DE60000549D1 - Spannungsarmes, wasserklares Zinksulfid - Google Patents
Spannungsarmes, wasserklares ZinksulfidInfo
- Publication number
- DE60000549D1 DE60000549D1 DE60000549T DE60000549T DE60000549D1 DE 60000549 D1 DE60000549 D1 DE 60000549D1 DE 60000549 T DE60000549 T DE 60000549T DE 60000549 T DE60000549 T DE 60000549T DE 60000549 D1 DE60000549 D1 DE 60000549D1
- Authority
- DE
- Germany
- Prior art keywords
- tension
- water
- low
- zinc sulfide
- clear zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000005083 Zinc sulfide Substances 0.000 title 1
- 229910052984 zinc sulfide Inorganic materials 0.000 title 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/547—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on sulfides or selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/287,893 US6221482B1 (en) | 1999-04-07 | 1999-04-07 | Low stress, water-clear zinc sulfide |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60000549D1 true DE60000549D1 (de) | 2002-11-14 |
DE60000549T2 DE60000549T2 (de) | 2003-06-18 |
Family
ID=23104826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60000549T Expired - Lifetime DE60000549T2 (de) | 1999-04-07 | 2000-03-27 | Spannungsarmes, wasserklares Zinksulfid |
Country Status (5)
Country | Link |
---|---|
US (2) | US6221482B1 (de) |
EP (1) | EP1043289B1 (de) |
JP (1) | JP2000344576A (de) |
DE (1) | DE60000549T2 (de) |
IL (1) | IL135276A0 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1530065B1 (de) | 2003-11-06 | 2008-09-10 | Rohm and Haas Electronic Materials, L.L.C. | Optischer Gegenstand mit leitender Struktur |
CN100387525C (zh) * | 2004-12-24 | 2008-05-14 | 北京有色金属研究总院 | 制备大尺寸高均匀CVD ZnS材料的设备及其工艺 |
US7851984B2 (en) * | 2006-08-08 | 2010-12-14 | Federal-Mogul World Wide, Inc. | Ignition device having a reflowed firing tip and method of construction |
US7682557B2 (en) * | 2006-12-15 | 2010-03-23 | Smith International, Inc. | Multiple processes of high pressures and temperatures for sintered bodies |
US20090000700A1 (en) * | 2007-06-29 | 2009-01-01 | Hogan Patrick K | Treatment method for optically transmissive body |
US7790072B2 (en) * | 2007-12-18 | 2010-09-07 | Raytheon Company | Treatment method for optically transmissive bodies |
US8252823B2 (en) * | 2008-01-28 | 2012-08-28 | New York University | Oxazole and thiazole compounds as beta-catenin modulators and uses thereof |
US20100104874A1 (en) * | 2008-10-29 | 2010-04-29 | Smith International, Inc. | High pressure sintering with carbon additives |
EP2511236B1 (de) * | 2011-04-14 | 2015-07-01 | Rohm and Haas Company | Multispektrales Zinksulfid mit verbesserter Qualität |
JP2012240192A (ja) | 2011-05-24 | 2012-12-10 | Rohm & Haas Co | 向上した品質の多スペクトル硫化亜鉛 |
EP2541559B1 (de) | 2011-06-30 | 2014-03-26 | Rohm and Haas Electronic Materials LLC | Transparente leitfähige Artikel |
EP2853618B1 (de) | 2013-09-26 | 2022-08-31 | Rohm and Haas Electronic Materials LLC | Erhöhung der Zinksulfidhärte |
CN110965126B (zh) * | 2019-11-19 | 2021-08-10 | 有研国晶辉新材料有限公司 | 一种多光谱ZnS材料的常压退火方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4944900A (en) | 1983-03-16 | 1990-07-31 | Raytheon Company | Polycrystalline zinc sulfide and zinc selenide articles having improved optical quality |
EP0157040A3 (de) * | 1983-04-05 | 1987-11-25 | Sumitomo Electric Industries Limited | Verfahren zur Herstellung von durchsichtigem polykristallinem ZnS |
US4770479A (en) * | 1985-07-01 | 1988-09-13 | Raytheon Company | Optical elements having buried layers and method of manufacture |
US4978577A (en) | 1989-04-12 | 1990-12-18 | Cvd Incorporated | Method for preparing laminates of ZnSe and ZnS |
US5077092A (en) | 1989-06-30 | 1991-12-31 | Texas Instruments Incorporated | Method and apparatus for deposition of zinc sulfide films |
US5183689A (en) | 1991-07-15 | 1993-02-02 | Cvd, Inc. | Process for an improved laminated of znse and zns |
US5823943A (en) * | 1994-08-02 | 1998-10-20 | Olympus Optical Co., Ltd | Light source device for endoscopes |
US6083561A (en) * | 1998-02-05 | 2000-07-04 | Cvd, Inc. | Low scatter, high quality water clear zinc sulfide |
JP4304733B2 (ja) * | 1998-04-14 | 2009-07-29 | 住友電気工業株式会社 | 多結晶硫化亜鉛光学部品及びその製造方法 |
-
1999
- 1999-04-07 US US09/287,893 patent/US6221482B1/en not_active Expired - Lifetime
-
2000
- 2000-03-27 IL IL13527600A patent/IL135276A0/xx not_active IP Right Cessation
- 2000-03-27 EP EP00302492A patent/EP1043289B1/de not_active Expired - Lifetime
- 2000-03-27 DE DE60000549T patent/DE60000549T2/de not_active Expired - Lifetime
- 2000-04-07 JP JP2000106408A patent/JP2000344576A/ja not_active Withdrawn
-
2001
- 2001-01-13 US US09/759,630 patent/US6472057B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2000344576A (ja) | 2000-12-12 |
EP1043289B1 (de) | 2002-10-09 |
US20010008622A1 (en) | 2001-07-19 |
EP1043289A1 (de) | 2000-10-11 |
US6472057B2 (en) | 2002-10-29 |
US6221482B1 (en) | 2001-04-24 |
DE60000549T2 (de) | 2003-06-18 |
IL135276A0 (en) | 2001-05-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |