DE60037922D1 - Optische Halbleitervorrichtung mit einem wellenlängenabstimmbarem Resonanzhohlraum, und Anwendung in Lichtintensitätsmodulation - Google Patents
Optische Halbleitervorrichtung mit einem wellenlängenabstimmbarem Resonanzhohlraum, und Anwendung in LichtintensitätsmodulationInfo
- Publication number
- DE60037922D1 DE60037922D1 DE60037922T DE60037922T DE60037922D1 DE 60037922 D1 DE60037922 D1 DE 60037922D1 DE 60037922 T DE60037922 T DE 60037922T DE 60037922 T DE60037922 T DE 60037922T DE 60037922 D1 DE60037922 D1 DE 60037922D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- application
- light intensity
- optical semiconductor
- resonant cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference
- G02F1/218—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference using semi-conducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/0622—Controlling the frequency of the radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/0151—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction modulating the refractive index
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/0151—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction modulating the refractive index
- G02F1/0154—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction modulating the refractive index using electro-optic effects, e.g. linear electro optic [LEO], Pockels, quadratic electro optical [QEO] or Kerr effect
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
- G02F1/01725—Non-rectangular quantum well structures, e.g. graded or stepped quantum wells
- G02F1/0175—Non-rectangular quantum well structures, e.g. graded or stepped quantum wells with a spatially varied well profile, e.g. graded or stepped quantum wells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour by interference
- G02F1/213—Fabry-Perot type
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/34—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 reflector
- G02F2201/346—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 reflector distributed (Bragg) reflector
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/05—Function characteristic wavelength dependent
- G02F2203/055—Function characteristic wavelength dependent wavelength filtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3216—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities quantum well or superlattice cladding layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3409—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers special GRINSCH structures
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9908783A FR2796212B1 (fr) | 1999-07-07 | 1999-07-07 | Dispositif optique a semiconducteur, a cavite resonante accordable en longueur d'onde, application a la modulation d'une intensite lumineuse |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60037922D1 true DE60037922D1 (de) | 2008-03-20 |
Family
ID=9547813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60037922T Expired - Lifetime DE60037922D1 (de) | 1999-07-07 | 2000-07-03 | Optische Halbleitervorrichtung mit einem wellenlängenabstimmbarem Resonanzhohlraum, und Anwendung in Lichtintensitätsmodulation |
Country Status (5)
Country | Link |
---|---|
US (1) | US6396083B1 (de) |
EP (1) | EP1067643B1 (de) |
JP (1) | JP4721493B2 (de) |
DE (1) | DE60037922D1 (de) |
FR (1) | FR2796212B1 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AUPR534201A0 (en) * | 2001-05-30 | 2001-06-21 | Unisearch Limited | High efficiency silicon light emitting device |
TW200524236A (en) * | 2003-12-01 | 2005-07-16 | Nl Nanosemiconductor Gmbh | Optoelectronic device incorporating an interference filter |
US20070165400A1 (en) * | 2004-02-11 | 2007-07-19 | Patrick Linder | Light unit and method for generating light rays |
WO2005078879A1 (de) * | 2004-02-11 | 2005-08-25 | Technomedia Ag | Laserdiode mit externem resonator und über druck auf die laseroide einstellbarer wellenlänge |
US20070297741A1 (en) * | 2004-02-11 | 2007-12-27 | Patrick Linder | Method for Determining Clinical and/or Chemical Parameters in a Medium and Device for Carrying Out Said Method |
US7369583B2 (en) * | 2004-06-07 | 2008-05-06 | Innolume Gmbh | Electrooptically wavelength-tunable resonant cavity optoelectronic device for high-speed data transfer |
JP4982838B2 (ja) * | 2004-07-23 | 2012-07-25 | 国立大学法人横浜国立大学 | 光制御素子 |
US7339666B2 (en) * | 2004-09-14 | 2008-03-04 | Hewlett-Packard Development Company, L.P. | Light-amplifying structures and methods for surface-enhanced Raman spectroscopy |
US7177021B2 (en) * | 2004-09-14 | 2007-02-13 | Hewlett-Packard Development Company, L.P. | Integrated radiation sources and amplifying structures, and methods of using the same |
US7307719B2 (en) * | 2004-09-14 | 2007-12-11 | Hewlett-Packard Development Company, L.P. | Wavelength-tunable excitation radiation amplifying structure and method |
US8771552B2 (en) | 2005-06-23 | 2014-07-08 | Sumitomo Electric Industries, Ltd. | Group III nitride crystal substrate, epilayer-containing group III nitride crystal substrate, semiconductor device and method of manufacturing the same |
JP4277826B2 (ja) * | 2005-06-23 | 2009-06-10 | 住友電気工業株式会社 | 窒化物結晶、窒化物結晶基板、エピ層付窒化物結晶基板、ならびに半導体デバイスおよびその製造方法 |
JP4518209B1 (ja) * | 2009-09-07 | 2010-08-04 | 住友電気工業株式会社 | Iii族窒化物結晶基板、エピ層付iii族窒化物結晶基板、ならびに半導体デバイスおよびその製造方法 |
US9708735B2 (en) | 2005-06-23 | 2017-07-18 | Sumitomo Electric Industries, Ltd. | Group III nitride crystal substrate, epilayer-containing group III nitride crystal substrate, semiconductor device and method of manufacturing the same |
US7511808B2 (en) * | 2006-04-27 | 2009-03-31 | Hewlett-Packard Development Company, L.P. | Analyte stages including tunable resonant cavities and Raman signal-enhancing structures |
US20070290191A1 (en) * | 2006-06-16 | 2007-12-20 | Vitaly Shuchukin | Resonant cavity optoelectronic device with suppressed parasitic modes |
US7508858B2 (en) * | 2007-04-30 | 2009-03-24 | The Research Foundation Of State University Of New York | Detuned duo-cavity laser-modulator device and method with detuning selected to minimize change in reflectivity |
US7772615B2 (en) * | 2007-08-10 | 2010-08-10 | Connector Optics | Anti stark electrooptic medium and electrooptically modulated optoelectronic device based thereupon |
US7580595B1 (en) | 2008-05-09 | 2009-08-25 | Technische Universitaet Berlin | Data transmission optoelectric device |
US9817251B1 (en) * | 2016-05-02 | 2017-11-14 | Futurewei Technologies, Inc. | Carrier density-based tunable filter |
CN110235250B (zh) * | 2017-02-03 | 2021-08-20 | 华为技术有限公司 | 光电转换装置 |
US10534204B2 (en) * | 2017-11-03 | 2020-01-14 | International Business Machines Corporation | Structured photorefractive layer stack |
CN111640833B (zh) * | 2019-03-01 | 2021-03-12 | 华南师范大学 | 一种调制InGaN/GaN异质结薄膜内部极化的方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4092659A (en) * | 1977-04-28 | 1978-05-30 | Rca Corporation | Multi-layer reflector for electroluminescent device |
US4317086A (en) * | 1979-09-13 | 1982-02-23 | Xerox Corporation | Passivation and reflector structure for electroluminescent devices |
JPS6366983A (ja) * | 1986-09-09 | 1988-03-25 | Kiso Kaiseki Kenkyusho:Kk | 半導体レ−ザ−の周波数変調方法及びその装置 |
JPS63281491A (ja) * | 1987-05-13 | 1988-11-17 | Mitsubishi Electric Corp | 波長可変型半導体レ−ザ装置 |
JPH0346384A (ja) * | 1989-07-14 | 1991-02-27 | Nec Corp | 面型波長可変発光素子 |
JPH0773135B2 (ja) * | 1992-09-18 | 1995-08-02 | 日本電気株式会社 | 波長可変半導体レーザ及び透過波長可変光フィルタ |
JPH06188518A (ja) * | 1992-12-18 | 1994-07-08 | Fujitsu Ltd | 波長可変面発光レーザ |
US5376580A (en) * | 1993-03-19 | 1994-12-27 | Hewlett-Packard Company | Wafer bonding of light emitting diode layers |
JP2500617B2 (ja) * | 1993-06-25 | 1996-05-29 | 日本電気株式会社 | 屈折率制御光半導体構造 |
DE69428187T2 (de) * | 1994-05-06 | 2002-06-20 | Commissariat A L'energie Atomique, Paris | Optisch gesteuerte Lichtmodulator-Vorrichtung |
JP2839077B2 (ja) * | 1995-06-15 | 1998-12-16 | 日本電気株式会社 | 窒化ガリウム系化合物半導体発光素子 |
US5903586A (en) * | 1997-07-30 | 1999-05-11 | Motorola, Inc. | Long wavelength vertical cavity surface emitting laser |
-
1999
- 1999-07-07 FR FR9908783A patent/FR2796212B1/fr not_active Expired - Fee Related
-
2000
- 2000-06-26 US US09/603,897 patent/US6396083B1/en not_active Expired - Fee Related
- 2000-07-03 EP EP00401900A patent/EP1067643B1/de not_active Expired - Lifetime
- 2000-07-03 DE DE60037922T patent/DE60037922D1/de not_active Expired - Lifetime
- 2000-07-04 JP JP2000202777A patent/JP4721493B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP4721493B2 (ja) | 2011-07-13 |
JP2001036191A (ja) | 2001-02-09 |
EP1067643A1 (de) | 2001-01-10 |
US6396083B1 (en) | 2002-05-28 |
EP1067643B1 (de) | 2008-01-30 |
FR2796212A1 (fr) | 2001-01-12 |
FR2796212B1 (fr) | 2001-08-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |