DE60000549D1 - Spannungsarmes, wasserklares Zinksulfid - Google Patents

Spannungsarmes, wasserklares Zinksulfid

Info

Publication number
DE60000549D1
DE60000549D1 DE60000549T DE60000549T DE60000549D1 DE 60000549 D1 DE60000549 D1 DE 60000549D1 DE 60000549 T DE60000549 T DE 60000549T DE 60000549 T DE60000549 T DE 60000549T DE 60000549 D1 DE60000549 D1 DE 60000549D1
Authority
DE
Germany
Prior art keywords
tension
water
low
zinc sulfide
clear zinc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60000549T
Other languages
English (en)
Other versions
DE60000549T2 (de
Inventor
Jitendra S Goela
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Application granted granted Critical
Publication of DE60000549D1 publication Critical patent/DE60000549D1/de
Publication of DE60000549T2 publication Critical patent/DE60000549T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56After-treatment
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/547Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on sulfides or selenides or tellurides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/305Sulfides, selenides, or tellurides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261In terms of molecular thickness or light wave length

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
DE60000549T 1999-04-07 2000-03-27 Spannungsarmes, wasserklares Zinksulfid Expired - Lifetime DE60000549T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/287,893 US6221482B1 (en) 1999-04-07 1999-04-07 Low stress, water-clear zinc sulfide

Publications (2)

Publication Number Publication Date
DE60000549D1 true DE60000549D1 (de) 2002-11-14
DE60000549T2 DE60000549T2 (de) 2003-06-18

Family

ID=23104826

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60000549T Expired - Lifetime DE60000549T2 (de) 1999-04-07 2000-03-27 Spannungsarmes, wasserklares Zinksulfid

Country Status (5)

Country Link
US (2) US6221482B1 (de)
EP (1) EP1043289B1 (de)
JP (1) JP2000344576A (de)
DE (1) DE60000549T2 (de)
IL (1) IL135276A0 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1530065B1 (de) 2003-11-06 2008-09-10 Rohm and Haas Electronic Materials, L.L.C. Optischer Gegenstand mit leitender Struktur
CN100387525C (zh) * 2004-12-24 2008-05-14 北京有色金属研究总院 制备大尺寸高均匀CVD ZnS材料的设备及其工艺
US7851984B2 (en) * 2006-08-08 2010-12-14 Federal-Mogul World Wide, Inc. Ignition device having a reflowed firing tip and method of construction
US7682557B2 (en) * 2006-12-15 2010-03-23 Smith International, Inc. Multiple processes of high pressures and temperatures for sintered bodies
US20090000700A1 (en) * 2007-06-29 2009-01-01 Hogan Patrick K Treatment method for optically transmissive body
US7790072B2 (en) * 2007-12-18 2010-09-07 Raytheon Company Treatment method for optically transmissive bodies
US8252823B2 (en) * 2008-01-28 2012-08-28 New York University Oxazole and thiazole compounds as beta-catenin modulators and uses thereof
US20100104874A1 (en) * 2008-10-29 2010-04-29 Smith International, Inc. High pressure sintering with carbon additives
EP2511236B1 (de) * 2011-04-14 2015-07-01 Rohm and Haas Company Multispektrales Zinksulfid mit verbesserter Qualität
JP2012240192A (ja) 2011-05-24 2012-12-10 Rohm & Haas Co 向上した品質の多スペクトル硫化亜鉛
EP2541559B1 (de) 2011-06-30 2014-03-26 Rohm and Haas Electronic Materials LLC Transparente leitfähige Artikel
EP2853618B1 (de) 2013-09-26 2022-08-31 Rohm and Haas Electronic Materials LLC Erhöhung der Zinksulfidhärte
CN110965126B (zh) * 2019-11-19 2021-08-10 有研国晶辉新材料有限公司 一种多光谱ZnS材料的常压退火方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4944900A (en) 1983-03-16 1990-07-31 Raytheon Company Polycrystalline zinc sulfide and zinc selenide articles having improved optical quality
EP0157040A3 (de) * 1983-04-05 1987-11-25 Sumitomo Electric Industries Limited Verfahren zur Herstellung von durchsichtigem polykristallinem ZnS
US4770479A (en) * 1985-07-01 1988-09-13 Raytheon Company Optical elements having buried layers and method of manufacture
US4978577A (en) 1989-04-12 1990-12-18 Cvd Incorporated Method for preparing laminates of ZnSe and ZnS
US5077092A (en) 1989-06-30 1991-12-31 Texas Instruments Incorporated Method and apparatus for deposition of zinc sulfide films
US5183689A (en) 1991-07-15 1993-02-02 Cvd, Inc. Process for an improved laminated of znse and zns
US5823943A (en) * 1994-08-02 1998-10-20 Olympus Optical Co., Ltd Light source device for endoscopes
US6083561A (en) * 1998-02-05 2000-07-04 Cvd, Inc. Low scatter, high quality water clear zinc sulfide
JP4304733B2 (ja) * 1998-04-14 2009-07-29 住友電気工業株式会社 多結晶硫化亜鉛光学部品及びその製造方法

Also Published As

Publication number Publication date
JP2000344576A (ja) 2000-12-12
EP1043289B1 (de) 2002-10-09
US20010008622A1 (en) 2001-07-19
EP1043289A1 (de) 2000-10-11
US6472057B2 (en) 2002-10-29
US6221482B1 (en) 2001-04-24
DE60000549T2 (de) 2003-06-18
IL135276A0 (en) 2001-05-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition