DE50304739D1 - Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop - Google Patents

Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop

Info

Publication number
DE50304739D1
DE50304739D1 DE50304739T DE50304739T DE50304739D1 DE 50304739 D1 DE50304739 D1 DE 50304739D1 DE 50304739 T DE50304739 T DE 50304739T DE 50304739 T DE50304739 T DE 50304739T DE 50304739 D1 DE50304739 D1 DE 50304739D1
Authority
DE
Germany
Prior art keywords
microscope
euv
extreme ultraviolet
imaging system
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE50304739T
Other languages
English (en)
Inventor
Hans-Juergen Dobschal
Joern Greif-Wuestenbecker
Robert Brunner
Norbert Rosenkranz
Thomas Scheruebl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMS GmbH
Original Assignee
Carl Zeiss SMS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMS GmbH filed Critical Carl Zeiss SMS GmbH
Priority to DE50304739T priority Critical patent/DE50304739D1/de
Application granted granted Critical
Publication of DE50304739D1 publication Critical patent/DE50304739D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Studio Devices (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE50304739T 2003-04-25 2003-07-19 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop Expired - Fee Related DE50304739D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50304739T DE50304739D1 (de) 2003-04-25 2003-07-19 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10319269A DE10319269A1 (de) 2003-04-25 2003-04-25 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
DE50304739T DE50304739D1 (de) 2003-04-25 2003-07-19 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop

Publications (1)

Publication Number Publication Date
DE50304739D1 true DE50304739D1 (de) 2006-10-05

Family

ID=32946454

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10319269A Ceased DE10319269A1 (de) 2003-04-25 2003-04-25 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
DE50304739T Expired - Fee Related DE50304739D1 (de) 2003-04-25 2003-07-19 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10319269A Ceased DE10319269A1 (de) 2003-04-25 2003-04-25 Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop

Country Status (4)

Country Link
US (1) US6894837B2 (de)
EP (1) EP1471539B1 (de)
AT (1) ATE337605T1 (de)
DE (2) DE10319269A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE50313254D1 (de) * 2002-05-10 2010-12-23 Zeiss Carl Smt Ag Reflektives roentgenmikroskop zur untersuchung von objekten mit wellenlaengen = 100nm in reflexion
DE102008015996A1 (de) * 2008-03-27 2009-10-01 Carl Zeiss Sms Gmbh Mikroskop und Mikroskopierverfahren zur Untersuchung eines reflektierenden Objektes
DE102010029050A1 (de) 2010-05-18 2011-03-31 Carl Zeiss Smt Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102011081914A1 (de) 2011-08-31 2012-09-06 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes
DE102013211269A1 (de) 2013-06-17 2014-04-30 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes sowie Metrologiesystem für die Untersuchung eines strukturierten Objektes
DE102019124919B4 (de) 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02210299A (ja) 1989-02-10 1990-08-21 Olympus Optical Co Ltd Ｘ線用光学系及びそれに用いる多層膜反射鏡
JP2865257B2 (ja) 1989-03-07 1999-03-08 オリンパス光学工業株式会社 シュヴアルツシルド光学系
JP2945431B2 (ja) 1990-03-01 1999-09-06 オリンパス光学工業株式会社 結像型ｘ線顕微鏡
JP2921038B2 (ja) 1990-06-01 1999-07-19 キヤノン株式会社 Ｘ線を用いた観察装置
DE4027285A1 (de) 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
US5291339A (en) 1990-11-30 1994-03-01 Olympus Optical Co., Ltd. Schwarzschild optical system
JPH04353800A (ja) 1991-05-31 1992-12-08 Olympus Optical Co Ltd 軟ｘ線顕微鏡
US5177774A (en) 1991-08-23 1993-01-05 Trustees Of Princeton University Reflection soft X-ray microscope and method
US5384817A (en) * 1993-07-12 1995-01-24 Ovonic Synthetic Materials Company X-ray optical element and method for its manufacture
JP2690036B2 (ja) * 1995-03-23 1997-12-10 工業技術院長 Ｘ線分光集光素子
JP3167095B2 (ja) * 1995-07-04 2001-05-14 キヤノン株式会社 照明装置とこれを有する露光装置や顕微鏡装置、ならびにデバイス生産方法
US6469827B1 (en) 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
US6118577A (en) * 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
JP4374735B2 (ja) * 1999-08-11 2009-12-02 株式会社ニコン 反射型軟ｘ線顕微鏡、マスク検査装置及び反射マスクの製造方法
DE10130212A1 (de) 2001-06-22 2003-01-02 Zeiss Carl Jena Gmbh Objektiv
DE10220816A1 (de) 2002-05-10 2003-11-20 Zeiss Carl Microelectronic Sys Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm
DE10220815A1 (de) 2002-05-10 2003-11-20 Zeiss Carl Microelectronic Sys Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm
US6801298B2 (en) * 2002-07-25 2004-10-05 Intel Corporation Light condenser

Also Published As

Publication number Publication date
US6894837B2 (en) 2005-05-17
EP1471539B1 (de) 2006-08-23
US20040212891A1 (en) 2004-10-28
DE10319269A1 (de) 2004-11-25
ATE337605T1 (de) 2006-09-15
EP1471539A1 (de) 2004-10-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee