 (en) 2015-08-21 2016-08-23 Corning Incorporated Laser sintering system and method for forming high purity, low roughness silica glass
US20220263286A1 (en) * 2021-02-16 2022-08-18 Macom Technology Solutions Holdings, Inc. High kappa semiconductor lasers

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06115959A (ja) * 1992-09-30 1994-04-26 Furukawa Electric Co Ltd:The 火炎堆積方法
JPH08262252A (ja) * 1995-03-28 1996-10-11 Furukawa Electric Co Ltd:The 光導波路膜の製造方法
JPH09178969A (ja) * 1995-12-21 1997-07-11 Furukawa Electric Co Ltd:The ガラス微粒子堆積装置
JPH1017331A (ja) * 1996-07-01 1998-01-20 Furukawa Electric Co Ltd:The 光導波路膜の製造装置
JPH11209131A (ja) * 1998-01-27 1999-08-03 Sumitomo Electric Ind Ltd ガラス薄膜の形成方法

Also Published As

Publication number Publication date
EP1153894B1 (de) 2003-10-15
US20020028300A1 (en) 2002-03-07
EP1153894A1 (de) 2001-11-14
JP2001318258A (ja) 2001-11-16

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Legal Events

Date Code Title Description
8332 No legal effect for de