DE50210087D1 - METHOD FOR PRODUCING THIN, HEAVY SOLUBLE COATINGS - Google Patents

METHOD FOR PRODUCING THIN, HEAVY SOLUBLE COATINGS

Info

Publication number
DE50210087D1
DE50210087D1 DE50210087T DE50210087T DE50210087D1 DE 50210087 D1 DE50210087 D1 DE 50210087D1 DE 50210087 T DE50210087 T DE 50210087T DE 50210087 T DE50210087 T DE 50210087T DE 50210087 D1 DE50210087 D1 DE 50210087D1
Authority
DE
Germany
Prior art keywords
solid
starting materials
starting material
starting
solid mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50210087T
Other languages
German (de)
Inventor
Hans-Juergen Muffler
Marcus Baer
Felix Mueller
Christian-Herbert Fischer
Martha Christina Lux-Steiner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Helmholtz Zentrum Berlin fuer Materialien und Energie GmbH
Original Assignee
Hahn Meitner Institut Berlin GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hahn Meitner Institut Berlin GmbH filed Critical Hahn Meitner Institut Berlin GmbH
Application granted granted Critical
Publication of DE50210087D1 publication Critical patent/DE50210087D1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemically Coating (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Compounds Of Unknown Constitution (AREA)

Abstract

in conventional methods for the reaction to give final products, the cation donor starting material is introduced in solid form and the anion donor starting material in gas form as reactant gas. The anion donor starting material in particular can however be highly toxic, such as to be technically difficult to handle in the gaseous state. According to the inventive method both starting materials are applied to a solid mixture as easily handled solids, whereby under the applied method conditions the starting materials in the solid mixture do not inter- or intra-react. After application of the solid mixture to a substrate with any morphology, the solid dry starting layer is treated with an activating gas, which triggers the chemical reaction between the solid starting materials, which is as non-toxic as possible and the components of which are not contained in the final product. Said method is thus suitable for production of chalcogenide coatings or organic coatings according to the choice of starting materials in a technically simple, reliable and economic manner of operation, in particular in large-scale applications.
DE50210087T 2001-11-30 2002-11-29 METHOD FOR PRODUCING THIN, HEAVY SOLUBLE COATINGS Expired - Lifetime DE50210087D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160504A DE10160504C2 (en) 2001-11-30 2001-11-30 Process for the production of thin, poorly soluble coatings
PCT/DE2002/004457 WO2003048404A2 (en) 2001-11-30 2002-11-29 Method for the production of thin poorly-soluble coatings

Publications (1)

Publication Number Publication Date
DE50210087D1 true DE50210087D1 (en) 2007-06-14

Family

ID=7708607

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10160504A Expired - Fee Related DE10160504C2 (en) 2001-11-30 2001-11-30 Process for the production of thin, poorly soluble coatings
DE50210087T Expired - Lifetime DE50210087D1 (en) 2001-11-30 2002-11-29 METHOD FOR PRODUCING THIN, HEAVY SOLUBLE COATINGS

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10160504A Expired - Fee Related DE10160504C2 (en) 2001-11-30 2001-11-30 Process for the production of thin, poorly soluble coatings

Country Status (5)

Country Link
EP (1) EP1448808B1 (en)
AT (1) ATE361380T1 (en)
DE (2) DE10160504C2 (en)
ES (1) ES2284972T3 (en)
WO (1) WO2003048404A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0524066D0 (en) * 2005-11-25 2006-01-04 Chiron Srl 741 ii
DE102009037371B3 (en) * 2009-08-13 2011-03-17 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Coating device for substrate, comprises atomizing chamber, in which coating solution or coating dispersion is converted into aerosol by series of ultrasound sources having ultrasonic atomizer
DE102011050684A1 (en) * 2011-05-27 2012-11-29 Karlsruher Institut für Technologie Apparatus and method for producing highly porous, crystalline surface coatings

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5908608A (en) * 1996-11-08 1999-06-01 Spectra Science Corporation Synthesis of metal chalcogenide quantum
JPH1167677A (en) * 1997-08-15 1999-03-09 Star Micronics Co Ltd Stannous oxysulfide film and manufacture thereof
DE19831214C2 (en) * 1998-03-19 2003-07-03 Hahn Meitner Inst Berlin Gmbh Method and arrangement for producing thin metal chalcogenide layers
DE19916403C1 (en) * 1999-04-06 2000-10-12 Hahn Meitner Inst Berlin Gmbh Process for the production of thin, poorly soluble coatings

Also Published As

Publication number Publication date
DE10160504C2 (en) 2003-11-13
EP1448808A2 (en) 2004-08-25
WO2003048404A2 (en) 2003-06-12
WO2003048404A3 (en) 2003-11-27
DE10160504A1 (en) 2003-06-12
ES2284972T3 (en) 2007-11-16
EP1448808B1 (en) 2007-05-02
ATE361380T1 (en) 2007-05-15

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Owner name: HELMHOLTZ-ZENTRUM BERLIN FUER MATERIALIEN UND , DE

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